• Proceedings of the KIEE Conference
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• 1995.07c
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• pp.1098-1101
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• 1995

NbTi thin films were prepared on Si wafer and Cu substrate by rf magnetron sputtering in the range of sputtering pressure $3{\times}10^{-2}$torr to $3{\times}10^{-4}$torr at room temperature. The influence of sputtering pressure and substrate type on crystallographic orientation and morphology of NbTi thin films was investigated by using X-ray diffraction(XRD) and scanning electron microscopy(SEM), respectively. And the effect of crystallographic orientation and morphology of NbTi film on electromagnetic behaviors was estimated by measuring critical current in various applied magnetic field. The film morphology changed from porous structure consisting of tapered crystallites to densely deposited film decreasing with sputtering pressure. The change of crystallographic orientation with the sputtering pressure and rf power was calculated from the texture coefficient of(002) plane based on XRD patterns. It was found that a change of texture coefficient of(002) plane increased with decreasing sputtering pressure. From observation of critical current in various applied magnetic field, we have identified that the change of critical current abruptly decrease applying with magnetic field and NbTi film produced at high sputtering pressure does not exhibit superconductivity but at low sputtering pressure shows superconductivity.

• International Journal of Aeronautical and Space Sciences
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• v.17 no.3
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• pp.341-351
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• 2016

In this present work, the effect of hole shapes, orientation and hole arrangements on film cooling effectiveness has been carried out. For this work a flat plate has been considered for the computational model. Computational analysis of film cooling effectiveness using different hole shapes with no streamwise inclination has been carried out. Initially, the model with an inclination of $30^{\circ}$ has been verified with the experimental data. The validation results are well in agreement with the results taken from literature. Five different hole shapes viz. Cylindrical, Elliptic, Triangular, Semi-Cylindrical and Semi-Elliptic have been compared and validated over a wide range of blowing ratios. The blowing ratios ranged from 0.67 to 1.67. Later, orientation of holes have also been varied along with the number of rows and hole arrangements in rows. The performance of film cooling scheme has been given in terms of centerline and laterally averaged adiabatic effectiveness. Semi-elliptic hole utilizes half of the mass flow as in other hole shapes and gives nominal values of effectiveness. The triangular hole geometry shows higher values of effectiveness than other hole geometries. But when compared on the basis of effectiveness and coolant mass consumption, Semi-elliptic hole came out to give best results.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1263-1265
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• 2007

The electrical characteristics of low temperature poly-Si (LTPS) thin-film transistors (TFT) with channel parallel and perpendicular to the direction of lateral growth were studied. The poly-Si film was crystallized using sequential lateral solidification (SLS) laser crystallization technique. The channel orientation dependent turn-on characteristics were investigated by using gated-diodes and capacitance-voltage measurements

• Proceedings of the KSME Conference
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• 2000.04b
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• pp.113-118
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• 2000

Experimental results describing the effects of blowing ratio on film cooling from two rows of holes with opposite orientation angles are presented. The inclination angle was fixed at $35^{\circ}$ and the orientation angles were set to be $45^{\circ}$ for downstream row. and $-45^{\circ}$ for upsream row. The studied blowing ratios were 0.5, 1.0 and 2.0. The boundary layer temperature distributions were measured using thermocouple at two downstream loundary layer temperature distributions were measured using thermocouple at two downstream locations. Detailed adiabatic film cooling effectiveness and heat transfer coefficient distributions were measured with TLC(Thermochromic Liquid Crystal). The adiabatic film cooling effectiveness and heat transfer coefficient distributions are discussed in connection with the injectant behaviors inferred from the boundary layer temperature distributions. Film cooling performance, represented by heat flux was calculated with the adiabatic film cooling effectiveness and heat transfer coefficient data.

• Journal of the Korean Ceramic Society
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• v.45 no.9
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• pp.567-571
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• 2008

The properties of a grown film by the chemical vapor deposition process depend on the deposition temperature because the deposition mechanism of the CVD film is controlled by the deposition temperature. The preferred orientation of the zrC film changed from (111) to (220) or (200) with an increase of the deposition temperature. The grain size of the ZrC film changes from $0.8{\mu}m$ to $2.5{\mu}m$ in the range of 1350 to $1500^{\circ}C$. The hardness of the deposited ZrC film depended on the preferred orientation and the grain size. The hardness of the ZrC film deposited at $1400^{\circ}C$ was 31 GPa.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.17 no.9
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• pp.979-982
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• 2004

The ZnO thin films were prepared by the FTS (facing target sputtering) system, which enables to provide high density plasma and a high deposition rate at a low working gas pressure. We introduced the AZO thin film in order to improve the crystallographic properties of ZnO thin film because of the AZO(ZnO:Al) thin film has an equal crystal structure to the ZnO thin film. ZnO/AZO thin films were deposited at a different oxygen gas flow ratio, R.T. 2mTorr working pressure and a 0.8A sputtering current. The film thickness and c-axis preferred orientation of ZnO/AZO/glass thin films were measured by ${\alpha}$-step and an x-ray diffraction (XRD) instrument. In the results, we could prepare the ZnO thin film with c-axis preferred orientation of about 6$^{\circ}$ on substrate temperature R.T. at O$_2$ gas flo rate 0.5.

• The Korean Journal of Ceramics
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• v.6 no.4
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• pp.354-358
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• 2000

The SnO$_2$film was deposited on a corning glass 1737 substrate by plasma enhanced chemical vapor deposition using a gas mixture of SnCl$_4$, $O_2$, and Ar. The film thickness was measured using $\alpha$-step and was about 9400$\AA$. The conventional X-ray diffractometry and pole figure attachment were used to refine the crystal structure of SnO$_2$ thin film. Six pole figures, (200), (211), (310), (301), (321), and (411), were measured with CoK$_\alpha$ radiation in reflection geometry. The X-ray diffraction data were measured at room temperature using CuK$_\alpha$ radiation with graphite monochromator. The agreement between calculated and observed patterns for the normal direction of SnO$_2$ thin film was not satisfactory due to the severely preferred orientation effect. The Rietveld refinement of heavily textured SnO$_2$ thin film was successfully achieved by adopting the pole density distribution of each reflection obtained from the inverse pole figure as a correction factor for the preferred orientation effect. The R-weighted pattern, R$_wp$, was 15.30%.

• Proceedings of the KSME Conference
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• 2003.11a
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• pp.1939-1943
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• 2003

The precise structural analysis of $SnO_{2}$ thin film, which was prepared by PECVD and thickness 2400 ${\AA}$, was tried to do the structural refinement using X -ray diffraction data. The observed diffraction patterns of $SnO_{2}$ thin film had the strongly preferred orientation effect. WIMV method was used to correct the preferred orientation effect. The final weighted R-factor, $R_{WD}$ was 7.92 %. The lattice parameters, a = b == 4.7366(1) ${\AA}$ and c = 3.1937(1) ${\AA}$, were almost in accordance with ones of $SnO_{2}$ powder.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.773-774
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• 2011

• Journal of Mechanical Science and Technology
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• v.16 no.9
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• pp.1137-1146
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• 2002

An experiment has been conducted on the flow and heat transfer characteristics of film coolant injected from a row of five holes with compound angle orientations of 35$^{\circ}$ inclination angle and 45$^{\circ}$ orientation angle. The Reynolds number based on the mainstream velocity and injection hole diameter 3.58${\times}$10$^4$. Three-dimensional velocity, film cooling effectiveness and heat transfer coefficient data are presented at three different mass flux ratios of 0.5, 1.0 and 2.0. Flow entrainment has been found between the vortices generated by adjacent injectants. The injectant with compound angle orientation entrains not only the mainstream boundary layer flow but also the adjacent injectant. Because of the flow entrainment, the injectant. With compound angle orientation is characterized by a single vortex while two bound vortices are usually observed in the case of simple angle injection. The strength of the secondary flow depends strongly on the mass flux ratio, which shows significant influence on the film cooling effectiveness and heat transfer coefficient.