• 한국진공학회지
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• 제15권1호
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• pp.45-49
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• 2006

깨끗한 Cu(110)와 산소가 흡착된 Cu(110) 표면에 Cu 성장에 의한 광학적 이방성의 변화를 RDS를 이용하여 연구하였다. 250K에서 Cu를 성장하면서 성장 모드와 산소의 계면활성제 효과를 확인하였다. 두 표면에 Cu를 성장하면서 4,25eV 봉우리의 규칙적인 변화를 확인하여 layer-by-layer 모드를 확인하였다.

• 한국자기학회지
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• 제16권1호
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• pp.79-83
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• 2006

광전자 회절을 이용한 정량적 구조 결정이 Cu(100)/glycine $(NH_2CH_3COOH)$ 흡착 계에 대하여 얻어졌다. $Cu(100)(2\times4)$pg-glycine $(NH_2CH_3COOH)$에서 분자는 아미노기의 질소원자, 카복실기의 두 개의 산소원자가 기판원자와 결합에 참여하고 있음이 얻어졌다. 질소원자, 산소원자 모두 atop site에 흡착을 한다. 질소원자와 산소원자 모두 atop 정 위치에서 각각 $5^{\circ}\pm4^{\circ},\;9^{\circ}\pm2^{\circ}$ 벗어난 위치에 있는 사실을 얻었다. 화학결합 길이는 Cu-N와 Cu-O모두 $2.05\pm0.02\;{\AA}$ 결정되었다. 두 개의 산소가 화학결합에 개입된 것으로 보이며, 이 결과는 Cu(110)에서 얻은 결과와 유사하다. Cu(110)$(2\times3)$ pg-glycine에서 얻은 결과를 재해석한 결과 두 산소는 동등하지 않고 한 산소원자는 다른 산소원자 보다 $0.29\;{\AA}$ 결합 높이가 차이가 있음을 보였다.

• E2M - 전기 전자와 첨단 소재
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• 제9권3호
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• pp.291-297
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• 1996

The surface properties of AI(Si, Cu) alloy film after plasma etching using the chemistries of chlorinated and fluorinated gases with varying the etching time have been investigated using X-ray Photoelectron Spectroscopy. Impurities of C, Cl, F and O etc are observed on the etched AI(Si, Cu) films. After 95% etching, aluminum and silicon show metallic states and oxidized (partially chlorinated) states, copper shows Cu metallic states and Cu-Cl$_{x}$(x$_{x}$ (x$_{x}$ (1

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.338-341
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• 1995

The surface properties after plasma etching of Al(Si, Cu) solutions using the chemistries of chlorinated and fluorinated gases with varying the etching time have been investigated using X-ray Photoelectron Spectroscopy. Impurities of C, Cl, F and O etc are observed on the etched Al(Si, Cu) films. After 95% etching, aluminum and silicon show metallic states and oxized (partially chlorinated) states, copper shows Cu metallic states and Cu-Clx(x$CuCl_x$ (x$CuCl_x$ (1

• 한국재료학회:학술대회논문집
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• 한국재료학회 1999년도 추계학술발표강연 및 논문개요집
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• pp.110-110
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• 1999

• 한국재료학회:학술대회논문집
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• 한국재료학회 1995년도 추계 학술발표 강연 및 논문개요집
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• pp.110-110
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• 1995

• 한국재료학회:학술대회논문집
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• 한국재료학회 2001년도 추계 학술발표강연 및 논문개요집
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• pp.110-110
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• 2001

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.270-270
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• 2013

We have investigated the self-assembled structures of glutaric acid (HOOC-(CH2)3-COOH) on the Cu(110) surface as a function of coverage using Scanning Tunneling Microscopy (STM). At low coverage, glutaric acid molecules diffuse freely on Cu(110) surface at room temperature, thus they can't form ordered structures at this coverage. However, when we scanned the same area several times, novel structures have been created during scanning due to the field-induced self-assembly. Also, the induced structures are quite stable during continuous scanning process. At 0.25 ML, glutaric acid adsorbs as a bi-glutarate (-OOC(CH2)3-COO-) after annealing to 450 K producing a racemic conglomerate of coexisting mirror domains. Although the molecule is achiral, it forms chiral domains on the surface from adsorption-induced asymmetrization. At 0.5 ML coverage, zigzag structure is observed, and still gltutaric acid adsorbs as a bidentate configuration. This bi-glutarate structure is stable until 650. Finally, at 1ML, glutaric acid adsorbs as a mono-glutarate at room temperature forming close packed structures.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 1993년도 추계연구발표회 논문개요집
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• pp.110-111
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• 1993

• 한국자기학회지
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• 제5권5호
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• pp.575-578
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• 1995

X-ray magnetic-circular-dichroism (MCD) spectra, orbital ($$) and spin magnetic moments ($$) for Co(110) monolayers a free standing mode or sandwiched between Pd(Pd/1Co/Pd)and Cu layers (Cu/1Co/Cu) are calculated using the thin film full potential linearized augmented plane wave energy band method. In contrast to the double peak structure predicted for the Co(0001) surface, only a minor side peak is found in the MCD spectra for Cu/Co/Cu, while MCD spectra for the other systems show a single peak structure. The MCD sum rules originally derived from a single ion model are found in the band approach to be valid for the systems investigated. However, for the spin sum rule, the magnetic dipole term ($$) is not negligible and needs to be included.