• JSTS:Journal of Semiconductor Technology and Science
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• v.16 no.2
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• pp.147-152
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• 2016

In this study, we fabricated Ag-based electrochemical metallization memory devices which is also called conductive-bridge random-access memory (CBRAM) in order to investigate the resistive switching behavior depending on the bottom electrode (BE). RRAM cells of two different layer configurations having $Ag/Si_3N_4/TiN$ and $Ag/Si_3N_4/p^+$ Si are studied for metal-insulator-metal (MIM) and metal-insulator-silicon (MIS) structures, respectively. Switching voltages including forming/set/reset are lower for MIM than for MIS structure. It is found that the workfunction different affects the performances.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
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• v.29 no.2
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• pp.77-82
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• 2018

Electromagnetic wave transmission through periodic metal-insulator-metal(MIM) waveguides as a function of plate thickness has not been extensively studied at various terahertz frequencies. In this paper, we investigate the transmittances through gold MIM slits when a normally incident wave with parallel polarization is considered at several terahertz frequencies. In addition, the results are compared to the case of a perfect electric conductor, and the differences are discussed.

• Journal of the Optical Society of Korea
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• v.20 no.1
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• pp.180-187
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• 2016

The independent operation of a color filter for incident polarization is demonstrated using a guided-mode resonance (GMR) filter employing a metal-insulator-metal (MIM) waveguide. To achieve independent operation, a rectangular MIM grating is proposed as a wave-guide resonator. The design considerations are discussed and include how to determine the grating period and slit width. Power flow distribution is observed with slit width variation. Blue-green, green-red, and blue-red filters for corresponding x- and y-polarizations are demonstrated as application examples with numerical simulation with rectangle-shaped MIM grating. As a practical application, feasibility as a chromatic polarizer is discussed.

• Journal of the Korean Vacuum Society
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• v.9 no.2
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• pp.162-166
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• 2000

High quality $Si_3N_4$ metal-insulator-metal (MIM) capacitors were realized by plasma enhanced chemical vapor deposition (PECVD). Titanium nitride (TiN) adapted as a diffusion barrier reduced the interfacial reaction between $Si_3N_4$ dielectric layer and aluminum metal electrode showing neither hillock nor observable precipitate along the interface. The capacitance and the current-voltage characteristics of the MIM capacitors showed that the minimum thickness of $Si_3N_4$ layer should be limited to 500 $\AA$ under the present process, below which most of the capacitors were electrically shorted resulting in the devastation of on-wafer yield. According to the transmission electron microscopy (TEM) on the cross-sectional microstructure of the capacitors, the dielectric breakdown was caused by slit-like voids formed at the interface between TiN and $Si_3N_4$ layers when the thickness of $Si_3N_4$ layer was less than 500 $\AA$. Based on the calculation of thermally-induced residual stress, the formation of voids was understood from the mechanistic point of view.

• Journal of the Korean Vacuum Society
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• v.20 no.5
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• pp.327-332
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• 2011

Plasma polymerized styrene (ppS) thin films were prepared on ITO coated glass substrates for a MIM (metal-insulator-metal) structure with thermally evaporated Au thin film as metal contact. Also the ppS thin films were applied as organic insulator to a MIS (metal-insulatorsemiconductor) device with thermally evaporated pentacene thin film as organic semiconductor layer. After the I-V and C-V measurements with MIM and MIS structures, the ppS revealed relatively higher dielectric constant of k=3.7 than those of the conventional poly styrene and very low leakage current density of $1{\times}10^{-8}Acm^{-2}$ at electric field strength of $1MVcm^{-1}$. The MIS structure with the ppS dielectric layer showed negligible hysteresis in C-V characteristics. It would be therefore expected that the proposed ppS could be applied as a promising dielectric/insulator to organic thin film transistors, organic memory devices, and flexible organic electronic devices.

• Electrical & Electronic Materials
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• v.8 no.2
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• pp.176-183
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• 1995

The present work is concerned with the switching conduction characteristics of PI LB films in metal insulator metal sandwiches. By applying various DC voltage bias to MIM junctions, conduction characteristics of junctions can be changed between the high-voltage low-current(off) condition, the low-voltage high-current (on) condition and the medium(mid) condition. Switching conduction characteristics can be also observed in MIM junctions employing some aromatic compounds as insulators. Switching conduction characteristics is assumed to be owing to the existence of aromatic rings, space charge in films, impurities on metal-insulator interface, and difference in work functions of base and top electrodes metal. To study the conduction process of on, off, and mid conductions, we measured I-V, d$^{2}$V/d I$^{2}$-V characteristics of junctions with several different top electrodes under various temperatures. Small conductance changes of junctions can be measured by observing the second derivative, d$^{2}$V/dI$^{2}$, of I-V curve. A dynamical technique is used to get the second derivatives. That is, a finite modulation of the current is applied to the junctions and the second harmonic of the voltage is detected.

• Journal of the Optical Society of Korea
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• v.15 no.2
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• pp.118-123
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• 2011

A novel triangular-shaped plasmonic metal-insulator-metal (MIM) Bragg grating waveguide is introduced, whose band-gap is narrower than that of the conventional step type and wider than that of the sawtoothshaped one. Moreover apodized triangular-shaped MIM Bragg grating structures are proposed in order to reduce the side lobes of the transmission spectrum, because the Bragg reflector with a sawtooth profile has a smoother transmission spectrum than that of a triangular-shaped one. The performance of the proposed structures is simulated by using the finite difference time domain method.

• Proceedings of the Optical Society of Korea Conference
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• 1990.07a
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• pp.133-138
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• 1990

점접촉 MIM (Metal-Insulator-Metal) 다이오드는 레이저 광속의 검출기, 고조파 발생기 및 믹서로 사용되며, 그 검출범위가 수십 THz의 주파수 영역까지 가능하다. 이러한 MIM 다이오드의 여러사기 변수들에 대한 감응도를 측정하였으며, 이들의 특성을 조사하기 위한 관원으로는 10P(36) line의 CO2 레이저 광속을 이용했다. 또한 제작된 점접촉 MIM 다이오드를 이용하여 두 CO2레이저 사이의 주파수 차이에 의한 맥놀이 주파수를 측정하였다. 그리고 MIM 다이오드에서 발견된 초퍼의 초핑 주파수에 의한 비선형 현상을 논하였다.

• Transactions on Electrical and Electronic Materials
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• v.12 no.1
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• pp.35-39
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• 2011

An electrically erasable programmable read-only memory (EEPROM) containing a stacked metal-insulator-metal (MIM) and n-well capacitor is proposed. It was fabricated using a 0.18 $\mu$m standard complementary metal-oxide semiconductor process. The depletion capacitance of the n-well region was effectively applied without sacrificing the cell-area and control gate coupling ratio. The device performed very similarly to the MIM capacitor cell regardless of the smaller cell area. This is attributed to the high control gate coupling ratio and capacitance. The erase speed of the proposed EEPROM was faster than that of the cell containing the MIM control gate.

• JSTS:Journal of Semiconductor Technology and Science
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• v.1 no.3
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• pp.189-192
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• 2001

A simple metal-insulator-metal (MIM) capacitor in a standard $0.25{\;}\mu\textrm{m}$ digital CMOS process is described. Using all six interconnect layers, this capacitor exploits both the lateral and vertical electrical fields to increase the capacitance density (capacitance per unit area). Compared to a conventional parallel plate capacitor in the four upper metal layers, this capacitor achieves lower parasitic substrate capacitance, and improves the capacitance density by a factor of 4. Measurements and an extracted model for the capacitor are also presented. Calculations, model and measurements agree very well.