Experimental Analysis and Optimization of Experimental Analysis and Optimization of $CF_4/O_2$ Plasma Etching Process Plasma Etching Process
(실험계획법에 의한 $CF_4/O_2$ 플라즈마 에칭공정의 최적화에 관한 연구)
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- Journal of the Semiconductor & Display Technology
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- v.8 no.4
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- pp.1-5
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- 2009