• 제목/요약/키워드: Magnetotransistor

검색결과 11건 처리시간 0.021초

CMOS 공정에 의한 Suppressed Sidewall Injection Magnetotransistor의 특성 (Characteristics of the Suppressed Sidewall Injection Magnetotransistor using a CMOS Process)

  • 송윤귀;최영식;김남호;류지구
    • 한국전기전자재료학회논문지
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    • 제17권10호
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    • pp.1029-1033
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    • 2004
  • In this paper, we propose a new Suppressed Sidewall Injection Magnetotransistor(SSIMT) architecture, which allows to overcome the restriction of the standard CMOS technology and achieve high linearity. The proposed SSIMT is designed based on the Hynix 0.6 um standard CMOS technology. The fabricated SSIMT has been experimentally verified. The SSIMT shows that the change of collector current is extremely linear as a function of the magnetic induction at $I_{B}$ =500$\mu$A, $V_{CE}$ =2V and VSE =5 V. The relative sensitivity is up to 120 %/T. The magnetic conversion offset is about 79 mT with 30.5 %/T relative sensitivity. The nonlinearity of the fabricated SSIMT is measured about 1.4 %.%.

MAGFET의 제작 및 특성 (Fabrication and Characteristics of the MAGFET)

  • 김시헌;이철우;이정환;남태철
    • 센서학회지
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    • 제7권1호
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    • pp.1-8
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    • 1998
  • 유한 요소법에 의한 수치 해석을 통하여 자기 트랜지스터(MAGFET)의 동작 특성을 분석하고, 소자의 최대감도를 얻기 위한 설계의 최적 조건을 제시하였다. 제시된 최적 조건에 따라 자기트랜지스터를 CMOS 표준 공정에 의하여 제작하고 전자기적 특성을 측정하였다. 소자의 감도는 활성 영역의 크기보다는 길이(L)에 대한 폭(W)의 비 W/L에 의존하며, W/L = 1 일 때 최대 감도를 나타내었다. 제작된 소자의 상대 감도는 2.53 %/T 이었다.

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등가회로 모델을 이용한 MAGNETOTRANSISTOR의 특성분석 (ANALYSIS OF THE CHARACTERISTICS OF THE MAGNETOTRANSISTOR USING THE EQUIVALENT CIRCUIT)

  • 오광훈;이승기;강욱성;한민구
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1991년도 추계학술대회 논문집 학회본부
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    • pp.253-256
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    • 1991
  • Tie constructed the equivalent circuit of the magnetotransistor by the representation of the operating principle as two independent current sources. The equivalent circuit has been analyzed quantatively and the calculated values agreed to the experimental ones. It has been found out that the structure of MT inflenuces on the relative sensitivity and the structure parameters can be extracted from the equivalent circuit.

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에미터 주위의 guard ring이 분리된 전계를 갖는 고감도 자기 트랜지스터의 민감도에 미치는 영향 (The Effect of the Guard Ring around the Emitter on the Sensitivity of the Highly Sensitive Separated Drift Field Magnetotransistor)

  • 강욱성;이승기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1994년도 하계학술대회 논문집 C
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    • pp.1413-1415
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    • 1994
  • A novel magnetotransistor using a separated drift field with the guard ring around the emitter has been designed and fabricated. The operating principle of the proposed magnetic field sensor is based on the emitter injection modulation. The $p^+$ guard ring around the n-type emitter confines drifted electrons in the emitter, hence the induced Hall voltage in the emitter is increased. The measured relative sensitivity of the separated drift magnetotransistor with the guard ring is about 100 times larger than that without the guard ring.

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확산모델을 이용한 자기트랜지스터의 베이스 영역에서의 홀 전계 해석 (An Analysis of Hall field in the Base Region of Magnetotransistors Using the Diffusion Model)

  • 이승기;강욱성;한민구
    • 대한전기학회논문지
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    • 제43권7호
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    • pp.1127-1134
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    • 1994
  • The analytical model for the induced Hall field in the magnetotransistor considering the diffusion of carriers has been proposed and verified by experiment and simulation. Previous models for the induced Hall field in the magnetotransistor do not consider the influence of the diffusion carrier transport. However, the carrier diffusion in the base region of magnetotransistors cannot be neglected and should be considered to evaluated the Hall field in the magnetotransistors accurately. We have measured the Hall voltage in the base region of the fabricated magnetotransistors. The measured values have been compared with the numerical results evaluated from our diffusion model as well as the calculated results from the conventional model. The evaluated Hall voltage from the diffusion model agrees well with the measured values while the sign of the Hall voltage calculated by the conventional model is opposite to that of the measured values in the saturation region. This discrepancy is due to the fact that the diffusion model considers the carrier diffusion while the conventional one does not. The Hall field model including the influence of carrier diffusion may be an important tool to optimize the device structure and to understand the operating principle of the magnetotransistor.

홀 효과와 에미터 인젝션 모듈레이션이 결합된 자기트랜지스터의 포화영역에서의 민감도 증가 현상에 관한 연구 (A Study on the Sensitivity Increase of the Magnetotransistor with Combined Hall Effect and Emitter Injection Modulation Operated in the Saturation Region)

  • 강욱성;이승기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 하계학술대회 논문집 C
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    • pp.1434-1436
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    • 1995
  • We designed and fabricated a highly sensitive magnetotransistor which employes the emitter region as a Hall plate for inducing Hall voltage across the emitter. The Hall voltage modulates the emitter basic junction bias on both sides of the emitter so that a large collector current difference is resulted. The specially designed $p^+$ ring around the emitter enhances accumulation of drifted electrons in the emitter and thus the Hall voltage. A relative sensitivity of 240/tesla is measured by operating the device in the saturation mode.

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CMOS공정에 의한 SSIMT의 제작 및 특성 (Fabrication and characteristics of SSIMT using a CMOS Process)

  • 송윤귀;임재환;정귀상;김남호;류지구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.168-171
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    • 2002
  • A SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this thesis. The prototype is fabricated by using the Hynix 0.6$\mu\textrm{m}$ P-substrate twin-well double poly three-metal CMOS Process. The fabricated SSIMT shows that variation of the collector current is extremely linear by varing the magnetic induction from -200mT to 200mT at I$\_$B/=500${\mu}$A, V$\_$CE/=2V and V$\_$SUB/=5V. The relative sensitivity is up to 120%/T. At B = 0, magnetic offset is about 79mT, there relative sensitivity is 30.5%/T. The nonlinearity of the fabricated SSIMT is measured about 1.4%.

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CMOS 공정을 이용한 2차원 SSIMT의 특성 (Characteristics of the 2-D SSIMT using a CMOS Process)

  • 송윤귀;류지구
    • 한국전기전자재료학회논문지
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    • 제20권8호
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    • pp.697-700
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    • 2007
  • A novel 2-Dimensional Suppressed Sidewall Injection Magnetotransistor (SSIMT) with high linearity has been fabricated on the standard CMOS technology and experimentally verified. The novel 2-Dimensional SSIMT overcomes the restriction of the standard CMOS technology. Experimental results of the fabricated 2-Dimensional SSIMT show that the variation of each collector output currents are extremely linear as a function of magnetic field from -200mT to 200mT at $I_B = 1 mA,\;V_{CE} = 5 V\;and\;V_{SE} = 5 V$. The relative sensitivity shows up to 13 %/T. The measured nonlinearity of the fabricated device is about 0.9%.

CMOS 공정에 의한 2차원 SSIMT의 제작 및 특성 (Fabrication and characteristics of 2-Dimensional SSIMT using a CMOS Process)

  • 송윤귀;이지현;최영식;김남호;류지구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2003년도 추계학술대회 논문집 Vol.16
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    • pp.443-446
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    • 2003
  • A 2-Dimensional SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this paper. The prototype is fabricated by using the Hynix $0.6{\mu}m$ CMOS Process. The fabricated SSIMT shows that the variation of each collectors current are extremely linear by varing the magnetic induction from -200mT to 200mT at $I_B\;:\;1000{\mu}A,\;V_{CE}\;=\;5V\;and\;V_{SUB}\;=\;5V$. The relative sensitivity is up to 13%/T. At B = 0, magnetic offset is about 40mT, there relative sensitivity is 4.72%/T. The nonlinearity of the fabricated 2-D SSIMT is measured about 1.2%.

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