• 제목/요약/키워드: Electron beam exposure time

검색결과 20건 처리시간 0.025초

유암수술후 방사선치료시 $^{60}Co\;\gamma$선과 전자선 조사야 접합부 선량분포에 관한 연구 (A Study on Dobe Distribution at the Junction of $^{60}CO\;\gamma-Ray$ and Elecron Beam in Postoperative Radiotherapy of Breast Cancer)

  • 강위생;허승재;하성환
    • Radiation Oncology Journal
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    • 제2권1호
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    • pp.149-153
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    • 1984
  • Postoperative radiotherapy of breast cancer makes it possible to reduce loco-regional recurrence of breast cancer. The treatment technique, which can reduce the low-dose region at the junction and lung, is required. To produce proper dose distribution of internal mammary chain and chest wall, authors tried to find the method to expose $^{60}Co\;\gamma-ray$ on internal mammary region and 7MeV electron on chest wall. Exposure time of $^{60}Co\;\gamma$ and monitor unit of 9MeV were selected so that dose of $^{60}Co$ at 4cm depth was the same as that of 7Mev electron at $80\%$ dose depth. The position and direction of electron beam were changed for $^{60}Co$ beam: $0^{\circ},\;5^{\circ}$ for 0cm seperation; $0^{\circ},\;5^{\circ},\;10^{\circ}$ for 0.5cm seperation; $5^{\circ},\;10^{\circ},\;15^{\circ}$ for 1cm seperation. The results are as followings. 1. When the seperation of two fields was increased, dose on the axis of $^{60}Co$ beam was increased and dose at the junction region decreased while the volume of lung to be exposed to high dose and hot spot size were irregularly changed. 2. The dose distribution in the target volume of internal mammary and chest wall was most ideal when the seperation of two fields was $0\~0.5cm$ and the direction of electron beam was parallel to $^{60}Co$ beam.

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전자선 직접묘사에서 Through-put이 향상된 단위 矩形묘사방법 (Unit-Rectangle Exposure Method for Advanced Through-put in Electron-Beam Direct Writing Lithography)

  • 박선우;김철주
    • 대한전자공학회논문지
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    • 제26권2호
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    • pp.112-117
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    • 1989
  • 본 논문은 패턴의 모양에 따라서 패턴 데이타 포멥변환시 분할되는 각종 矩形패턴을 크기에 구애됨이 없이 전자선 직접묘사 시간이 일정한 矩形단위로 전자선 직접묘사하는 방법을 제안하였다. 본 실험에서는 SEM을 사용하였으며 矩形의 크기에 따라 일정시간에 요구되는 전자선 전류를 변화시키기 위하여 집속렌즈의 공급전류를 BITMAP-IV CAD 시스템으로 제어하였다. 본방법에서는 패턴 데이타 포맵변환시 밀집된 패턴에 대한 resizing과정이 불필요하며 묘사시간에 근거한 through-put은 unit scan방식에 비하여 172배가 향상되었다.

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전자선 석판 기술에서 디지타이징과 노광후굽기 최적화를 통한 40 nm 급 패턴 제작에 관한 연구 (Study on 40 nm Electron Beam Patterning by Optimization of Digitizing Method and Post Exposure Bake)

  • 한상연;신형철;이귀로
    • 전자공학회논문지D
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    • 제36D권10호
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    • pp.23-30
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    • 1999
  • 본 논문에서는 전자선 직접 묘화 시스템을 이용하여 50 nm 이하의 패턴 폭을 가지는 패터닝 결과를 얻기 위한 실험을 수행하였다. SAL601 negative E-beam PR(Photo Resist)를 이용하여 실험을 진행하였고, E-beam 장비의 특성을 최대로 이용하기 위해서 PR의 두께를 100nm로 줄이고, field 크기를 200 ${um}m$로 줄여 실험하였으며, 또한 SAL601 PR의 경우 작은 선폭을 얻기 위해 중요한 요인 중에 하나인 PEB (Post Expose Bake) 온도와 시간을 줄이면서 실험을 진행하였다. 여기에 디지타이징 방식의 최적화를 통하여 50 nm 이하의 패턴 폭을 가지는 단선 패터닝 결과를 얻었다. 이 공정을 이용하여 단전자 메모리 소자에 응용 가능한 50 nm 급의 silicon 양자선과 silicon 양자점을 제작하였다. 이는 현재 많이 연구되고 있는 단전자 기억소자 및 국소 채널 MOS소자 제작에 유용할 것이다.

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Resist 표면 거칠기 예측을 위한 전자빔 리소그라피 시뮬레이션에 관한 연구 (A Study on Electron-beam Lithography Simulation for Resist Surface Roughness Prediction)

  • 김학;한창호;이기용;이우진;전국진
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2002년도 하계종합학술대회 논문집(2)
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    • pp.45-48
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    • 2002
  • This paper discusses the surface roughness of negative chemically amplified resists, SAL601 exposed by I-beam direct writing. system. Surface roughness, as measured by atomic force microscopy, have been simulated and compared to experimental results. Molecular-scale simulator predicts the roughness dependence on material properties and process conditions. A chemical amplification is made to occur in the resists during PEB process. Monte-Carlo and exposure simulations are used as the same program as before. However, molecular-scale PEB simulation has been remodeled using a two-dimensional molecular lattice representation of the polymer matrix. Changes in surface roughness are shown to correlate with the dose of exposure and tile baking time of PEB process. The result of simulation has a similar tendency with that of experiment.

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MIM(Metal-Insulator-Metal) Cathode를 이용한 Lithography 연구 (A Study on the lithography using MIM cathodes)

  • 최광남;곽성관;정관수;김동식;강창수
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2005년도 추계종합학술대회
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    • pp.1253-1256
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    • 2005
  • We have developed an electron lithography method, Electron Emission Lithography (EEL), which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design of the mask, manufactured by standard MIM technology, will be discussed. Patterns printed into e-beam resist by a 1:1 projection system show the applicability of the mask for lithography purposes. The minimum feature size projected so far is 10 um in a system capable of 100 m resolution. Further improvements in resolution to 50 nm are possible.

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몬테칼로 시뮬레이션을 활용한 양성자가속기 단기사용 시 구성품의 방사화 평가 (A Study on the Radioactive Products of Components in Proton Accelerator on Short Term Usage Using Computed Simulation)

  • 배상일;김정훈
    • 대한방사선기술학회지:방사선기술과학
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    • 제43권5호
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    • pp.389-395
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    • 2020
  • The evaluation of radioactivated components of heavy-ion accelerator facilities affects the safety of radiation management and the exposure dose for workers. and this is an important issue when predicting the disposal cost of waste during maintenance and dismantling of accelerator facilities. In this study, the FLUKA code was used to simulate the proton treatment device nozzle and classify the radio-nuclides and total radioactivity generated by each component over a short period of time. The source term was evaluated using NIST reference beam data, and the neutron flux generated for each component was calculated using the evaluated beam data. Radioactive isotopes caused by generated neutrons were compared and evaluated using nuclide information from the International Radiation Protection Association and the Korea Radioisotope association. Most of the nuclides produced form of beta rays and electron capture, and short-lived nuclides dominated. However, In the case of 54Mn, which is a radioactive product of iron, the effect of gamma rays should be considered. In the case of tritium generated from a material with a low atomic number, it is considered that handling care should be taken due to its long half-life.

MC-50 싸이클로트론을 이용한 위성용 열조절 유기복합재료의 우주환경 영향 연구 (RESEARCH ON SPACE ENVIRONMENTAL EFFECT OF ORGANIC COMPOSITE MATERIALS FOR THERMAL MANAGEMENT OF SATELLITES USING MC-50 CYCLOTRON)

  • 김대원;김동일;허용학;양태건;이호영;김용협
    • Journal of Astronomy and Space Sciences
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    • 제22권4호
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    • pp.441-450
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    • 2005
  • 유기재료(organic material)는 위성이나 우주비행체의 열을 조절하고 우주환경에 직접 노출되는 것을 차단하기 위하여 가장 흔하게 사용되는 재료 중 하나이다. 본 논문에서는 지상설비를 이용하여 모사한 우주환경에서 유기재료의 물성변화를 관찰하였다. 대표적인 위성용 유기 열조절 재료 중 하나인 2mil ITO(Indium Tin Oxide) coated aluminized KAPTON을 실험 대상으로 선택하였다. 양성자에 의한 단일 우주환경효과를 실험하기 위하여, 한국 원자력의학원의 MC-50 싸이클로트론(cyclotron)을 이용하여 양성자를 조사(irradiation)하였으며, 조사조건은 지구궤도 주변 최고의 양성자 발생기록인 1972년 8월의 최고치 상황을 적용하였다. 조사에너지는 평균 관측에너지인 30MeV으로 고정하였으며, 등가 조사량은 우주노출 시간 1년, 3년, 5년 및 10년을 기준으로 설정하였다. 분석과정은 인장강도를 측정하여 정량적 물성저하를 확인하였고, 전계방출 전자주사현미경 등으로 결정성변화와 노출표면의 손상을 분석하였다.

CNT-BASED FIELD EMISSION X-RAY SOURCE

  • Kim, Hyun Suk;Lee, Choong Hun
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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    • pp.433-433
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    • 2016
  • Carbon nanotubes (CNT) emitter has widely become an attractive mechanism that draws growing interests for cold cathode field emission. CNT yarns have demonstrated its potential as excellent field emitters. It was demonstrated that a small focal spot size was achieved by manipulating some electrical parameters, such as applied bias voltage at the mesh gate, and electrostatic focal lenses, geometrical parameters, such as axial distances of the anode, and the electrostatic focal lens from the cathode assembly, and the dimension of the opening of the electrostatic lens. Electrical-optics software was used to systematically investigate the behavior of the electron beam trajectory when the aforementioned variables were manipulated. The results of the experiment agree with the theoretical simulation results. Each variable has an individual effect on the electron beam focal spot size impinging on the target anode. An optimum condition of the parameters was obtained producing good quality of X-ray images. Also, MWCNT yarn was investigated for field emission characteristics and its contribution in the X-ray generation. The dry spinning method was used to fabricate MWCNT yarn from super MWCNTs, which was fabricated by MW-PECVD. The MWCNT yarn has a significant field emission capability in both diode and the triode X-ray generation structure compared to a MWCNT. The low-voltage-field emission of the MWCNT yarn can be attributed to the field enhancing effect of the yarn due to its shape and the contribution of the high-aspect-ratio nanotubes that protrude from the sides of the yarn. Observations of the use of filters on the development of X-ray images were also demonstrated. The amount of exposure time of the samples to the X-ray was also manipulated. The MWCNT yarn can be a good candidate for use in the low voltage field emission application of X-ray imaging.

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EM Radioautographic Techniques에 관(關)한 연구(硏究) - Cork 방법(方法) - (An Improved Method for EM Radioautographic Techniques using Cork)

  • 김명국
    • Applied Microscopy
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    • 제10권1_2호
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    • pp.7-17
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    • 1980
  • Electron microscope radioautography introduced by Liquier-Milward (1956) is now used routinely in many laboratories. Most of the technical difficulties in specimen preparation have been overcome. This method is modified from loop method for improvement of EM radioautographic techniques. The advantages of this method are: 1. the use of single specimens on small corks and of a large wire loop, allows the experimenter to avoid the blemishes in the membrane; 2. the surfactant dioctyl sodium sulphosuccinate is added to diluted ILford L4, thus greatly prolonging the period of time over which good emulsion layers can be made; 3. corks can be handled in perspex holder which allows about 20 specimens to be developed simultaneously. The steps of the method comprise: 1. Cut ribbons of ultrathin sections of silver interference colour 2. Pick them up on formvar-coated 200 mesh grids 3. Prestaining of tissues 4. Coat the specimens with a thin layer of carbon by evaporation (30-60A) 5. Mount the specimens on corks (about 1cm apical diameter) using double-sided scotch tape 6. Emulsion coating; a. Take a 250m1 beaker, place it on the pan of a sliding weight balance and weigh it. Add 10 grams extra to the beam. Add pieces of ILford L4 emulsion to the beaker until the balance is swinging freely. Add the 20ml of distilled water that was previously measured out. b. Surfactant dioctyl sodium sulphosuccinate is added to diluted ILford L4. 7. Prepare a series of membranes of gelled emulsion with the wire loop and apply one to each cork-borne specimen. 8. Put the specimens away to expose by pushing the corks into short length of PVC tubing, each tube having a small hole in the side 9. Place the tubes in small boxes together with silica gel. 10. Exposure 11. Developer - Kodak Microdol X for 3 minutes 12. Fixer - A perspex holder can be manufactured which allows 20 specimens to be developed simultaneously. 12. Fixer - 30% sodium thiosulfate for 10 minutes 13. Examination with Siemens Elmiskop 1A electron microscope

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Quasi-monochromatic Parallel Radiography Achieved with a Polycapillary Plate

  • Sato, Eiichi;Komatsu, Makoto;Hayasi, Yasuomi;Tanaka, Etsuro;Mori, Hidezo;Kawai, Toshiaki;Ichimaru, Toshio;Takayama, Kazuyoshi;Ido, Hideaki
    • 한국의학물리학회:학술대회논문집
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    • 한국의학물리학회 2002년도 Proceedings
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    • pp.418-421
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    • 2002
  • Fundamental study on quasi-monochromatic parallel radiography using a polycapillary plate and a plane-focus x-ray tube is described. The x-ray generator consists of a negative high-voltage power supply, a filament (hot cathode) power supply, and an x-ray tube. The negative high-voltage is applied to the cathode electrode, and the transmission type target (anode) is connected to the ground potential. The maximum voltage and current of the power supply were -100 kV (peak value) and 3.0 mA, respectively. In this experiment, the tube voltage was regulated from 20 to 25 kV, and the tube current was regulated by the filament temperature and ranged from 1.0 to 3.0 mA. The exposure time is controlled in order to obtain optimum film density, and the focal spot diameter was about 10 mm. The polycapillary plate is J5022-21 made by Hamamatsu Photonics Inc., and the outside and effective diameters are 87 and 77 mm, respectively. The thickness and the hole diameter of the polycapillary are 1.0 mm and 25 ${\mu}$m, respectively. The x-rays from the tube are formed into parallel beam by the polycapillary, and the radiogram is taken using an industrial x-ray film of Fuji IX 100 without using a screen. In the measurement of image resolution, we employed three brass spacers of 2, 30, and 60 mm in height. By the test chart, the resolution fell according to increases in the spacer height without using a polycapillary. In contrast, the resolution slightly fell with corresponding increases in the height by the polycapillary. In angiography, fine blood vessels of about 100 ${\mu}$m are clearly visible.

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