• Title/Summary/Keyword: Electroplating device

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Fabrication of Micro-inductor and Capacior For RF MEMS Applications

  • Cho, Bek-Hee;Lee, Jae-Ho;Bae, Young-Ho;Cho, Chan-Sub;Lee, Jong-Hyun
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.2 no.2
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    • pp.102-110
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    • 2002
  • In this paper, we present the fabrication of tunable capacitors and 3-dimensional inductors. This work was related to fabricated 3-dimensional device for need of micro device in developing new intelligence age. This device was fabricated by electroplating used electroplating PR and high-vacuum evaporation of metal. Fabricated micro-inductor is consisted of air-bridge on electroplating rod and electroplated core. Micro-capacitor is consisted of thin metal membrane and electroplated core. Electroplating material is used Cu metal solvent. Air-gap between metal-layers function as almost perfect isolation layer. The most advantage of our micro-inductor and micro-capacitor compared to present device is a possibility that can fabricate on RF MEMS(microelectro-mechanical systems) application with high performance and various function. In this paper, we present the fabrication of tunable capacitors and 3-dimensional inductors. This work was related to fabricated 3-dimensional device for need of micro-device in developing new intelligence age. This device was fabricated by electroplating used electroplating PR and high-vacuum evaporation of metal. Fabricated micro-inductor is consisted of air-bridge on electroplating rod and electroplated core. Micro-capacitor is consisted of thin metal membrane and electroplated core. Electroplating material is used Cu metal solvent. Air-gap between metal-layers function as almost perfect isolation layer. The most advantage of our micro-inductor and micro-capacitor compared to present device is a possibility that can fabricate on RF MEMS application with high performance and various functions.

Manufacturing of Ni-63 Sealed Source for Betavoltaic Battery Using the Small-scale Electroplating Device (소형 전기도금장치를 이용한 베타전지용 Ni-63 밀봉선원 제작)

  • Kim, Jin Joo;Choi, Sang Mu;Son, Kwang Jae;Hong, Jintae
    • Journal of Radiation Industry
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    • v.11 no.3
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    • pp.173-179
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    • 2017
  • The small-scale electroplating device was designed and fabricated for Ni-63 sealed source (foil type) with a high specific activity needed for production of betavoltaic battery. The condition of Ni electroplating was optimized by using fabricated electroplating device to establish a Ni-63 electroplating condition on the Ni foil. The results showed that the optimum surface morphology and thickness of Ni deposit was obtained for 1,758 seconds at a current density of $15mA{\cdot}cm^{-2}$ with 0.5% tween 20. Radioisotope Ni-63 electroplating was implemented under established condition. The radioactivity of Ni-63 sealed source was calculated to $28mCi{\cdot}cm^{-2}$, and the thickness of Ni-63 deposit was about $2.4{\mu}m$.

Design and Development of Micro Combustor (II) - Design and Test of Micro Electric Spark discharge Device for Power MEMS - (미세 연소기 개발 (II) - 미세동력 장치용 미세 전극의 제작과 성능평가 -)

  • Gwon, Se-Jin;Lee, Dae-Hun;Park, Dae-Eun;Yun, Jun-Bo;Han, Cheol-Hui
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.26 no.4
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    • pp.524-530
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    • 2002
  • Micro electric spark discharge device was fabricated on a FOTURAN glass wafer using MEMS processing technique and its performance of electron discharge and subsequent formation of ignition kernel were tested. Micro electric spark device is an essential subsystem of a power MEMS that has been under development in this laboratories. In a combustion chamber of sub millimeter scale depth, spark electrodes are formed by electroplating Ni on a base plate of FOTURAN glass wafer. Optimization of spark voltage and spark gap is crucial for stable ignition and endurance of the electrodes. Namely, wider spark gaps insures stable ignition but requires higher ignition voltage to overcome the spark barrier. Also, electron discharge across larger voltage tends to erode the electrodes limiting the endurance of the overall system. In the present study, the discharge characteristics of the proptotype ignition device was measured in terms of electric quantities such as voltage and currant with spark gap and end shape as parameters. Discharge voltage shows a little decrease in width of less than 50㎛ and increases with electrode gap size. Reliability test shows no severe damage over 10$\^$6/ times of discharge test resulting in satisfactory performance for application to proposed power MEMS devices.

A Fabrication Method of Blade Type Tip for Probe Unit Device (프르브유닛 소자용 블레이드형 팁 제조방법)

  • Lee, Keun-Woo;Lee, Jae-Hong;Kim, Chang-Kyo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.8
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    • pp.1436-1440
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    • 2007
  • Beryllium copper has been known to be an important material for the various fields of industry because it can be used for mechanical and electrical/electronic components that are subjected to elevated temperatures (up to $400^{\circ}C$ for short times). Blade type tip for probing the cells of liquid crystal display(LCD) was fabricated using beryllium copper foil. The dry film resist was employed as a mask for patterning of the blade type tip. The beryllium copper foil was etched using hydrochloric acidic iron-chloride solution. The concentration, temperature, and composition ratio of hydrochloric acidic iron-chloride solution affect the etching characteristics of beryllium copper foil. Nickel with the thickness of $3{\mu}m$ was electroplated on the patterned copper beryllium foil for enhancing its hardness, followed by electroplating gold for increasing its electrical conductivity. Finally, the dry film resist on the bridge was removed and half of the nickel was etched to complete the blade type tip.

Magnetic & Crystallographic Properties of Patterned Media Fabricated by Nanoimprint Lithography and Co-Pt Electroplating (나노임프린트 패터닝과 자성박막도금을 이용하여 제작한 패턴드미디어용 자기패턴의 자기적 및 결정구조특성에 관한 연구)

  • Lee, B.K.;Lee, D.H.;Lee, M.B.;Kim, H.S.;Cho, E.H.;Sohn, J.S.;Lee, C.H.;Jeong, G.H.;Suh, S.J.
    • Journal of the Korean Magnetics Society
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    • v.18 no.2
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    • pp.49-53
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    • 2008
  • Magnetic and crystallographic properties of patterned media fabricated by nanoimprint lithography and Co-Pt electroplating were studied. Thin films of Ru(20 nm)/Ta(5 nm)/$SiO_2$(100 nm) were deposited on Si(100) wafer and then 25 nm hole pattern was fabricated by nanoimprint lithography on substrate. The electroplated Co-Pt nano-dots have the diameter of 35 nm and the height of 27 nm. Magnetic dot patterns of Co-Pt alloy were created using electroplated Co-Pt alloy and then their properties were measured by MFM, SQUID, SEM, TEM and AFM. We observed single domain with perendicular anisotropy for each dot and achieved optimum coercivity of 2900 Oe. These results mean that patterned media fabricated by nanoimprint lithography and electroplating have good properties in view of extending superparamagnetic limit while satisfying the writability requirements with the present write heads.

Wafer Level Packaging of RF-MEMS Devices with Vertical feed-through (Ultra Thin 실리콘 웨이퍼를 이용한 RF-MEMS 소자의 웨이퍼 레벨 패키징)

  • 김용국;박윤권;김재경;주병권
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12S
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    • pp.1237-1241
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    • 2003
  • In this paper, we report a novel RF-MEMS packaging technology with lightweight, small size, and short electric path length. To achieve this goal, we used the ultra thin silicon substrate as a packaging substrate. The via holes lot vortical feed-through were fabricated on the thin silicon wafer by wet chemical processing. Then, via holes were filled and micro-bumps were fabricated by electroplating. The packaged RF device has a reflection loss under 22 〔㏈〕 and a insertion loss of -0.04∼-0.08 〔㏈〕. These measurements show that we could package the RF device without loss and interference by using the vertical feed-through. Specially, with the ultra thin silicon wafer we can realize of a device package that has low-cost, lightweight and small size. Also, we can extend a 3-D packaging structure by stacking assembled thin packages.

Surface Properties of ITO Thin Film by Planarization (광역평탄화에 따른 투명전도박막의 표면특성)

  • Choi, Gwon-Woo;Lee, Woo-Sun;Seo, Yong-Jin
    • Proceedings of the KIEE Conference
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    • 2006.10a
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    • pp.95-96
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    • 2006
  • ITO thin film is generally fabricated by various methods such as spray, CVD, evaporation, electron gun deposition, direct current electroplating, high frequency sputtering, and reactive DC sputtering. However, some problems such as peaks, bumps, large particles, and pin-holes on the surface of ITO thin film were reported, which caused the destruction of color quality, the reduction of device life time, and short-circuit. Chemical mechanical polishing (CMP) process is one of the suitable solutions which could solve the problems.

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High power gate driver design using 555 timer and photo coupler for electronic/hybrid car and electroplating rectifier (전기/하이브리드 자동차, 도금용 정류기 등에 적용이 가능한 555 timer와 Photo Coupler를 이용한 대용량 SCR/IGBT용 Gate Driver 설계)

  • Cho, Eun Seok;Ko, Jae Su;Lee, Yong Keun
    • Korea Science and Art Forum
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    • v.20
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    • pp.421-428
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    • 2015
  • Electronic/hybrid car and electroplating rectifier should have switching devices such as SCR, MOSFET, IGBT. And those switching devices should be operated by gate driver. In this paper, we propose high power gate driver that contains H-Bridge using 4 BJTs. H-Bridge and transformer generate isolate power. And gate control signal is transferred to isolated one by photo coupler and operate real switching device. We designed H-Bridge and 555-Timer by PSpice simulation and manufactured real product. Finally we succeed to operate 27V 50,000A electroplating rectifier using proposed gate driver.

Factors Influencing Edge Dendritic Plating of Steel Sheet in the Electro-Galvanizing Line

  • Du-Hwan Jo;Moonjae Kwon;Doojin Paik;Myungsoo Kim
    • Corrosion Science and Technology
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    • v.23 no.3
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    • pp.215-220
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    • 2024
  • Recently, the demand for Zn-Ni electrogalvanized steel sheets for home appliances and automobiles is increasing. Products should have a thick plating (30 to 40 g/m2) on both side with a thin thickness (≤ 0.8 mm) and the highest surface quality. By a high current density operation, current is concentrated in the edge part of the steel sheet, resulting in large surface dent defects due to dendritic plating. This can lead to a low productivity due to low line speed operation. To solve this problem, this study aimed to identify factors influencing dendritic plating. A cylindrical electroplating device was manufactured. Effects of cut edge shape and thickness of steel plate, current density, temperature, flow rate, electrolyte concentration, and pH on dendrite generation of Zn-Ni electroplating were examined. To investigate effect of edge shape of the steel sheet, the steel sheet was manufactured using three processing methods: shearing, polishing after shearing, and laser. Relative effects thickness and cut edge processing methods of the steel plate, current density, temperature, flow rate, electrolyte concentration, and pH of plating solution on dendrite plating were investigated. To prevent dendrite plating, an edge mask was manufactured and its application effect was investigated.

DESIGN OF A CHECK VALVE FOR FEEDING BIOLOGICAL CELLS ONE BY ONE (세포의 개별 공급을 위한 체크 밸브의 설계)

  • Choi, Jung-Hoon;Lee, Sang-Wook;Kim, Yong-Kweon
    • Proceedings of the KIEE Conference
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    • 1994.07a
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    • pp.85-87
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    • 1994
  • Feeding biological cells one by one is the key point in the manipulation of cells. The conventional valve systems have many difficulties in feeding cells one by one, because they shut the whole flow of fluids when they are closed and have possibilities of breaking the fragile cells. They need some other equipments for continuous supply of suspension and to protect the cells. We design a check valve for feeding biological cells one by one using polyimide all the silicon substrate. The cells are fed by hydraulic pressure through the isotropically etched cavity. When the suspension flows continuously along the channel the valve is bent by hydraulic pressure and a cell is fed to the outlet. We have studied a cell fusion device fabricated with polyimide and electroplating. If the designed check valve is located in front of the cell fusion device it is helpful to fuse two different kinds of cells.

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