• 제목/요약/키워드: LTPS TFTS

검색결과 57건 처리시간 0.03초

Illumination Assisted Negative Bias Temperature Instability Degradation in Low-Temperature Polycrystalline Silicon Thin-Film Transistors

  • Lin, Chia-Sheng;Chen, Ying-Chung;Chang, Ting-Chang;Hsu, Wei-Che;Chen, Shih-Ching;Li, Hung-Wei
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.550-552
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    • 2009
  • The negative bias temperature instability on LTPS TFTs in a darkened and an illuminated environment was investigated. Experimental results reveal that the generation of interface state density showed no change between the different NBTI stresses. The degradation of the grain boundary trap under illumination was more significant than for the darkened environment.

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Excimer Laser-induced Crystallization of Si Films for Manufacturing LTPS TFT-based Displays

  • Chung, U.J.;Limanov, A.B.;Wilt, P.C. Van Der;Chitu, A.M.;Im, James S.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.7-7
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    • 2007
  • Laser-irradiation-induced crystallization of as-deposited amorphous precursor films constitutes an integral step in fabricating LTPS TFTs. Consideration of various factors leads one to conclude that, for display manufacturers, choosing how to crystallize the films can be identified as being tactically and strategically significant. This paper will begin by reviewing the fundamental aspects of laser crystallization, and then present noteworthy advances and progress, which have recently been accomplished in the field. In particular, we will focus on communicating the evolving status associated with the sequential lateral solidification (SLS) method, which can be presently identified as the most strategically enabling crystallization method.

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저온 Poly-Si TFT를 이용한 System on Panel용 8-Bit DAC 설계 (Design of 8-bit DAC for System on Panel using Low Temperature Poly-Si TFTs)

  • 변춘원;최병덕
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.841-842
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    • 2006
  • This paper has proposed a serial 8-bit DAC for column driver circuits of mobile displays using LTPS TFTs. The DAC circuit takes very small area by using parasitic capacitance of column lines as sampling and holding capacitors. Moreover, the proposed DAC does not need the analog buffer, because the DAC operation is performed on the column lines. For the data driver circuits of 2-inch qVGA OLED panel, the DAC area is $84um{\times}800um$ and the simulated DAC power consumption is 8.5mW with 10-V supply voltage.

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Flexible electronics based on polysilicon thin film transistor

  • Fortunato, G.;Cuscuna, M.;Maiolo, L.;Maita, F.;Mariucci, L.;Minotti, A.;Pecora, A.;Simeone, D.;Valletta, A.;Bearzotti, A.;Macagnano, A.;Pantalei, S.;Zampetti, E.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.258-261
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    • 2009
  • In this work we present a process to fabricate lowtemperature polysilicon (LTPS) TFTs on polyimide (PI) layers, spin-coated on Si-wafer used as rigid carrier. This process has been then used to fabricate elementary circuits as well as circuits for sensor applications.

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A single-clock-driven gate driver using p-type, low-temperature polycrystalline silicon thin-film transistors

  • Kim, Kang-Nam;Kang, Jin-Seong;Ahn, Sung-Jin;Lee, Jae-Sic;Lee, Dong-Hoon;Kim, Chi-Woo;Kwon, Oh-Kyong
    • Journal of Information Display
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    • 제12권1호
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    • pp.61-67
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    • 2011
  • A single-clock-driven shift register and a two-stage buffer are proposed, using p-type, low-temperature polycrystalline silicon thin-film transistors. To eliminate the clock skew problems and to reduce the burden of the interface, only one clock signal was adopted to the shift register circuit, without additional reference voltages. A two-stage, p-type buffer was proposed to drive the gate line load and shows a full-swing output without threshold voltage loss. The shift register and buffer were designed for the 3.31" WVGA ($800{\times}480$) LCD panel, and the fabricated circuits were verified via simulations and measurements.

SLS Technology for High Performance Poly-Si TFTs and Its Application to Advanced LCD and SOG

  • 류명관;손곤;김천홍;이정열
    • E2M - 전기 전자와 첨단 소재
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    • 제19권9호
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    • pp.11-19
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    • 2006
  • SLS crystallization and CMOS LTPS process have been developed for high performance and uniform characteristics. By strictly optimizing SLS optics in conventional 2 shot SLS process, threshold voltage variation of 720 pixel TFTs in 2.2-inch QVGA panel (240xRGB) was remarkably decreased from 1.89 V to 0.56 V of 3sigma value. Mobility of the channel doped NTFT and PTFT for circuits were $146\;and\;38cm^{2}/Vs$, respectively. Functional unit circuits for SOG were also fabricated and properly operated.

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a-Si TFT based systems on TFT-LCD panels

  • Wang, Wen-Chun;Chan, Chien-Ting;Han, Hsi-Rong
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1168-1171
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    • 2007
  • Integrating systems on TFT-LCD panels is more and more popular for the mobile display application. However, it may not be necessary to use LTPS TFT devices. A-Si TFTs are used to integrate systems on TFT-LCD panels, especially scan (gate) drivers. To further reduce the chip size of driver IC, the triplegate pixel structure is developed. Therefore, the number of the source lines is reduced to 1/3 times.

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Effective Annealing and Crystallization of Si film for Advanced TFT System

  • Noguchi, Takashi
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.254-257
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    • 2009
  • The crystallization and activated annealing effect of Si films using an excimer laser and a new CW blue laser are described comparing with furnace annealing (SPC) for the application of advanced TFTs and future applications. Currently, pulsed ELA is used extensively as a LTPS process on glass substrates as the efficiency is high in UV region for thin Si film of 40- 60 nm thickness. ELA enables extremely low resistivity for both n- and p-typed Si films. On the other hand, CW BLDA enables the smooth Si surface having arbitral grains from micro-grains to anisotropic huge grain structure only controlling its power density.

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High Performance of Crystallization for LPTS TFTs Using Solid Green Laser

  • Nishida, K.;Kawakami, R.;Izawa, J.;Kawaguchi, N.;Matsuzaka, F.;Masaki, M.;Morita, M.;Yoshinouchi, A.;Kawasaki, Y.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.911-914
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    • 2007
  • We developed the laser annealing system using green laser of 261W(5kHz) and 75.5mJ/pulse(2kHz). We confirmed that this system makes it possible to form two kinds(large or uniformed grain) of poly-Si by changing its polarized directions. By using ${\mu}-crystal-Si$ as irradiated films, grain size uniformity is better than that using a-Si.

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Effects of $H_2$ vs. $O_2$ Plasma Pretreatment of Gate Oxide on the Degradation Phenomenon of Low-Temperature Polysilicon Thin-Film Transistors

  • Lee, Seok-Woo;Kang, Ho-Chul;Yang, Joon-Young;Kim, Eu-Gene;Kim, Sang-Hyun;Lim, Kyoung-Moon;Kim, Chang-Dong;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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    • pp.1254-1257
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    • 2004
  • Comparative study on the effects of $H_2$ vs. $O_2$ plasma pretreatment of gate oxide on the degradation phenomenon of p-channel low-temperature polysilicon (LTPS) thin-film transistors (TFTs) were performed. After high drain current stress (HDCS) with $V_{gs}$ = $V_{ds}$, the p-channel TFTs pretreated by $O_2$ plasma showed increased immunity to the degradation of device characteristics such as threshold voltage and maximum field effect mobility because of the higher binding energy of Si-O bond than that of Si-H bond. The investigation of degradation phenomenon of these parameters with the applied power suggests that self-heating can be the major cause of degradation of polysilicon TFTs.

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