• Title/Summary/Keyword: Electron Source

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OPTIMIZATION OF OPERATION PARAMETERS OF 80-KEV ELECTRON GUN

  • Kim, Jeong Dong;Lee, Yongdeok;Kang, Heung Sik
    • Nuclear Engineering and Technology
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    • v.46 no.3
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    • pp.387-394
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    • 2014
  • A Slowing Down Time Spectrometer (SDTS) system is a highly efficient technique for isotopic nuclear material content analysis. SDTS technology has been used to analyze spent nuclear fuel and the pyro-processing of spent fuel. SDTS requires an external neutron source to induce the isotopic fissile fission. A high intensity neutron source is required to ensure a high for a good fissile fission. The electron linear accelerator system was selected to generate proper source neutrons efficiently. As a first step, the electron generator of an 80-keV electron gun was manufactured. In order to produce the high beam power from electron linear accelerator, a proper beam current is required form the electron generator. In this study, the beam current was measured by evaluating the performance of the electron generator. The beam current was determined by five parameters: high voltage at the electron gun, cathode voltage, pulse width, pulse amplitude, and bias voltage at the grid. From the experimental results under optimal conditions, the high voltage was determined to be 80 kV, the pulse width was 500 ns, and the cathode voltage was from 4.2 V to 4.6 V. The beam current was measured as 1.9 A at maximum. These results satisfy the beam current required for the operation of an electron linear accelerator.

Development and Evaluation of an Electron Beam Source for Microscopy and Its Applications

  • Ahn, Seung-Joon;Oh, Tae-Sik;Kim, Ho-Seob;Ahn, Seong-Joon
    • Journal of the Optical Society of Korea
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    • v.14 no.2
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    • pp.127-130
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    • 2010
  • We have developed an efficient electron beam (e-beam) source, a microcolumn, that can be used as a source module for of microscopy and its applications. To obtain a low operating voltage, a very sharp cold field electron emitter was developed by electrochemically etching a tungsten wire. Laser diffraction was used for the fabrication of high-quality electron lenses and for their precise alignment. The measurement of the e-beam currents, and SEM images captured by the microcolumn confirmed the potential of the device as a very good e-beam source.

Characterization of the 2.5 MeV ELV electron accelerator electron source angular distribution using 3-D dose measurement and Monte Carlo simulations

  • Chang M. Kang;Seung-Tae Jung;Seong-Hwan Pyo;Youjung Seo;Won-Gu Kang;Jin-Kyu Kim;Young-Chang Nho;Jong-Seok Park;Jae-Hak Choi
    • Nuclear Engineering and Technology
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    • v.55 no.12
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    • pp.4678-4684
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    • 2023
  • Using the Monte Carlo method, the impact of the angular distribution of the electron source on the dose distribution for the 2.5 MeV ELV electron accelerator was explored. The experiment measured the 3-D dose distribution in the irradiation chamber for electron energies of 1.0 MeV and 2.5 MeV. The simulation used the MCNP6.2 code to evaluate three angular distribution models of the source: a mono-directional beam, a cone shape, and a triangular shape. Of the three models, the triangular shape with angles θ = 30°, φ = 0° best represents the angle of the scan hood through which the electron beam exits. The MCNP6.2 simulation results demonstrated that the triangular model is the most accurate representation of the angular distribution of the electron source for the 2.5 MeV ELV electron accelerator.

The electrical and optical properties of Xe plasma in flat lamp (평판형 광원에서 제논(Xe) 플라즈마의 전기적 광학적 특성 연구)

  • Pack, Gwang-Hyeon;Yang, Jong-Kyung;Lee, Jong-Chan;Chio, Yong-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.05b
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    • pp.60-64
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    • 2005
  • Discharge of the flat lamp lighting source research are requested very much. For improving brightness, life time, efficiency of flat lamp, plasma diagnosis of the flat lamp lighting source to understand property of lighting source is very important, distance of discharge electrode is 5.5mm and width is 16.5mm, we measured electron temperature and electron density measured with single langmuir probe in flat lamp, we tested the discharge from 100 Torr to 300 Torr pressure, the Pulse is rectangular pulse with frequency 20kHz and Duty ratio 20%. Resultly, electron temperature decreases and electron density increase as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

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Xe Plasma property with flat lamp by Langmuir probe (정전탐침법을 사용한 평판형 광원의 제논(Xe)플라즈마 특성 연구)

  • Pack, Gwang-Hyeon;Yang, Jong-Kyung;Lee, Jong-Chan;Choi, Yang-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2005.07a
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    • pp.572-573
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    • 2005
  • Discharge of the flat lamp lighting source research are requested very much. For improving brightness. life time. efficiency of flat lamp and plasma diagnosis of the flat lamp lighting source to understand property of lighting source is very important. When a distance of discharge electrode is 5.5mm and width is 16.5mm. we measured electron temperature and electron density measured with single Langmuir probe in flat lamp. We tested the discharge from 100 Torr to 300 Torr pressure. The pulse type was rectangular with frequency 20kHz and duty ratio was 20%. In result. electron temperature decreases and electron density increased as increase the gas pressure and electron temperature decreases and electron density increase as increase the voltage.

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A Study on Effective Source-Skin Distance using Phantom in Electron Beam Therapy

  • Kim, Min-Tae;Lee, Hae-Kag;Heo, Yeong-Cheol;Cho, Jae-Hwan
    • Journal of Magnetics
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    • v.19 no.1
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    • pp.15-19
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    • 2014
  • In this study, for 6-20 MeV electron beam energy occurring in a linear accelerator, the authors attempted to investigate the relation between the effective source-skin distance and the relation between the radiation field and the effective source-skin distance. The equipment used included a 6-20 MeV electron beam from a linear accelerator, and the distance was measured by a ionization chamber targeting the solid phantom. The measurement method for the effective source-skin distance according to the size of the radiation field changes the source-skin distance (100, 105, 110, 115 cm) for the electron beam energy (6, 9, 12, 16, 20 MeV). The effective source-skin distance was measured using the method proposed by Faiz Khan, measuring the dose according to each radiation field ($6{\times}6$, $10{\times}10$, $15{\times}150$, $20{\times}20cm^2$) at the maximum dose depth (1.3, 2.05, 2.7, 2.45, 1.8 cm, respectively) of each energy. In addition, the effective source-skin distance when cut-out blocks ($6{\times}6$, $10{\times}10$, $15{\times}15cm^2$) were used and the effective source-skin distance when they were not used, was measured and compared. The research results showed that the effective source-skin distance was increased according to the increase of the radiation field at the same amount of energy. In addition, the minimum distance was 60.4 cm when the 6 MeV electron beams were used with $6{\times}6$ cut-out blocks and the maximum distance was 87.2 cm when the 6 MeV electron beams were used with $20{\times}20$ cut-out blocks; thus, the largest difference between both of these was 26.8 cm. When comparing the before and after the using the $6{\times}6$ cut-out block, the difference between both was 8.2 cm in 6 MeV electron beam energy and was 2.1 cm in 20 MeV. Thus, the results showed that the difference was reduced according to an increase in the energy. In addition, in the comparative experiments performed by changing the size of the cut-out block at 6 MeV, the results showed that the source-skin distance was 8.2 cm when the size of the cut-out block was $6{\times}6$, 2.5 cm when the size of the cut-out block was $10{\times}10$, and 21.4 cm when the size of the cut-out block $15{\times}15$. In conclusion, it is recommended that the actual measurement is used for each energy and radiation field in the clinical dose measurement and for the measurement of the effective source-skin distance using cut-out blocks.

Evaporation Characteristics of Materials from an Electron Beam Evaporation Source (전자빔 증발원을 이용한 물질의 증발 특성)

  • Jeong, J.I.;Yang, J.H.;Park, H.S.;Jung, J.H.;Song, M.A.
    • Journal of the Korean institute of surface engineering
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    • v.44 no.4
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    • pp.155-164
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    • 2011
  • Electron beam evaporation source is widely used to prepare thin films by physical vapor deposition because it is very effective to vaporize materials and there is virtually no limit to vaporize materials including metals and compounds such as oxide. In this study, evaporation characteristics of various metals and compounds from an electron beam evaporation source have been studied. The 180 degree deflection type electron beam evaporation source which has 6-hearth crucibles and is capable of inputting power up to 10 kW was employed for evaporation experiment. 36 materials including metals, oxides and fluorides have been tested and described in terms of optimum crucible liner, evaporation state, stability, and so on. Various crucible liners have been tried to find out the most effective way to vaporize materials. Two types of crucible liners have been employed in this experiment. One is contact type liner, and the other is non-contact type one. It has been tried to give the objective information and the most effective evaporation method on the evaporation of materials from the electron beam evaporation source. It is concluded that the electron beam evaporation source can be used to prepare good quality films by choosing the appropriate crucible liner.

Research of 6MeV electron dose distribution (Electron therapy에서의 dose distribution에 관한 연구)

  • Je Jae Yong;Park Chul Woo;Jin Sung Jin;Park Eun Tae
    • 대한방사선치료학회:학술대회논문집
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    • 2005.06a
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    • pp.27-32
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    • 2005
  • Electron is used for the treatment of skin cancer, breast cancer, and head and neck cancer in clinic. Our study is performed to check the isodose distribut ion in source surface distance(SSD) and source bolus distance(SBD) setup, nipple influence to isodose distribution of electron, junctional area isodose variation of photon and electron field. Dosimetry is carried out with phantom, acryl, and film as the same condition of treatment setup. $8\%$ of isodose difference is noted with the surface distance(SSD) and source bolus distance(SBD) setup. To reduce the influence of nipple. corresponding volume of bolus should be removed. And bolus covering all the electron field reduced hot and cold spot of junctional area of photon.

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Electrical Properties of Plasma According to Gas Pressure and RF Power of Xe-Inductively Coupled Plasma (유도결합형 제논의 가스압력 및 RF전력에 따른 플라즈마의 전기적 특성)

  • Choi, Yong-Sung;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.12a
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    • pp.43-47
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    • 2006
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma (ICP). As results at several dependences of 20~100mTorr Xenon pressure, the brightness of discharge tube was higher (4,900 $cd/m^2$) than other conditions when Xe pressure was 20mTorr and RF power was 200W. In that case, the electron temperature and density were 3.58eV and $3.56{\times}10^{12}cm^2$, respectively. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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Electron Emission Property of Carbon Nanotubes Grown Using Different Source Gases

  • Han, Jae-Hee;Lee, Tae-Young;Yoo, Ji-Beom;Park, Chong-Yun;Jung, Tae-Won;Yu, Se-Gi;Yi, Whi-Kun;Kim, Jong-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2002.08a
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    • pp.658-661
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    • 2002
  • Chemical species during growth of carbon nanotubes (CNTs) in direct current-plasma enhanced chemical vapor deposition were studied in details using $C_3H_4-NH_3$ and $CO-NH_3$ mixtures through optical emission spectroscopy (OES). In the $C_3H_4-NH_3$ system, the relative intensities of CN (388.3 nm) and CH (431.4 nm) decreased and that of $C_2$ (436 nm) increased, leading to $sp^2$-graphization into the CNT structure, leading to improvement of field emission property of CNTs. In the $CO-NH_3$ system, the trend is completely reversed. Attributing to the atomic oxygen for helping the graphitization of carbon, CNTs could be grown under the flow rate of CO (180 sccm)-$NH_3$ (10 sccm). Through these results, we suggest the growth mechanism in our system.

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