• Korean Chemical Engineering Research
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• 제55권2호
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• pp.264-269
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• 2017

피치계 흑연섬유의 발열특성을 향상시키기 위하여 흑연섬유에 무전해법을 이용하여 구리 도금하였다. 구리 도금된 흑연섬유는 공기 분위기에서 열중량분석법을 실시하여 도금 시간에 따라 흑연섬유 표면에 구리가 도입된 양을 계산하였다. 또한, 전압에 따른 발열 온도는 섬유 가닥을 이용하여 열화상카메라로 관찰하였다. 무전해 도금의 시간이 증가함에 따라 도입된 구리의 양은 증가하였다. 20분 동안 무전해 도금한 섬유의 전기 전도도는 1594.3 S/cm이며, 발열 온도는 최대 $57.2^{\circ}C$로 가장 크게 나타났다. 이러한 결과는 도금시간이 증가함에 따라 전기 전도성이 우수한 구리가 흑연섬유 표면에 성장하고, 이에 따라 발열특성이 향상된 것으로 판단된다.

• 한국산학기술학회논문지
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• 제12권9호
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• pp.4015-4021
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• 2011

시아나이드 화합물과 같은 환경에 유해한 도금첨가제를 사용하지 않는 친환경적인 무전해 구리도금용 도금용액조성을 개발하기 위하여, potassium ferrocyanide, aminoacetic acid (=glycine), 2,2'-dipyridyl과 같은 첨가제를 이용하여 첨가제의 투입량 또는 조성비가 도금특성에 미치는 영향을 조사하였다. 무전해도금으로 적층된 구리도금층의 도금속도는 potassium ferrocyanide와 aminoacetic acid의 조성비가 20 mg/L과 0.01 mol/L 이었을 때, $9.5mg{\cdot}cm^{-2}{\cdot}hr^{-1}$으로 나타났으며, 도금경도의 변화도 도금속도와 연동하여 비례적으로 변화하였다. 하지만 potassium ferrocyanide를 첨가하지 않은 도금용액의 조성에서도 $9.1mmg{\cdot}cm^{-2}{\cdot}hr^{-1}$의 도금속도를 나타내었다.

• 한국신재생에너지학회:학술대회논문집
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• 한국신재생에너지학회 2007년도 춘계학술대회
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• pp.250-253
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• 2007

An evaporated Ti/Pd/Ag contact system is most widely used to make high-efficiency silicon solar cells, however, the system is not cost effective due to expensive materials and vacuum techniques. Commercial solar cells with screen-printed contacts formed by using Ag paste suffer from a low fill factor and a high shading loss because of high contact resistance and low aspect ratio. Low-cost Ni and Cu metal contacts have been formed by using electroless plating and electroplating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Ni/Cu alloy is plated on a silicon substrate by electro-deposition of the alloy from an acetate electrolyte solution, and nickel-silicide formation at the interface between the silicon and the nickel enhances stability and reduces the contact resistance. It was, therefore, found that nickel-silicide was suitable for high-efficiency solar cell applications. The Ni contact was formed on the front grid pattern by electroless plating followed by anneal ing at $380{\sim}400^{\circ}C$ for $15{\sim}30$ min at $N_{2}$ gas to allow formation of a nickel-silicide in a tube furnace or a rapid thermal processing(RTP) chamber because nickel is transformed to NiSi at $380{\sim}400^{\circ}C$. The Ni plating solution is composed of a mixture of $NiCl_{2}$ as a main nickel source. Cu was electroplated on the Ni layer by using a light induced plating method. The Cu electroplating solution was made up of a commercially available acid sulfate bath and additives to reduce the stress of the copper layer. The Ni/Cu contact was found to be well suited for high-efficiency solar cells and was successfully formed by using electroless plating and electroplating, which are more cost effective than vacuum evaporation. In this paper, we investigated low-cost Ni/Cu contact formation by electroless and electroplating for crystalline silicon solar cells.

• 접착 및 계면
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• 제4권2호
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• pp.10-20
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• 2003

This paper is relative to the electroless deposition of nickel or copper films on polyimide and polytetrafluoroethylene substrates. First, it is presented an original approach of the electroless process which consists in grafting nitrogenated functionalities on the polymer surfaces via plasma or VUV-assisted treatments operating in a nitrogen-based atmosphere ($NH_3$, $N_2$), and then in catalysing the grafted surfaces in an aqueous tin-free, Pd(+2)-based solution. Adhesion of the Pd(+2) catalytic species on polymer surfaces is explained by the formation of strong covalent bonds between these species and the grafted nitrogenated groups. Second, it is show how a fragmentation test performed in conjunction with electrical measurements can be used to characterize the practical adhesion of the electroless coatings deposited on flexible polymer substrates, and to evidence the influence of some experimental parameters (plasma treatment time and nature of the gas phase).

• 한국태양에너지학회:학술대회논문집
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• 한국태양에너지학회 2009년도 추계학술발표대회 논문집
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• pp.350-355
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• 2009

The crysralline silicon solar cell where the solar cell market grows rapidly is occupying of about 85% or more high efficiency and low cost endeavors many crystalline solar cells. The fabricaion process of high efficiency crystalline silicon solar cells necessitate complicated fabrication processes and Ti/Pd/AG contact, This metal contacts have only been used in limited areas in spite of their good srability and low contact resistance because of expensive materials and process. Commercial solar cells with screen-printed solar cells formed by using Ag paste suffer from loe fill factor and high contact resistance and low aspect ratio. Ni and Cu metal contacts have been formed by using electroless plating and light-induced electro plating techniques to replace the Ti/Pd/Ag and screen-printed Ag contacts. Copper and Silver can be plated by electro & light-induced plating method. Light-induced plating makes use the photovoltaic effect of solar cell to deposit the metal on the front contact. The cell is immersed into the electrolytic plating bath and irradiated at the front side by light source, which leads to a current density in the front side grid. Electroless plated Ni/ Electro&light-induced plated Cu/ Light-induced plated Ag contact solar cells result in an energy conversion efficiency of 16.446 % on 0.2~0.6${\Omega}$ cm, $20{\times}20mm^2$, CZ(Czochralski) wafer.

• 한국표면공학회지
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• 제32권3호
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• pp.372-376
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• 1999

The deposited Cu film on the ferrite magnet was more deposited comparing with that on the plastic magnet. The Cu film became thicker on the S pole comparing with that on the N pole in the both of magnets. The thickness and texture coefficient of deposited copper film affected with direction of line of magnetic force. The difference of pole had little or no effect to the texture coefficient of deposited nickel film. The reaction rate on ferrite magnet and S pole was faster comparing with that on plastic magnet and N pole.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2012년도 춘계학술발표회 논문집
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• pp.313-314
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• 2012

본 연구는 반도체 배선형성에 있어 무전해 방식의 동(Electroless Copper) 피막특성에 관한 연구이다. 반도체 동 배선을 습식 무전해 도금공정을 이용하여 형성하였고, 이의 피막에 대하여 기본적인 표면 및 단면 조직이나 결정구조, 밀도, 석출속도, 밀착성 등을 분석하였다. 이어, 배선용 특성으로 요구되는 배선 비저항과 열처리에 따른 저항변화를 실험을 통하여 고찰하였고, 표면조도 및 조직구조에 따라 EM에 대한 영향성을 고찰하였다. 이어 AR3.0에 배선폭 30nm급의 초미세 배선상에서의 Gap-fill 상태를 확인한 결과 void없이 충진됨을 확인할 수 있었다.

• 한국대기환경학회:학술대회논문집
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• 한국대기환경학회 2004년도 추계학술대회 논문집
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• pp.465-466
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• 2004

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2002년도 춘계학술발표회 초록집
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• pp.29-30
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• 2002

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2000년도 춘계학술발표회 초록집
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• pp.60-60
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• 2000