• 한국전기전자재료학회논문지
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• 제30권12호
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• pp.800-805
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• 2017

Randomly patterned and wet chemical etching processes were used to treat anti-glare of display cover glasses. The surface and optical properties of grain size and surface morphology controlled by randomly patterned etching and wet chemical solution etching were investigated. The surface morphology and roughness of the etched samples were examined using a spectrophotometer and a portable surface roughness (Ra) measuring instrument, respectively. The gloss caused by reflection from the glass surface was measured at $60^{\circ}$ using a gloss meter. The surface of the sample etched by the doctor-blade process was more uniform than that obtained from a screen pattern etching process at gel state etching process of the first step. The surface roughness obtained from the randomly patterned etching process depended greatly on the mesh size, which in turn affected the grain size and pattern formation. The surface morphology and gloss obtained by the etching process in the second step depended primarily on the mesh size of the gel state etching process of the first step. In our experimental range, the gloss increased on decreasing the grain size at a lower mesh size for the first step process and for longer reaction times for the second step process.

• Transactions on Electrical and Electronic Materials
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• 제14권3호
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• pp.152-155
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• 2013

$TiO_2$ films were deposited on glass substrates with and without $O_2$ plasma etching by using the RF-magnetron sputtering method. We focused on the effect of surface structure on the photoinduced hydrophilic properties of $TiO_2$ films, fabricated on different surface conditions according to the presence or absence of the $O_2$ plasma treatment on glass substrates. The wettability and photoinduced hydrophilic properties of the $TiO_2$ films were investigated according to the changes in water contact angles under UV light irradiations with a very low intensity of 0.1 $mW/cm^2$. The photoinduced hydrophilic properties on the $TiO_2$ formed above the plasma treated glass were also superior to those on the $TiO_2$ formed above the bare glass. This enhanced $TiO_2$ film has been used practically for self cleaning and anti-fogging glasses.

• 대한치과교정학회지
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• 제35권6호
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• pp.433-442
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• 2005

본 연구의 목적은 브라켓 접착 시 산부식과 전처리 과정을 결합하여 접착 단계를 단순화시킨 self-etching primer (SEP)를 차용하는 경우 접착제 종류와 타액의 존재 유무에 따른 전단결합강도의 차이에 관하여 비교 연구 하는 것이다. 소의 하악 영구 전치를 포매하여 만든 시편을 접착제의 종류에 따라 레진 접착제와 레진 강화형 글래스 아이오노머 접착제를 이용한 군으로 나누었고 각각 37% 인산으로 산부식 후 기존의 본딩용 프라이머를 사용하여 접착한 군과, SEP를 사용하여 접착한 군으로 분류하고, 타액 오염 유무에 따라 다시 각 군을 분류하여 전단결합 강도를 측정하였다. 그 결과 레진 접착제로 브라켓을 부착한 경우 SEP를 사용하여 접착한 군의 전단결합강도는 인산 처리군에 비해 낮은데 비해 레진 강화형 글래스 아이오노머를 사용한 경우, 전처리법에 따른 전단결합강도는 통계적으로 유의한 차가 없었으며, 접착제의 종류에 관계없이 타액 오염이 존재 시에는 SEP를 사용한 군이 인산처리군에 비해 높은 전단결합강도를 보였다. 이상의 결과에서 SEP를 사용 시 레진 접착제와 레진 강화형 글래스 아이오노머 접착제 모두 임상적으로 사용 가능한 전단결합강도를 보였으며, 특히 타액에 오염된 치면에서도 SEP를 사용하여 브라켓을 접착하는 것은 적절한 결합강도를 얻을 수 있으므로 임상적으로 유용할 것으로 생각된다.

• Journal of Electrical Engineering and Technology
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• 제3권2호
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• pp.271-275
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• 2008

The MAM(Megasonic Agitated Module) has been fabricated for improving the characteristics of wet etching. The characteristics of the MAM are investigated during the wet etching with and without megasonic agitation in this paper. The adoption of the MAM has improved the characteristics of wet etching, such as the etch rate, etch uniformity, and surface roughness. Especially, the etching uniformity on the entire wafer was less than ${\pm}1%$ in both cases of Si and glass. Generally, the initial root-mean-square roughness($R_{rms}$) of the single crystal silicon was 0.23nm. Roughnesses of 566nm and 66nm have been achieved with magnetic stirring and ultrasonic agitation, respectively, by some researchers. In this paper, the roughness of the etched Si surface is less than 60 nm. Wet etching of silicon with megasonic agitation can maintain nearly the original surface roughness during etching. The results verified that megasonic agitation is an effective way to improve etching characteristics of the etch rate, etch uniformity, and surface roughness and that the developed micromachining system is suitable for the fabrication of devices with complex structures.

• 대한심미치과학회지
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• 제7권1호
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• pp.42-47
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• 1998

This study was performed to compare the bonding mechanism of glass ionomers. In this study, hybrid glass ionomers were used for restoration(Fuji II LC, GC, Japan) as the material of choice. Two different etching solutions were used in this study, 35% phosphoric acid and 10% polyacrylic acid. The effect of two different conditioners to dentin surface of a primary molar was studied and compared by using scanning electron microscope. Further, the interface of the dentin surface and the hybrid glass ionomers were examined.

• Restorative Dentistry and Endodontics
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• 제19권2호
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• pp.447-459
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• 1994

The purpose of this study is to evaluate of shear bond strength of light-curing composite resin to light-curing glass ionomer cement. Composite resin and glass ionomer cement have been widely used as an esthetic filling materials in dental clinics. To achieve better clinical results, sandwich technic was developed with conpensating for disadvantages of these two materials. Especially, light-curing glass ionomer cement provided greately improved bonding strength of teeth or composite resin, and then excellent clinical results can be acquired. In this study, 6 commercial light-curing glass ionomer cements(3 commercial restorative materials : Fuji II LC, Variglass VLC, Vitremer, and 3 commercial lining materials : Fuji Lining LC, Baseline VLC, Vitrebond) were devided two groups. According to manufacturer's appointment, no surface treatment was referred to N groups. Supposing. of clinical practice, surface grinding with water spray at 320 grit sand paper, 40 seconds etching with 37% phosphoric acid, 20 seconds washing, 20 seconds air drying was referred to N groups. Totally 12 experimental groups were devided, and all 120 specimens from 10 specimens of each groups were made. After light-curing composite resin was bonded to light-curing glass ionomer cement, shear bond strength was tested by Instron universal testing machine between glass ionomer cement and composit resin. The data were analyzed statistically by Student's t-test and ANOVA. The obtained results were as follows; 1. In light-curing glass ionomer cement, restorative materials showed higher shear bond strength to composite resin than lining materials(p<0.05). 2. Variglass VLC of restorative material group and Baseline VLC of lining material group have highest shear bond strength to composite resin(p<0.001). 3. In light-curing glass ionomer cement, surface grinding and acid etching reduced shear bond strength to composite resin(p<0.001)}. 4. VGN group 1s highest shear bond strength to composite resin, VBE group is lowest shear bond strength to composite resin(p<0.001).

• 한국안광학회지
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• 제17권2호
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• pp.119-126
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• 2012

목적: 안경 렌즈 코팅 막을 불화수소산을 이용하여 상온에서 단시간 화학적으로 식각한 뒤 코팅 막과 렌즈 원재료의 변화를 살펴보고자 하였다. 방법: GRAY 70%로 염색된 vinyl ester계 고분자(Lens A)와 thiourethane계 고분자렌즈(Lens B)를 불화수소산을 이용해 5분, 10분 또는 15분 동안 식각한 뒤 재료의 기계적 물성과 하드코팅과 반사방지코팅 등 코팅 막의 손상 정도, 그리고 굴절률 광투과율 등 렌즈의 특성 변화를 관찰하였다. 결과: 두 재료 모두 식각 전과 후의 굴절력에는 큰 변화가 없었지만 반사방지코팅과 하드코팅이 차례로 제거되었고 렌즈 표면에도 손상을 주어 UV 투과율이 증가되었으며 기계적 물성은 소하였다. 화학적 식각으로 인한 렌즈의 물성 변화는 thiourethane계 고분자 렌즈에서 더 크게 나타났다. 결론: 고분자 재료의 특성에 따라 불화수소산에 대한 반응성이 다르기 때문에 식각에 따른 렌즈 자체의 물성 변화가 다르게 나타남을 알 수 있었다.

• 한국전기전자재료학회논문지
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• 제13권6호
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• pp.526-532
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• 2000

The paste on the glass or fabrication of the PDP(Plasma Display Panel) barrier rib was selectively etched using focused A $r_{+}$ laser(λ=514 nm) and Nd:YAG(λ=532, 266 nm) laser irradiation. The depth of the etched grooves increase with increasing a laser fluence and decreasing a laser beam scan speed. Using second harmonic of Nd:YAG laser(532 nm) the etching threshold laser fluence was 6.5 mJ/c $m^2$ for the sample of PDP barrier rib. The thickness of 180 ${\mu}{\textrm}{m}$ of the sample on the glass was clearly removed without any damage on the glass substrate by fluence of 19.5J/c $m^2$beam scan speed of 20${\mu}{\textrm}{m}$ /s. In order to increase the etch rate of the barrier rib material barrier rib samples heated by a resistive heater during laser irradiation. The heated sample has many defects and becomes to be fragile. This imperfection of the structure compared to the sample without heat treatment allows the effective etching by the focused laser beam. The etch rates were 65${\mu}{\textrm}{m}$/s and 270 ${\mu}{\textrm}{m}$/s at room temperature and 20$0^{\circ}C$, respectively.y.

• 한국정밀공학회지
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• 제22권7호
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• pp.71-78
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• 2005

The purpose of this study is to suggest a hyperfine maskless writing technique by using the nanoindentation and HF wet etching technique. Indents were made on the surface of Pyrex7740 glass by the hyperfine indentation process with a Berkovich diamond indenter, and they were etched in $50\;wr\%$ HF solution. After etching process, convex structure was obtained due to the deformation-induced hillock phenomena. In this study, effects of indentation process parameters (etching time, normal load, loading .ate, hold-time at the maximum load) on the morphologies of the indented surfaces after isotopic etching were investigated from an angle of deformation energies. Finally, sample characters were written to show the possibility of the application.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 춘계학술대회 논문집
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• pp.225-228
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• 2005

The purpose of this study is to investigate effects of the plastic/elastic deformation energy on wet etching characterization on the surface of material by using the nanoindentation and HF wet etching technique. Indents were made on the surface of Pyrex 7740 glass by the hyperfine indentation process with a Berkovich diamond indenter, and they were etched in $50\;wt\%$ HF solution. After etching process, convex structure was obtained due to the deformation-induced hillock phenomena. In this study, effects of indentation process parameters (normal load, loading rate) on the morphologies of the indented surfaces after isotopic etching were investigated from an angle of deformation energies.