Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference (한국전기전자재료학회:학술대회논문집)
- 2003.11a
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- Pages.443-446
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- 2003
Fabrication and characteristics of 2-Dimensional SSIMT using a CMOS Process
CMOS 공정에 의한 2차원 SSIMT의 제작 및 특성
- Published : 2003.11.13
Abstract
A 2-Dimensional SSIMT(Suppressed Sidewall Injection Magnetotransistor) sensor with high linearity is presented in this paper. The prototype is fabricated by using the Hynix