• Nuclear Engineering and Technology
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• v.51 no.2
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• pp.518-525
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• 2019

The mechanical and corrosion behavior of the Russian zirconium fuel cladding alloy E110, predominantly used in VVERs, has been investigated for many decades. The recent commercialization of a new, optimized E110 alloy, produced on a sponge zirconium basis, gave the opportunity to compare the mechanical properties of the old and the new E110 fuel claddings. Axial and tangential tensile test experiments were performed with samples from both claddings in the MTA EK. Due to the anisotropy of the cladding tubes, the axial tensile strength was 10-15% higher than the tangential (measured by ring tensile tests). The tensile strength of the new E110G alloy was 11% higher than that of the E110 cladding at room temperature. Some samples underwent chemical treatment - slight oxidation in steam or hydrogenation - or heat treatment - in argon atmosphere at temperatures between 600 and $1000^{\circ}C$. The heat treatment during the oxidation had more significant effect on the tensile strength of the claddings than the oxidation itself, which lowered the tensile strength as the thickness of the metal decreased. The hydrogenation of the cladding samples slightly lowered the tensile strength and the samples but they remained ductile even at room temperature.

• Journal of the Korean Vacuum Society
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• v.15 no.1
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• pp.45-49
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• 2006

The changes in the optical anisotropy of the clean Cu(110) and the oxygen covered Cu(110) surfaces due to Cu growth have been studied by reflectance difference spectroscopy(RDS). We have monitored the growth mode of Cu atoms on Cu(110) and Cu(110)-(2XlO surfaces at 250K and checked the surfactant effect of oxygen during the Cu growth. For Cu grow on Cu(110) and Cu(110)-(2Xl)O surface at low temperature, we observed evidence for the layer-by-layer growth mode with change of 4.25eV peak intensity.

• Nuclear Engineering and Technology
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• v.50 no.3
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• pp.425-431
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• 2018

Different methods of axial and tangential testing and various sample geometries were investigated, and new test geometries were designed to determine the ultimate tensile strength of zirconium cladding tubes. The finite element method was used to model the tensile tests, and the results of the simulations were evaluated. Axial and tangential tensile tests were performed on as-received and machined fuel cladding tube samples of both E110 and E110G Russian zirconium alloys at room temperature to compare their ultimate tensile strengths and the different sample preparation methods.

• Korean Journal of Microbiology
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• v.46 no.2
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• pp.148-151
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• 2010

The aim of this study was to investigate the erythromycin resistance patterns of Enterococci sp. present in cow milk. A total 110 erythromycin resistant Enterococci were isolated from milk samples; E. faecalis (n=101), E. avium (n=7), and E. durans (n=2). The minimum inhibitory concentration of erythromycin against 110 Enterococci were determined. The 66.3% of Entercocci (n=73) showed high level resistance (${\geq}64$ mg/ml). Among 110 isolates, 86.3% (n=95) showed $cMLS_B$ phenotype and 13.6% (n=15) showed $iMLS_B$ The aim of this study was to investigate the erythromycin resistance patterns of Enterococci sp. present in cow milk. A total 110 erythromycin resistant Enterococci were isolated from milk samples; E. faecalis (n=101), E. avium (n=7), and E. durans (n=2). The minimum inhibitory concentration of erythromycin against 110 Enterococci were determined. The 66.3% of Entercocci (n=73) showed high level resistance (${\geq}64$ mg/ml). Among 110 isolates, 86.3% (n=95) showed $cMLS_B$ phenotype and 13.6% (n=15) showed $iMLS_B$ phenotype. All of isolates have erm(B) determinant, 75.45% (n=83) have mef(A) an efflux system determinant. The majority of Enetrcococci isolated from raw milk samples in northern area of Gyeonggi-Do showed high level of resistance to erythromycin.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.127.2-127.2
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• 2016

연구된 Si위의 흡착원자들의 확산 메커니즘들에 비해 Ge 표면에서의 확산 메커니즘은 잘 알려져 있지 않다. 최근 연구에 따르면, 수소가 덮인 Ge(110) 표면에서 그래핀 결정 핵생성은 비등방적이며, 낟알 둘레없이 웨이퍼 크기로 성장시킬 수 있음을 보였다. 본 연구에서는 VASP(Vienna Ab-initio Simulation Package)의 NEB(Nudged Elastic Band) 방법을 이용하여 수소가 덮인 Ge(110) 표면과 청결한 표면에서 탄소원자의 확산 과정과 확산에 따른 에너지 장벽을 계산 하였다. 계산 결과 수소가 덮인 표면에서의 탄소원자 확산은 체인 방향으로 각각 3.29 eV, 2.67 eV의 에너지 장벽을 가지고 청결한 표면에서는 탄소원자가 게르마늄 연결을 치환하며 확산한다. 이때 에너지 장벽은 0.82 eV이고 치환된 게르마늄이 확산할 때는 각각 0.64 eV, 0.59 eV의 에너지 장벽을 넘어야 한다. 결과적으로 수소가 덮인 표면에서보다 청결한 표면에서 탄소 확산 에너지 장벽이 낮으며, 청결한 표면에서는 탄소가 게르마늄을 치환하고 치환된 게르마늄이 확산할 확률이 높음을 알 수 있었다.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.265-265
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• 2012

The adsorption of molecular $NH_3$ on rutile $TiO_2(110)-1{\times}1$ surfaces was investigated using a temperature-programmed desorption (TPD) technique combined with a molecular beam apparatus. A quantitative investigation into the TPD spectra of $NH_3$ was made for $NH_3$ adsorbed on two kinds of rutile $TiO_2(110)-1{\times}1$ surfaces with the oxygen vacancy ($V_O$) concentration of ~0% (p-$TiO_2(110)$) and ~5% (r-$TiO_2(110)$), respectively. On both surfaces, non-dissociative adsorption of $NH_3$ was inferred from a quantitative analysis on the amount of adsorbed $NH_3$ and those desorbed. With increasing coverage, the monolayer desorption feature shifted from 400 K toward lower temperatures until it saturates at 160 K, suggesting a repulsive nature in the interaction between $NH_3$ molecules. At the very low coverage regime, the desorption features were found to extend up to 430 K and 400 K on p-$TiO_2(110)$ and p-TiO(110), respectively. As a result, the saturation coverage of monolayer of $NH_3$ was higher on the p-$TiO_2(110)$ surface than on the p-TiO(110) by about 10%. The desorption energy ($E_d$) of $NH_3$ obtained by inversion of the Polanyi-Wigner equation indicated that the difference between the $E_d$'s of $NH_3$ (that is, $E_d(on\;p-TiO_2(110)$) - $E_d$(on p-TiO(110)) was 14 kJ/mol at ${\theta}(NH_3)=0$ and decreased to 0 as the coverage approached to a monolayer. The observed adsorption behavior of $NH_3$ was interpreted using an interaction model between $NH_3$ and surface defects on $TiO_2$ such as VO's and $Ti^{3+}$ interstitials.

• Korean Journal of Applied Biomechanics
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• v.23 no.1
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• pp.11-17
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• 2013

The purpose of this study was to provide a fundamental information for enhancing 110m hurdlers' performance through conducting comparative biomechanical analysis between Skilled Group(SG) and Less-Skilled Group(LSG) those who are not in the first section of 110m hurdles. To persue the purpose of this study, total of 10 hurdlers participated. Then they were divided into two groups; SG: five hurdlers who have won awards with 14-second range at 2010 national track and field event, and LSG: five hudlers who did not win any awards with 15-second range. Three-dimensional motion analysis with 12 infrared cameras(Oqus 300, Qualisys) and 1 force plate(Type 9286AA, Kistler) was performed. From this study following conclusions were obtained. 1) For the overall runtime, SG revealed faster elapsed time than that of LSG. 2) At E4, LSG showed greater trunk angle than that of SG. 3) At E3 LSG revealed higher angular velocities than that of SG. 4) No significant differences was found for AP GRF between groups but LSG showed greater VGRF than that of SG.

• The Journal of Korea Institute of Information, Electronics, and Communication Technology
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• v.12 no.3
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• pp.312-320
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• 2019

In this paper, we design a 512Kb eFlash IP using 110nm eFlash cells. We proposed eFlash core circuit such as row driver circuit (CG/SL driver circuit), write BL driver circuit (write BL switch circuit and PBL switch select circuit), read BL switch circuit, and read BL S/A circuit which satisfy eFlash cell program, erase and read operation. In addition, instead of using a cross-coupled NMOS transistor as a conventional unit charge pump circuit, we propose a circuit boosting the gate of the 12V NMOS precharging transistor whose body is GND, so that the precharging node of the VPP unit charge pump is normally precharged to the voltage of VIN and thus the pumping current is increased in the VPP (boosted voltage) voltage generator circuit supplying the VPP voltage of 9.5V in the program mode and that of 11.5V in the erase mode. A 12V native NMOS pumping capacitor with a bigger pumping current and a smaller layout area than a PMOS pumping capacitor was used as the pumping capacitor. On the other hand, the layout area of the 512Kb eFlash memory IP designed based on the 110nm eFlash process is $933.22{\mu}m{\times}925{\mu}m(=0.8632mm^2)$.

• Journal of Korean Electronics
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• v.21 no.5
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• pp.110-112
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• 2001

• Korea Information Processing Society Review
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• v.9 no.4
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• pp.110-114
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• 2002