• 제목/요약/키워드: Doping density

검색결과 357건 처리시간 0.028초

Nanoscale NAND SONOS memory devices including a Seperated double-gate FinFET structure

  • Kim, Hyun-Joo;Kim, Kyeong-Rok;Kwack, Kae-Dal
    • 한국신뢰성학회지:신뢰성응용연구
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    • 제10권1호
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    • pp.65-71
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    • 2010
  • NAND-type SONOS with a separated double-gate FinFET structure (SDF-Fin SONOS) flash memory devices are proposed to reduce the unit cell size of the memory device and increase the memory density in comparison with conventional non volatile memory devices. The proposed memory device consists of a pair of control gates separated along the direction of the Fin width. There are two unique alternative technologies in this study. One is a channel doping method and the other is an oxide thickness variation method, which are used to operate the SDF-Fin SONOS memory device as two-bit. The fabrication processes and the device characteristics are simulated by using technology comuter-adided(TCAD). The simulation results indicate that the charge trap probability depends on the different channel doping concentration and the tunneling oxide thickness. The proposed SDG-Fin SONOS memory devices hold promise for potential application.

MnO2가 첨가된 PSN-PNN-PT 세라믹스의 유전 및 압전특성 (Dielectric and Piezoelectric Properties of MnO2-doped PSN-PNN-PT Ceramics)

  • 이종덕
    • 센서학회지
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    • 제13권2호
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    • pp.152-156
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    • 2004
  • The dielectric and piezoelectric properties of 0.36Pb($Sc_{1/2}Nb_{1/2}$)$O_{3}$-0.25Pb($Ni_{1/3}Nb_{2/3}$)$O_{3}$-0.39Pb$TiO_{3}$ (hereafter PSNNT) at the morphotropic phase boundary (MPB) composition were investigated with $0{\sim}2.5$ mot% $MnO_{2}$ doping. Bulk density, dielectric loss and tetragonality of crystal structure were all improved with increasing $MnO_{2}$ additive content. With increasing $MnO_{2}$ additive content, the electromechanical coupling factor and quality factor were also increased: Electromechanical coupling $k_{p}$ and quality factor $Q_{m}$ at 2.0 mol% $MnO_{2}$ doping with were showed highest values of 55.6 % and 252, respectively.

탄소 및 탄소화합물이 도핑된 $MgB_2$ 초전도체의 볼밀링 효과 (Effect of Ball-Milling on the Superconducting Properties of C and C-Based Compound Doped $MgB_2$)

  • 안중호;장민규;오상준
    • Progress in Superconductivity
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    • 제10권1호
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    • pp.17-22
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    • 2008
  • We have examined the effect of ball-milling on the superconducting properties of $MgB_2$ doped with C. The ball-milling of pre-reacted $MgB_2$ powder was carried out in dry or wet state using C or diethylenetriamine ($C_{4}H_{13}N_3$) as additives. The diethylenetriamine, whose chemical formula contains no oxygen, was chosen to avoid an excess oxidation during doping. The superconducting transition temperature (Tc) of the ball-milled or doped $MgB_2$ powders was only slightly smaller than that of undoped $MgB_2$. The critical current density (Jc) of the highly ball-milled $MgB_2$ was higher than that of C-doped $MgB_2$. The addition of diethylenetriamine was detrimental to Jc, although Tc was almost unchanged.

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MBE에 의해 성장된 Heteroface AlGaAs/GaAs 태양전지 (Heteroface AlGaAs/GaAs Solar Cells grown by MBE)

  • 장호성;임성규
    • 대한전자공학회논문지
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    • 제27권1호
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    • pp.46-50
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    • 1990
  • Heteroface AlGaAs/GaAs drift solar cells with an active area conversion efficiency of 15.9% under one sun and AM 1.5 condition have been grown by molecular beam epitaxy(MBE). These drift solar cells have graded doping profiles in the base and emitter regions. The cells have a short circuit current density (Jsc) of 19.00 mA/cm\ulcorner an open circuit voltage(Voc) of 0.93 V, and f fill factor(FF) of 0.78, respectively. Conventional solar cells with fixed doping profiles were also grown by MBE for comparison with the drift solar cells. Even though the fabrication cost of MBE grown solar cell is higher, the expected highest conversion efficiency of the single or multiple cells could compensate for the increased cost, particularly in case of space applications.

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Yttrium Doping Effect on Varistor Properties of Zinc-Vanadium-Based Ceramics

  • Nahm, Choon-W.
    • 한국세라믹학회지
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    • 제55권5호
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    • pp.504-509
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    • 2018
  • The influence of yttrium doping on varistor properties of zinc-vanadium-based ceramics was comprehensively investigated. The average grain size varied slightly between 5.2 and $5.5{\mu}m$ as the yttrium content increased; and similarly, the sintered density varied slightly between 5.47 and $5.51g/cm^3$. The threshold field exhibited a maximum value (5387 V/cm) when the yttrium content was 0.1 mol%. The highest nonlinear exponent (67) was obtained when the yttrium content was 0.05 mol%. The donor concentration increased in the range of $(2.46-5.56){\times}10^{17}cm^{-3}$ as the yttrium content increased, and the maximum barrier height was obtained (1.24 eV) when the yttrium content reached 0.05 mol%.

(F, Ga) 코도핑된 ZnO 투명 전도 박막의 솔-젤 제조와 특성 (Sol-gel Spin-coating of ZnO Co-doped with (F, Ga) as A Transparent Conducting Thin Film)

  • 남길모;권명석
    • 반도체디스플레이기술학회지
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    • 제13권1호
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    • pp.91-95
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    • 2014
  • (F,Ga) co-doped ZnO thin film on glass substrate was fabricated via a simple non-alkoxide sol-gel spin-coating. Contrary to the F single doped ZnO thin film, the (F,Ga) co-doped thin film showed a significant reduce in electrical resistivity after a second post-heat-treatment in reducing environment. The resulting decrease in electrical resistivity with Ga co-doping is considered to be resulted from the increases both carrier density and mobility. The optical transmittance of the (F,Ga) co-doped thin film in the visible range showed higher transmittance with Ga co-doping compared with F single doped ZnO thin film.

실리콘 에피층 성장과 실리콘 에칭기술을 이용한 Bare Chip Burn-In 테스트용 인터컨넥션 시스템의 제조공정 (Fabrication Processes of Interconnection Systems for Bare Chip Burn-In Tests Using Epitaxial Layer Growth and Etching Techniques of Silicon)

  • 권오경;김준배
    • 한국표면공학회지
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    • 제28권3호
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    • pp.174-181
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    • 1995
  • Multilayered silicon cantilever beams as interconnection systems for bare chip burn-in socket applications have been designed, fabricated and characterized. Fabrication processes of the beam are employing standard semiconductor processes such as thin film processes and epitaxial layer growth and silicon wet etching techniques. We investigated silicon etch rate in 1-3-10 etchant as functions of doping concentration, surface mechanical stress and crystal defects. The experimental results indicate that silicon etch rate in 1-3-10 etchant is strong functions of doping concentration and crystal defect density rather than surface mechanical stress. We suggested the new fabrication processes of multilayered silicon cantilever beams.

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진공 열 증착 기반의 정공수송층 적용을 통한 페로브스카이트 태양전지 (Perovskite Solar Cells through Application of Hole Transporting Layers based on Vacuum Thermal Evaporation)

  • 김혜승;송명훈
    • Current Photovoltaic Research
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    • 제10권1호
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    • pp.23-27
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    • 2022
  • In this study, we investigate organic-inorganic halide perovskite solar cells with a vacuum thermal evaporated hole transporting layer (NPB/MoO3-x). By replacing solution process based Spiro-MeOTAD with vacuum thermal evaporation based NPB/MoO3-x, a thin hole transporting layer was implemented. In addition, parasitic absorption that may occur during the doping process was eliminated by excluding solution process doping. In a solar cell with a thin vacuum thermal evaporated hole transporting layer, the short-circuit current density (Jsc) increased to 23.93 mA/cm2, resulting in the highest power converstion efficiency (PCE) at 18.76%. Considering these results, it is essential to control the thickness of hole transporting layer located at the top in solar cell configuration.

스퍼터링 증착한 CdTe 박막의 효과적인 Ag 도핑을 위한 이온 교환법 연구 (A Study on Ion Exchange Method for Effective Ag Doping of Sputtering-Deposited CdTe Thin Film)

  • 김철준;박주선;이우선
    • 전기학회논문지
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    • 제60권6호
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    • pp.1169-1174
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    • 2011
  • CdTe thin-film solar cell technology is well known that it can theoretically improve its conversion efficiency and manufacturing costs compared to the conventional silicon solar cell technology, due to its optical band gap energy (about 1.45eV) for solar energy absorption, high light absorption capability and low cost requirements for producing solar cells. Although the prior studies obtained the high light absorption, CdTe thin film solar cell has not been come up to the sufficient efficiency yet. So, doping method was selected for the improvement of the electrical characteristics in CdTe solar cells. Some elements including Cu, Ag, Cd and Te were generally used for the p-dopant as substitutional acceptors in CdTe thin film. In this study, the sputtering-deposited CdTe thin film was immersed in $AgNO_3$ solution for ion exchange method to dope Ag ions. The effects of immersion temperature and Ag-concentration were investigated on the optical properties and electrical characteristics of CdTe thin film by using Auger electron spectroscopy depth-profile, UV-visible spectrophotometer, and a Hall effect measurement system. The best optical and electrical characteristics were sucessfully obtained by Ag doping at high temperature and concentration. The larger and more uniform diffusion of Ag ions made increase of the Ag ion density in CdTe thin film to decrease the series resistance as well as mede the faster diffusion of light by the metal ions to enhance the light absorption.

중성자 조사에 의해 생성된 점결함 연구 (A Study on Point Defect Induced with Neutron Irradiation)

  • 김진현;이운섭;류근걸;김봉구;이병철;박상준
    • 한국산학기술학회논문지
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    • 제3권3호
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    • pp.165-169
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    • 2002
  • 반도체 소자의 기판 재료로 사용되고 있는 실리콘 웨이퍼는 그 정밀도가 매우 중요하다. 본 연구에서는 균일한 Dopant농도 분포를 얻을 수 있는 중성자 변환 Doping을 이용하여 실리콘에 인(P)을 Doping하는 연구를 수행하였다. 본 연구에서는 하나로 원자로를 이용하여 고저항(1000∼2000Ωcm) FZ실리콘 웨이퍼에 중성자 조사하여 저항의 변화를 관찰하였고, 중성자 조사시 발생하는 점결함을 분석하여 점결함이 저항 변화에 미치는 영향을 알아보았다. 중성자 조사 전 이론적 계산에 의해 HTS조사공은 5Ωcm, 20.1Ωcm이고 IP3조사공은 5Ωcm, 26.5Ωcm, 32.5Ωcm이었고, 중성자 조사 후 SRP로 측정한 결과 실제 저항값은 HTS-1 2.10Ωcm, HTS-2 7.21Ωcm이었고. IP-1은 1.79Ωcm, IP-2는 6.83Ωcm, 마지막으로 IP-3는 9.23Ωcm이었다. DLTS측정 결과 IP조사공에서 새로운 피크의 결함을 발견할 수 있었다. 또한 중성자 조사후의 저항변화는 열중성자량에 의존하며 조사공의 종류와는 무관하다.

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