Proceedings of the IEEK Conference (대한전자공학회:학술대회논문집)

The Institute of Electronics and Information Engineers (대한전자공학회)
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A Study on the lithography using MIM cathodes

MIM(Metal-Insulator-Metal) Cathode를 이용한 Lithography 연구

  • Choi, Kwang-Nam (Electronic Engineering Department, Kyunghee University) ;
  • Kwak, Sung-Kwan (Electronic Engineering Department, Kyunghee University) ;
  • Chung, Kwan-Soo (Electronic Engineering Department, Kyunghee University) ;
  • Kim, Dong-Sik (School of Computing & Information System, Inha Technical College) ;
  • Kang, Chang-Soo (Dept. of Electronic Engineering Information, Yuhan College)
  • 최광남 (경희대학교 전자공학과) ;
  • 곽성관 (경희대학교 전자공학과) ;
  • 정관수 (경희대학교 전자공학과) ;
  • 김동식 (인하공업전문대학 컴퓨터정보공학부) ;
  • 강창수 (유한대학 전자정보과)
  • Published : 2005.11.26
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Abstract

We have developed an electron lithography method, Electron Emission Lithography (EEL), which is capable of printing integrated circuits with an exposure time of only a few seconds. The basic design of the mask, manufactured by standard MIM technology, will be discussed. Patterns printed into e-beam resist by a 1:1 projection system show the applicability of the mask for lithography purposes. The minimum feature size projected so far is 10 um in a system capable of 100 m resolution. Further improvements in resolution to 50 nm are possible.

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