• Title/Summary/Keyword: Low temperature applications

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Sn58Bi Solder Interconnection for Low-Temperature Flex-on-Flex Bonding

  • Lee, Haksun;Choi, Kwang-Seong;Eom, Yong-Sung;Bae, Hyun-Cheol;Lee, Jin Ho
    • ETRI Journal
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    • v.38 no.6
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    • pp.1163-1171
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    • 2016
  • Integration technologies involving flexible substrates are receiving significant attention owing the appearance of new products regarding wearable and Internet of Things technologies. There has been a continuous demand from the industry for a reliable bonding method applicable to a low-temperature process and flexible substrates. Up to now, however, an anisotropic conductive film (ACF) has been predominantly used in applications involving flexible substrates; we therefore suggest low-temperature lead-free soldering and bonding processes as a possible alternative for flex-on-flex applications. Test vehicles were designed on polyimide flexible substrates (FPCBs) to measure the contact resistances. Solder bumping was carried out using a solder-on-pad process with Solder Bump Maker based on Sn58Bi for low-temperature applications. In addition, thermocompression bonding of FPCBs was successfully demonstrated within the temperature of $150^{\circ}C$ using a newly developed fluxing underfill material with fluxing and curing capabilities at low temperature. The same FPCBs were bonded using commercially available ACFs in order to compare the joint properties with those of a joint formed using solder and an underfill. Both of the interconnections formed with Sn58Bi and ACF were examined through a contact resistance measurement, an $85^{\circ}C$ and 85% reliability test, and an SEM cross-sectional analysis.

Development of a Low Temperature Doping Technique for Applications in Poly-Si TFT on Plastic Substrates

  • Hong, Wan-Shick;Kim, Jong-Man
    • Journal of Information Display
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    • v.4 no.3
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    • pp.17-21
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    • 2003
  • A low temperature doping technique to be applied in poly-Si TFTs on plastic substrates was investigated. Heavily-doped amorphous silicon layers were deposited on poly-Si and the dopant atoms were driven in by subsequent excimer laser annealing. The entire process was carried out under a substrate temperature of 120 $^{\circ}C$, and a sheet resistance of as low as 300 ${\Omega}$/sq. was obtained.

Low Temperature bonding Technology for Electronic Packaging (150℃이하 저온에서의 미세 접합 기술)

  • Kim, Sun-Chul;Kim, Youngh-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.19 no.1
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    • pp.17-24
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    • 2012
  • Recently, flip chip interconnection has been increasingly used in microelectronic assemblies. The common Flip chip interconnection is formed by reflow of the solder bumps. Lead-Tin solders and Tin-based solders are most widely used for the solder bump materials. However, the flip chip interconnection using these solder materials cannot be applied to temperature-sensitive components since solder reflow is performed at relatively high temperature. Therefore the development of low temperature bonding technologies is required in these applications. A few bonding techniques at low temperature of $150^{\circ}C$ or below have been reported. They include the reflow soldering using low melting point solder bumps, the transient liquid phase bonding by inter-diffusion between two solders, and the bonding using low temperature curable adhesive. This paper reviews various low temperature bonding methods.

하이브리드 GAX 사이클 해석 : 성능향상 및 저온획득 응용

  • 강용태;조현철;홍희기
    • Korean Journal of Air-Conditioning and Refrigeration Engineering
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    • v.13 no.10
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    • pp.923-929
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    • 2001
  • The objectives of this paper are to develop an advanced GAX cycle named HGAX (Hybrid Generator Absorber heat eXchange) cycle, and to study the effect of key pa-rameters on the cycle performance and the evaporating temperature. Two different HGAX cycles are developed-Type A (Performance improvement) and Type B (Low temperature applications). A compressor is placed between the evaporator and the absorber, and the evaporator pressure and the absorber pressure are controlled according to its application purpose. It was found that the COP could be improved by 24% compared with the conventional GAX cycle and the evaporating temperature as low as -8$0^{\circ}C$ could be obtained from the HGAX cycle.

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Effects of Li Dopant on Electrical Properties and Microstructure of ZnO Ceramics (Li Dopant가 ZnO 세라믹스의 전기적 특성과 미세 구조에 미치는 영향)

  • Jun, Min-Chul;Koh, Jung-Hyuk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.282-285
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    • 2012
  • It is well known that Zinc Oxide (ZnO) is an attractive material for its various applications. ZnO has been mostly used as a transparent conducting oxide in liquid crystal displays, solar cells due to its advantages of low cost, high productivity, and excellent electrical conductivity. Notably, flexible-dye-sensitized solar cells (DSSCs) based on polyethylene terephthalate (PET) substrates require low temperature sintering processing conditions. Therefore, low temperature processing conditions have been strongly required for transparent conducting film applications. In this paper, we prepared low temperature-sintered ZnO ceramics employing Li as a sintering aid.

TFT Technology for Flexible Display Applications

  • Kim, Chang-Dong;Kang, In-Byeong;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1767-1770
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    • 2007
  • The key development issues in the flexible displays are TFT backplane technology for their various applications, which requires competitive device performance as well as its low temperature process. In this paper, with shortly reviewing recent flexible display development status, we describe technical trends of low-temperature a-Si TFTs. Our TFTs show good device characteristics enough to apply LCD and electrophoretic display.

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Direct Growth of Graphene at Low Temperature for Future Device Applications

  • Kim, Bum Jun;Nasir, Tuqeer;Choi, Jae-Young
    • Journal of the Korean Ceramic Society
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    • v.55 no.3
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    • pp.203-223
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    • 2018
  • The development of two-dimensional graphene layers has recently attracted considerable attention because of its tremendous application in various research fields. Semi-metal materials have received significant attention because of their excellent biocompatibility as well as distinct physical, chemical, and mechanical properties. Taking into account the technical importance of graphene in various fields, such as complementary metal-oxide-semiconductor technology, energy-harvesting and -storage devices, biotechnology, electronics, light-emitting diodes, and wearable and flexible applications, it is considered to be a multifunctional component. In this regard, material scientists and researchers have primarily focused on two typical problems: i) direct growth and ii) low-temperature growth of graphene. In this review, we have considered only cold growth of graphene. The review is divided into five sections. Sections 1 and 2 explain the typical characteristics of graphene with a short history and the growth methods adopted, respectively. Graphene's direct growth at low temperatures on a required substrate with a well-established application is then precisely discussed in Sections 3 and 4. Finally, a summary of the review along with future challenges is described in Section 5.

Determination of Low-temperature Electrochemical Properties of Selected Cation-exchange Membranes for Cathodic Protection Analysis

  • Ko, Moon-Young;Kwon, Byeong-Min;Hong, Byung-Pyo;Byun, Hong-Sik
    • Korean Membrane Journal
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    • v.10 no.1
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    • pp.8-12
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    • 2008
  • The electrochemical properties of Nafion type membranes as a function of temperature to examine the key factors affecting the cathodic protection process at low temperatures was investigated in this study. Variable temperature experiments for AC impedance, DC resistance were conducted. The resistances of 3 Nafion membranes (N 324, N 450, N MAC) were measured in 30% KOH (aq) for a range of temperatures between $-30^{\circ}C$ and room temperature. Membrane resistance increases exponentially with decreasing temperature. This behaviour is most significant at operational temperatures below $0^{\circ}C$. These membranes are stable under the low temperature and caustic conditions of the heat exchange system, but they place a much higher restriction on the cathodic protection of the stainless heat exchange stack. N 450 has the lowest AC impedence and DC resistance at temperatures below $0^{\circ}C$ and consequently is most suitable membrane of the three, for low temperature applications.

Chemical Vapor Deposition Using Ethylene Gas toward Low Temperature Growth of Single-Walled Carbon Nanotubes

  • Jo, Sung-Il;Jeong, Goo-Hwan
    • Applied Science and Convergence Technology
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    • v.24 no.6
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    • pp.262-267
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    • 2015
  • We demonstrate the growth of single-walled carbon nanotubes (SWNTs) using ethylene-based chemical vapor deposition (CVD) and ferritin-induced catalytic particles toward growth temperature reduction. We first optimized the gas composition of $H_2$ and $C_2H_4$ at 500 and 30 sccm, respectively. On a planar $SiO_2$ substrate, high density SWNTs were grown at a minimum temperature of $760^{\circ}C$. In the case of growth using nanoporous templates, many suspended SWNTs were also observed from the samples grown at $760^{\circ}C$; low values of $I_D/I_G$ in the Raman spectra were also obtained. This means that the temperature of $760^{\circ}C$ is sufficient for SWNT growth in ethylene-based CVD and that ethylene is more effective that methane for low temperature growth. Our results provide a recipe for low temperature growth of SWNT; such growth is crucial for SWNT-based applications.

A Study on the electrical Characteristics of High Voltage LDMOSFET in Low Temperature (고내압 LDMOSFET의 저온 특성에 관한 연구)

  • Park, Jae-Hyuong;Lee, Ho-Young;Koo, Yong-Seo;An, Chul
    • Proceedings of the IEEK Conference
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    • 2001.06b
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    • pp.201-204
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    • 2001
  • LDMOSFET devices operated at low temperature have applications on satellite, space shuttle and low temperature system, etc. In this study, we measured the electrical characteristics of 100v Class LDMOSFET for low temperature application. Measurement data are taken over a wide range of temperatures (100K-300K) and various drift region lengths(6.6${\mu}{\textrm}{m}$, 8.4${\mu}{\textrm}{m}$, 12.6${\mu}{\textrm}{m}$). Maximum transconductance, $g_{m}$ and drain current at low temperatures(~100K) increased over about 260%, 50% respectively, in comparison with the data at room temperature. Breakdown voltage B $V_{ds}$, and specific on- resistance decreased. Besides, ratio $R_{on}$ BV, a figure of merit of the device, decreased with decreasing temperature.

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