• Title/Summary/Keyword: Electrical-electronics Engineering

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Multi-Output LED Driver Integrated with 3-Switch Converter and Passive Current Balance for Portable Applications

  • Song, Sen;Ni, Kai;Chen, Guipeng;Hu, Yihua;Yu, Dongsheng
    • Journal of Power Electronics
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    • v.19 no.1
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    • pp.58-67
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    • 2019
  • This study presents a new portable eight-output light emitting diode (LED) driver. The eight output-channels are divided into two equal groups, and their output powers can be controlled individually by three active switches. In addition, a simple capacitor-based passive current balancing circuit (CBC) is employed in each port to guarantee that the currents of the four LEDs are the same. When compared with the conventionally used separate two-output isolated converters, the proposed one uses one less active switch. Moreover, zero-voltage-switching (ZVS) is achieved, which improves the power efficiency of the driver. Finally, a highly compact prototype is built, which can reach an efficiency of 94.6%.

FUZZY PETRI NETS AND THEIR APPLICATIONS TO FUZZY REASONING SYSTEMS CONTROL

  • Matsumoto, Tadashi;Sakaguchi, Atsushi;Tsuji, Kohkichi
    • Proceedings of the Korean Institute of Intelligent Systems Conference
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    • 1993.06a
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    • pp.1330-1333
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    • 1993
  • In this paper, first, the fuzzy Petri net inference mechanism with learning function is proposed by using the extended fuzzy Petri nets. Secondly, a control system with this new inference engine is proposed. This system can do automatically and easily the knowledge acquisition from the operator's empirical data and can also be controller adaptively under the big parameter change.

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Analysis of symmetrical three-phase induction motor fed by phase angle controlled sources

  • Abdul-baki, E.M.;Lazim, M.T.;Naser, M.Sh
    • 제어로봇시스템학회:학술대회논문집
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    • 1989.10a
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    • pp.1028-1034
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    • 1989
  • A method of analysis of the steady-state performance of induction motor with supply voltage controlled by cyclically-triggered inline thyristors is presented. Phase-variable model and asymmetrical components are not used in this analysis. Instead, Fast Fourier Transform technique and the method of multiple reference frames are employed to obtain the constant-speed performance of I.M. easily.

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Power Quality Improvement Using Hybrid Passive Filter Configuration for Wind Energy Systems

  • Kececioglu, O. Fatih;Acikgoz, Hakan;Yildiz, Ceyhun;Gani, Ahmet;Sekkeli, Mustafa
    • Journal of Electrical Engineering and Technology
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    • v.12 no.1
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    • pp.207-216
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    • 2017
  • Wind energy conversion systems (WECS) which consist of wind turbines with permanent magnet synchronous generator (PMSG) and full-power converters have become widespread in the field of renewable power systems. Generally, conventional diode bridge rectifiers have used to obtain a constant DC bus voltage from output of PMSG based wind generator. In recent years, together advanced power electronics technology, Pulse Width Modulation (PWM) rectifiers have used in WECS. PWM rectifiers are used in many applications thanks to their characteristics such as high power factor and low harmonic distortion. In general, L, LC and LCL-type filter configurations are used in these rectifiers. These filter configurations are not exactly compensate current and voltage harmonics. This study proposes a hybrid passive filter configuration for PWM rectifiers instead of existing filters. The performance of hybrid passive filter was tested via MATLAB/Simulink environment under various operational conditions and was compared with LCL filter structure. In addition, neuro-fuzzy controller (NFC) was preferred to increase the performance of PWM rectifier in DC bus voltage control against disturbances because of its robust and nonlinear structure. The study demonstrates that the hybrid passive filter configuration proposed in this study successfully compensates current and voltage harmonics, and improves total harmonic distortion and true power factor.

Stability of H2O2 as an Oxidizer for Cu CMP

  • Lee, Do-Won;Kim, Tae-Gun;Kim, Nam-Hoon;Kim, Sang-Yong;Chang, Eui-Goo
    • Transactions on Electrical and Electronic Materials
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    • v.6 no.1
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    • pp.29-32
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    • 2005
  • Chemical mechanical polishing is an essential process in the production of copper-based chips. On this work, the stability of hydrogen peroxide ($H_{2}O_{2}$) as an oxidizer of copper CMP slurry has been investigated. $H_{2}O_{2}$ is known as the most common oxidizer in copper CMP slurry. But $H_{2}O_{2}$ is so unstable that its stabilization is needed using as an oxidizer. As adding KOH as a pH buffering agent, stability of $H_{2}O_{2}$ decreased. However, $H_{2}O_{2}$ stability in slurry went up with putting in small amount of BTA as a film forming agent. There was no difference of $H_{2}O_{2}$ stability between pH buffering agents KOH and TMAH at similar pH value. Addition of $H_{2}O_{2}$ in slurry in advance of bead milling led to better stability than adding after bead milling. Adding phosphoric acid resulted in the higher stability. Using alumina C as an abrasive was good at stabilizing for $H_{2}O_{2}$.

Statistical Modeling of Pretilt Angle Control on the Homogeneous Polyimide Surface as a Function of Rubbing Strength and Baking Temperature

  • Kang Hee-Jin;Lee Jung-Hwan;Hwang Jeoung-Yeon;Yun Il-Gu;Seo Dae-Shik
    • Transactions on Electrical and Electronic Materials
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    • v.7 no.2
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    • pp.81-86
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    • 2006
  • In this paper, the response surface modeling of the control of the pretilt angle in the nematic liquid crystal on the homogeneous polyimide surface with different surface treatment is investigated. The pretilt angle is one of the main factors to determine the alignment of the liquid crystal display. The pretilt angle is measured to analyze the variation of the characteristics on the various process conditions. The rubbing strength and the hard baking temperature are considered as input factors. After the design of experiments is performed, the process model is then explored using the response surface methodology. The analysis of variance is used to analyze the statistical significance and the effect plots are also investigated to examine the relationship between the process parameters and the response.

Analysis of Propagation Characteristics of Acoustic Signal in Insulation Oil (음향신호의 유중 전파특성 분석)

  • Yun, Min-Young;Park, Kyoung-Soo;Wang, Guoming;Kim, Sun-Jae;Kil, Gyung-Suk
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.29 no.2
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    • pp.114-119
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    • 2016
  • This paper dealt with the propagation characteristics of acoustic signal in insulation oil for the purpose of improving the reliability of AE (acoustic emission) method used for condition monitoring of oil-immersed transformers. A discharge source was placed in insulation oil and AE sensors ($f_c$ :140 kHz) were attached on the oil tank to study the changes of velocity and propagation path with the depth and distance. The average velocity was 1,436 m/s and the velocity decreased with the increase of depth from the oil surface to 430 mm. The propagation paths were classified into three sections by the shortest reflection path of the detected signal. The minimum distinguishable distance in each section was 70 mm. It was also verified that PD (partial discharge) with a magnitude over than 500 pC can be detected by the AE sensors.

The etch characteristics of TiN thin films using in $CH_4$/Ar plasma ($CH_4$/Ar 플라즈마를 이용한 TiN 박막의 식각특성 연구)

  • Woo, Jong-Chang;Um, Doo-Seung;Kim, Gwan-Ha;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.247-248
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    • 2008
  • The etching characteristics of Titanium Nitride (TiN) and etch selectivity of TiN to $SiO_2$ and $HfO_2$ in $CH_4$/Ar plasma were investigated. It was found that TiN etch rate shows a non-monotonic behavior with increasing both Ar fraction in $CH_4$ plasma, RF power, and gas pressure. The maximum TiN etch rate of nm/min was obtained for $CH_4$ (80%)/Ar(20%) gas mixture. The plasmas were characterized using optical emission spectroscopy (OES) analysis measurements. From these data, the suggestions on the TiN etch characteristics were made.

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New Measurement Technique of the Resistive Leakage Current for Arrester Diagnosis (피뢰기 진단을 위한 저항분 누설전류의 새로운 측정기법)

  • Kil, G.S.;Han, J.S.;Song, J.Y.;Park, D.W.;Seo, H.D.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2004.05b
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    • pp.73-75
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    • 2004
  • Resistive leakage current following arresters is an important indicator of ageing, but total leakage current and its harmonic analysis are widely used in diagnosing arrester soundness because of difficulties in measuring resistive leakage current. In this paper, we proposed a new method for measuring resistive leakage current, which is quite different from the conventional methods such as a self-cancel method and a synchronous rectification method. The proposed method is based on that the magnitudes of resistive leakage currents are equal at the same voltage level. To confirm the possibility of the proposed method. we fabricated a leakage current measurement device and designed an analysis program that can analyze resistive leakage current. Comparing with other methods. this technique does not need a complex circuitry and is very simple to complete.

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The Dry Etching Characteristics of TiO2 Thin Films in N2/CF4/Ar Plasma

  • Choi, Kyung-Rok;Woo, Jong-Chang;Joo, Young-Hee;Chun, Yoon-Soo;Kim, Chang-Il
    • Transactions on Electrical and Electronic Materials
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    • v.15 no.1
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    • pp.32-36
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    • 2014
  • In this study, the etching characteristics of titanium dioxide ($TiO_2$) thin films were investigated with the addition of $N_2$ to CF4/Ar plasma. The crystal structure of the $TiO_2$ was amorphous. A maximum etch rate of 111.7 nm/min and selectivity of 0.37 were obtained in an $N_2/CF_4/Ar$ (= 6:16:4 sccm) gas mixture. The RF power was maintained at 700 W, the DC-bias voltage was - 150 V, and the process pressure was 2 Pa. In addition, the etch rate was measured as functions of the etching parameters, such as the gas mixture, RF power, DC-bias voltage, and process pressure. We used X-ray photoelectron spectroscopy to investigate the chemical state on the surface of the etched $TiO_2$ thin films. To determine the re-deposition and reorganization of residues on the surface, atomic force microscopy was used to examine the surface morphology and roughness of $TiO_2$ thin films.