• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.5
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• pp.360-366
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• 2013

For conventional electrical actuators, the materials are mainly made up of metals, which mean they are prone to corrosion and electrical sparking. Replacing these systems with polymer metal composite based materials can be solved both problems. Considering their excellent electromechanical property, low device fabrication cost, light weight, and good electrical conductivity, the actuator based on ionic polymer metal composite (IPMC) was fabricated using Nafion film, NaOH 0.1 molar solution, and Au electrode. IPMCs exhibit good electrostatic property which means they can in principle be used in making actuators based on electromechanical motions. The resistance measurements of Nafion film after soaking in NaOH and deionized water were demonstrated and compared each other. The result of sample soaked in NaOH showed better electrical conductivity than in deionized water. The fabricated IPMC actuator exhibits a large deformation of bending displacement of approximately 9 mm with applied low AC voltage 6.89 V at 2.84 Hz. The result of computer simulation was also very similar and shown as a bending displacement of 8.6085 mm.

• Applied Chemistry for Engineering
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• v.23 no.3
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• pp.289-292
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• 2012

Au electrodes modified with self-assembled monolayers (SAMs) were used to control the work function of source/drain electrodes in triethylsilylethynyl anthradithiophene (TES ADT)-based organic thin film transistors (OTFTs). By using benzothiol (BT) and pentafluorobenzothiol (PFBT) SAMs, the hole injection barrier between Au and the highest occupied molecular orbital (HOMO) of TES ADT was controlled. After a solvent annealing, TES ADT OTFTs with PFBT SAM-treated Au electrodes were found to exhibit high field-effect mobilities of $0.05\;cm^2/Vs$ and on/off current ratios of $10^6$.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.05b
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• pp.7-11
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• 2002

In this study, Au thin films were etched with a $Cl_2/Ar$ gas combination in an in an inductively coupled plasma. The etch properties were measured for different gas mixing ratios of $Cl_2/(Cl_2+Ar)$ while the other process conditions were fixed at rf power (700 W), dc bias voltage (150 V), and chamber pressure (15 mTorr). The highest etch rate of the Au thin film was 3500 $\AA/min$ and the selectivity of Au to $SiO_2$ was 4.38 at a $Cl_2/(Cl_2+Ar)$ gas mixing ratio of 0.2. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. There is Au-Cl bonding by chemical reaction between Cl and Au. During the etching of Au thin films in $Cl_2/Ar$ plasma, Au-Cl bond is formed, and these products can be removed by the physical bombardment of Ar ions. In addition, Optical emission spectroscopy (OES) were investigated to analyze radical density of Cl and Ar in plasma. The profile of etched Au investigated with scanning electron microscopy (SEM).

• Journal of Sensor Science and Technology
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• v.29 no.2
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• pp.118-122
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• 2020

This paper proposes a specific sensor-design strategy and the possibility of improving the sensing performance, which can be obtained by replacing part of the existing plasmonic sensor based on the Kretschmann configuration method with an effective refractive-index layer. By replacing the metal layer with an effective refractive-index layer composed of gold and the material to be sensed, an improvement in the detection performance, accompanied by an increase in the sensed incident angle, is observed, and the gold-composition ratio that demonstrates the best result is presented. Subsequently, an increase in the sensed incident angle generated in the previous step can be suppressed by randomly etching a portion of the prism adjacent to the metal layer in a sub-wavelength scale. Finally, this study analyzes the optimization of the metal-layer thickness in a given sensor structure. An effective refractive thin-film surface plasmon resonance sensor design that can achieve optimal sensing performance is then proposed.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.149-150
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• 2006

We describe a novel method of scanning probe nanofabrication using a AFM(atomic force microscopy) tip with assistance of Femtosecond laser pulses to enhance fabrication capability. Illumination of the AFM tip with ultra-short light pulses induces a strong electric field between the tip and the metal surface, which allows removing metal atoms from the surface by means of field evaporation. Quantum simulation reveals that the field evaporation is triggered even en air when the induced electric field reaches the level of a few volts per angstrom, which is low enough to avoid unwanted thermal damages on most metal surfaces. For experimental validation, a Ti: sapphire Femtosecond pulse laser with 10 fs pulse duration at 800 nm center wavelength was used with a tip coated with gold to fabricate nanostructures on a thin film gold surface. Experimental results demonstrate that fine structures with critical dimensions less than ${\sim}10nm$ can be successfully made with precise control of the repetition rate of Femtosecond laser pulses.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.16 no.7
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• pp.564-568
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• 2003

The etching of Au thin films have been performed in an inductively coupled CF$_4$/Cl$_2$/Ar plasma. The etch rates were measured as CF$_4$ contents added from 0 to 30 % to Cl$_2$/Ar plasma, of which gas mixing ratio was fixed at 20%. Other parameters were fixed at an rf power of 700 W, a dc bias voltage of 150 V, a chamber pressure of 15 mTorr, and a substrate temperature of 3$0^{\circ}C$. The highest etch rate of the Au thin film was 3700 $\AA$m/min at a 10% additive CF$_4$ into Cl$_2$/Ar plasma. The surface reaction of the etched Au thin films was investigated using x-ray photoelectron spectroscopy (XPS) analysis. XPS analysis indicated that Au reacted with Cl and formed Au-Cl, which is hard to remove on the surface because of its high melting point. The etching products could be sputtered by Ar ion bombardment.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.11
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• pp.1010-1018
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• 2008

In this report, we describe the use of gold nanoparticles (AuNPs) immobilized on pH. responsive, cross-linked poly(4-vinylpyridine) (P4VP) thin films, as a potential application for pH nanosensors. The methodology is based on the variation in surface plasmon resonance of immobilized AuNPs with changing the interparticle distances, caused by the swelling/deswelling of the pH responsive P4VP polymer films. The change in optical properties of the immobilized AuNPs in response to the pH of surrounding media was investigated by a simple yet powerful tool; UV-vis absorption spectroscopy. The swelling of the P4VP chains at pH 2 causes an increase in the interparticle distances of immobilized AUNPS ($\sim20nm$) and hence leads to a blue shift of 48 nm in their surface plasmon resonance band peak. On the other hand, when the surrounding media was altered from pH 2 to 10, a red shift of absorption maxima was observed. The changes were rapid, and the effect was reversible. This system could prove to be useful in fabricating nanosensors for detecting the pH or pH changes of surrounding aqueous medium.

• Journal of the Korean institute of surface engineering
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• v.23 no.2
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• pp.24-29
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• 1990

The TiN filmms were deposited on the stainless steel substrates by BARE techinique in order to investigate the effects of process parameters such as source-to-substate distance (15-35cm), N2 pressure(4$\times$10-10 -1$\times$10-3mb)and bias voltage(O-2000V), on the deposition rate, the concentration ratio [N/Ti] and the surface color of the films. The deposition rate was deduced from the weight measurement, the [N/ti] ratio by ESCA. The deposition rate decreased with a relationship of=40.2/D2 where D was source-to-substrate distance. The effect of the bias voltage and the N2pressure on the deposition rate, however, appeared negligble. The [N/Ti] ratio was in the narrow range of 0.7 tp 0.8 It increased slightly with the N2 partial pressure and deceased with the source-to-substrate distance. It was confired by ESCA that a significant amount of oxygen and carbon was contaminated after deposition in the top surface of TiN films. The surface color of TiN film was changed from light gold yellow to reddish gold yellow with increasing [N/Ti] ratio.

• Applied Chemistry for Engineering
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• v.20 no.2
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• pp.191-194
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• 2009

Porous alumina prepared by anodization has been widely studied since it shows very regular nanostructures at inexpensive prices. In this article, porous alumina is obtained by anodization of aluminum in the oxalic acid. After the first formed oxide is selectively removed from the aluminum substrate, the hexagonal nanostructures on the fresh aluminum are converted to nanodots by the second anodization in boric acid. Nanodots are arrayed in the convex of the hexagonal nanostructures. The optimization condition for the fabrication of nanodots with a height of 20 nm is investigated in detail. Subsequently, a gold film is deposited on the nanodots, resulting in the formation of gold nanodots arrays which are probably interesting substrate for biosensor applications.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.413-413
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• 2014

In this paper, we present a fabrication method of functionalized gold nanostructures on flexible substrate that can be implemented for plasmonic sensing application. For biomolecular sensing, many researchers exploit unconventional lithography method like nanoimprint lithography (NIP), contact transfer lithography, soft lithography, colloidal transfer printing due to its usability and easy to functionalization. In particular, nanoimprint and contact transfer lithography need to have anti-adhesion layer for distinctive metallic properties on the flexible substrates. However, when metallic thin film was deposited on the anti-adhesion layer coated substrates, we discover much aggravation of the mold by repetitive use. Thus it would be impossible to get a high quality of metal nanostructure on the transferred substrate for developing flexible electronics based transfer printing. Here we demonstrate a method for nano-pillar mold and transfer the controllable nanoparticle array on the flexible substrates without an anti-adhesion layer. Also functionalization of gold was investigated by the different length of thiol applied for effectively localized surface plasmonic resonance sensing. First, a focused ion beam (FIB) and ICP-RIE are used to fabricate the nanoscale pillar array. Then gold metal layer is deposited onto the patterned nanostructure. The metallic 130 nm and 250 nm nanodisk pattern are transferred onto flexible polymer substrate by bi-layer functionalized contact imprinting which can be tunable surface energy interfaces. Different thiol reagents such as Thioglycolic acid (98%), 3-Mercaptopropionic acid (99%), 11-Mercaptoundecanoic acid (95%) and 16-Mercaptohexadecanoic acid (90%) are used. Overcoming the repeatedly usage of the anti-adhesion layer mold which has less uniformity and not washable interface, contact printing method using bi-layer gold array are not only expedient access to fabrication but also have distinctive properties including anti-adhesion layer free, functionalized bottom of the gold nano disk, repeatedly replicate the pattern on the flexible substrate. As a result we demonstrate the feasibility of flexible plasmonic sensing interface and anticipate that the method can be extended to variable application including the portable bio sensor via mass production of stable nanostructure array and other nanophotonic application.