• Title/Summary/Keyword: Diffraction and grating

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A Study on the Development of Measurement Setup for Crater Wear by Diffraction Grating in Turning (선삭에서 회절격자를 이용한 크레이터마모 측정장치 개발에 관한 연구)

  • Kim, Yeong-Il;Kim, Se-Jin
    • Journal of the Korean Society for Precision Engineering
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    • v.9 no.1
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    • pp.82-95
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    • 1992
  • There is the high interest for sensing of tool wear with the aim of controlling machine tools productivity from the point of view of qualitity. Difficulties in this measurement are also known. This study is on the development of measurement setup for crater wear by CCD image inturning. In this study, the crater wear measurement system consists of the He-Ne gas laser, diffraction grating. CCD camera, noise filter, slit, microcomputer, diverging lens, converging lens and so on. He-Ne laser beam passes through a diverging lens and a diffraction grating is positioned properly. A converging lens focuses so that the interference fringes can be obtained on the crater wear. Performance test revealed that the developed image technique provides precise, absolute tool-wear quantification and reduces human measurement errors. The results obtained are as follows 1. The digitizing of one image requires less than 2ses. 2. It can give detailed information on crater wear with limited times and errors 3. All parameters required by specification are easily obtained for several points of the cutting edge.

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A Study on the Grating Foemation and Optical Properties of Amorphous (Se,S)-based Chalcogenide Thin Films (비정질 (Se,S)를 기본으로 한 칼코게나이드 박막의 Grating 형성과 광특성에 관한 연구)

  • Park, Tae-Sung;Chung, Hong-Bay;Kim, Jong-Bin
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1988.05a
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    • pp.20-23
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    • 1988
  • Effect of light irradiation on evaporated chalcogenide glass films of an As-Se-S-Ge system has been studied. Utiling this characteristics diffraction grating of the amorphous film was obtained. Parameters such as film thickness, composition, and exporsure time influencing the diffraction efficiency were also studied. The maximum value of the diffraction efficiency achieved was 4.6% in an $As_{75}Se_{15}S_{35}-Ge_{10}$ film.

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The Elimination Characteristics by Impressed Voltage of Holography Grating in Chacogenide Thin Film

  • Lee Ki-Nam;Yeo Cheol-Ho;Yang Sung-Jun;Chung Hong-Bay
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.6
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    • pp.219-222
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    • 2004
  • This paper discovers that there are some peculiar properties that can remove holography grating, which was made in chacogenide thin film by impressed voltage. The thin films were used are $As_{40}Ge_{10}Se_{15}S_{35}$, and we use He-Ne laser in order to form thin films. I-V curved line in a thin film before a lattice was made has the critical point, about 3.7 V. Moreover, the I-V curved line increased current intensity at over 4 V after it made thin film. In addition, while holography grating is being made, and when it has the highest diffraction efficiency, a lattice can be deleted if put more voltage into it.

Annealing Effect of the Chalcogenide Thin Film for Holographic Grating Formation (홀로그래픽 격자 형성에 대한 칼코게나이드 박막의 열처리 효과)

  • Park, Jung-Il;Shin, Kyung;Lee, Jung-Tae;Lee, Young-Jong;Chung, Hong-Bay
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.8
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    • pp.736-739
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    • 2003
  • We prepared the chalcogenide As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/, Se$\_$75/Ge$\_$25/ thin film. Holographic grating was formed by the He-Ne laser( λ =633 nm). Annealing at 100$^{\circ}C$ and 200$^{\circ}C$ has been used to change the optical property of chalcogenide thin films for holographic grating formation. As the results, large variation of the optical property was generated at the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ chalcogenide film. Diffraction efficiency of the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35/ film has been enhanced about three times

Nondestructive Optical Measurement of Refractive-index Profile of Graded-index Lenses

  • Lee, Byoung-Hwak;Shin, Nae-Ho;Jeong, Kwan;Park, Myoung-Jin;Kim, Byung-Gyu;Yoo, Jang-Hoon;Kim, Dae-Geun;Yun, Ki-Hyuck;Lee, Kew-Seung;Kim, Kyung-Hwan;Kim, Dae-Kyu;Park, Seung-Han
    • Journal of the Optical Society of Korea
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    • v.13 no.4
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    • pp.468-471
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    • 2009
  • We propose a simple nondestructive method to obtain refractive-index profiles of a graded-index (GRIN) light-focusing rod by means of a diffraction grating. In our proposed method, a laser beam is illuminated through a diffraction grating perpendicular to the axis of the GRIN lens and the separation between the zeroth and first-order diffraction peaks is measured and analyzed. The results demonstrate that the refractive-index profiles of commercially available GRIN lenses can be successfully reconstructed.

Holographic Properties in Amorphous As-Ge-Se-S with Ag Thickness (Ag의 두께에 따른 비정질 As-Ge-Se-S의 홀로그래픽 특성연구)

  • Kim, Chung-Hyeok
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.3
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    • pp.213-217
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    • 2012
  • In this study, we have investigated the holographic grating formation on Ag-doped amorphous As-Ge-Se-S thin films. The dependence of diffraction efficiency as afunction of Ag layer thickness has been investigated in this amorphous chalcogenide films. Holographic gratings was formed using [P:P] polarized Diode Pumped Solid State laser (DPSS, 532.0 nm). The diffraction efficiency was obtained by +1st order intensity. The results were shown that the diffraction efficiency of Ag/AsGeSeS double layer thin films for the Ag thickness, the maximum grating diffraction efficiency using 60 nm Ag layer is 0.96%.

Holographic grating formation of Ag/AsGeSeS multi layer (Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성)

  • Na, Sun-Woong;Park, Jong-Hwa;Yeo, Cheol-Ho;Shin, Kyoung;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of meta1(Ag) and chalcogenide( $Ag/As_{40}Ge_{10}Se_{15}S_{35}$ ). The holographic grating in these thin flims has been formed using a linealy polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers. As the results, we found that the diffraction efficiency of $Ag/As_{40}Ge_{10}Se_{15}S_{35}-7$ layers and $Ag/As_{40}Ge_{10}Se_{15}S_{35}-15$ layers were 1.7% and 2.5% respectively.

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Holographic grating formation of Ag/AsGeSeS multi layer (Ag/AsGeSeS 다층 박막의 홀로그래픽 격자 형성)

  • Na, Sun-Woong;Park, Jong-Hwa;Yeo, Cheol-Ho;Shin, Kyong;Lee, Young-Jong;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11a
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    • pp.133-136
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    • 2001
  • In this paper, we investigated the diffraction efficiency of polarization holography using by amorphous Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/ multi-layer thin films by He-Ne laser. Multi-layer structures were formed by alternating a layer of metal(Ag) and chalcogenide(As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/). The holographic grating in these thin films has been formed using a lineally polarized He-Ne laser light (633nm). The diffraction efficiency was investigated the two sample of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers. As the results, we found that the diffraction efficiency of Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-7 layers and Ag/As$\sub$40/Ge$\sub$10/Se$\sub$15/S$\sub$35/-15 layers were 1.7% and 2.5% respectively

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Holographic Grating Formation of AsSeS Thin Films with the Incident Beam Wavelength (서로 다른 빔에 의한 AsSeS 박막의 홀로그래픽 데이터 격자형성)

  • Kim, Jae-Hoon;Shin, Ki-Jun;Kim, Hyun-Koo;Koo, Sang-Mo;Chung, Hong-Bay
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.445-446
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    • 2008
  • In this paper, we investigated the diffraction grating efficiency on Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The film thickness was 2 um and diffraction efficiency was obtained from He-Ne (632.8nm) and DPSS(532nm) (P:P) polarized laser beam on Ag/AsSeS thin films. As a result, for the films, the maximum grating diffraction efficiency using He-Ne laser(632nm) is 0.15%[2000sec]. And then The recording speed of DPSS laser was about 40s which of batter than He-Ne lasers.

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