• 제목/요약/키워드: Contact Material

검색결과 2,528건 처리시간 0.03초

산화물 박막 트랜지스터 동작에 대한 접촉 저항의 영향 (Study on contact resistance on the performance of Oxide thin film transistors)

  • 이재상;장성필;구상모;이상렬
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 춘계학술대회 논문집
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    • pp.63-64
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    • 2009
  • The TFTs have been fabricated with 3 different geometry SID electrodes which have the same channel W/L ratio (W/L = 5) due to constant channel resistance, The 3 samples have different channel widths (350, 150, and $25\;{\mu}m$) and channel lengths (70, 30, and $5\;{\mu}m$) by fixed channel W/L ratio simultaneously on one chip for reliable comparisons. Resultant on-current and field effect mobility are proportional to the channel width, while the subthreshold swing is inversely proportional to the channel width mainly due to the change of contact resistance. These results show that the contact resistance strongly affects the device performances and should be considered in the applications.

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욕창방지방석용 공기셀의 설계요소에 따른 체압 분포 특성 분석 (Analysis of Body Pressure Distribution Characteristics According to the Design Factors of the Air-Cell Mattress for Preventing Decubitus Ulcer)

  • 조현석;류제청;김규석;문무성;이인혁
    • 한국정밀공학회지
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    • 제24권5호
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    • pp.118-126
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    • 2007
  • A finite element simulation model was developed for the performance optimization of a closed type air-cell mattress used for the ulcer prevention. An H-model with material properties of human flesh and kinematic joints were used for the calculation of the body contact pressure. The material property of rubber air-cell was evaluated by tensile test of standard specimen. We evaluated the body contact pressure distribution after laying human model on the inflated air-cell mattress. It was found that the body contact pressure was dependent on cell height. but hardly affected by the thickness of the rubber in a cell.

산화물 박막 트랜지스터 동작에 대한 접촉 저항의 영향 (Study on Contact Resistance on the Performance of Oxide Thin Film Transistors)

  • 이재상;구상모;이상렬
    • 한국전기전자재료학회논문지
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    • 제22권9호
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    • pp.747-750
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    • 2009
  • The TFTs have been fabricated with 3 different geometry SID electrodes which have the same channel W/L ratio (W/L = 5) due to constant channel resistance, The 3 samples have different channel widths (350, 150, and 25 ${\mu}m$) and channel lengths (70, 30, and 5 ${\mu}m$) by fixed channel W/L ratio simultaneously on one chip for reliable comparisons. Resultant on-current and field effect mobility are proportional to the channel width, while the subthreshold swing is inversely proportional to the channel width mainly due to the change of contact resistance. These results show that the contact resistance strongly affects the device performances and should be considered in the applications.

복합재료 연료전지 스택의 열응력 해석 (Thermal Stress Analysis of a Fuel Cell Stack using an Orthotropic Material Model)

  • 전지훈;황운봉;엄석기;김수환;임태원
    • 한국복합재료학회:학술대회논문집
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    • 한국복합재료학회 2004년도 춘계학술발표대회 논문집
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    • pp.206-209
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    • 2004
  • Mechanical behavior of a fuel stack was studied using an orthotropic material model. The fuel stack is essentially composed of a bipolar plate (BP), a gasket, an end plate, a membrane electrolyte assembly (MEA), and a gas diffusion layer (GDL). Each component is fastened with a suitable pressure. It is important to maintain a suitable contact pressure distribution of BP, because it influences the power efficiency of the fuel cell stack. When it is exposed to high temperature, its behavior must be stable. Hence, we performed stress analysis at high temperature as well as at room temperature. At high temperature, the contact pressure distribution becomes poor. Many patents have shown that using an elastomer can overcome this phenomena. Its effect was also studied. By using an elastomer, we found a good contact pressure distribution at high temperature as well as at room temperature.

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고분자 애자 하우징용 HTV 실리콘 고무의 자외선 조사에 따른 표면열화 (Surface Degradation of HTV silicone Rubber used for a Polymeric Insulator by UV Irradiation)

  • 연복희;이상용;허창수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 하계학술대회 논문집
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    • pp.173-176
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    • 2000
  • In this paper, we investigated the surface degradation of HTV silicone rubber used for a polymeric insulator by UV irradiation. To study the surface ageing properties by W irradiation, we used the corona discharge charging and contact angle. Therefore, we observed the change of surface charge retention and decrease of surface hydrophobicity. Also, we discussed the chemical change in the surface range using the analytic equipment such as SEM, ATR-FTIR, ESCA. Therefore, it is found that the scissor of characteristic bonding and the reattachment of oxidant bonding was developed by UV rays radiation. As discussing the corona ischarge charging and the change of contact angle, it is found the effect of UV irradiation and the mechanism of chemical reaction

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플립칩용 웨이퍼레벨 Fine Pitch 솔더범프 형성 (Fabrication of Wafer Level Fine Pitch Solder Bump for Flip Chip Application)

  • 주철원;김성진;백규하;이희태;한병성;박성수;강영일
    • 한국전기전자재료학회논문지
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    • 제14권11호
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    • pp.874-878
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    • 2001
  • Solder bump was electroplated on wafer for flip chip application. The process is as follows. Ti/Cu were sputtered and thick PR was formed by several coating PR layer. Fine pitch vias were opened using via mask and then Cu stud and solder bump were electroplated. Finally solder bump was formed by reflow process. In this paper, we opened 40㎛ vias on 57㎛ thick PR layer and electroplated solder bump with 70㎛ height and 40㎛ diameter. After reflow process, we could form solder bump with 53㎛ height and 43㎛ diameter. In plating process, we improved the plating uniformity within 3% by using ring contact instead of conventional multi-point contact.

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Via Contact 형성을 위한 산화막 식각공정의 신경망 모델 (Neural Network Models of Oxide Film Etch Process for Via Contact Formation)

  • 박종문;권성구;박건식;유성욱;배윤구;김병환;권광호
    • 한국전기전자재료학회논문지
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    • 제15권1호
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    • pp.7-14
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    • 2002
  • In this paper, neutral networks are used to build models of oxide film etched In CHF$_3$/CF$_4$ with a magnetically enhanced reactive ion etcher(MERIE). A statistical 2$\^$4-1/ experimental design plus one center point was used to characterize relationships between process factors and etch responses. The factors that were varied include radio frequence(rf) power, pressure, CHF$_3$ and CF$_4$ flow rates. Resultant 9 experiments were used to train neural networks and trained networks were subsequently tested on its appropriateness using additionally conducted 8 experiments. A total of 17 experiments were thus conducted for this modeling. The etch responses modeled are dc bias voltage, etch rate and etch uniformity A qualitative, good agreement was obtained between predicted and observed behaviors.

반도체-반도체 사이의 거리 변화에 따른 전압-전류 특성 연구 (A Study on V-I characteristics depend on a distance between semiconductor-semiconductor)

  • 김혜정;김정호;천민우;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 제6회 학술대회 논문집 일렉트렛트 및 응용기술연구회
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    • pp.52-56
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    • 2004
  • The movement of electron in the semiconductor-gap-semiconductor was observed by the variation of V-I characteristic as a distance two ZnO(1010) single crystals. When the resistance between two crystals was $10^2{\sim}10^4{\Omega}$, V-I characteristics had the pattern of the field emission or ohmic contact. On the other hand, when the resistance was larger than $10^7{\Omega}$ by increasing the distance between two crystals, the effect of surface barrier was prominent. This result leads to the conclusion that both the field emission (or ohmic contact) and the surface barrier effect including the tunneling have the influence on V-I characteristics of mechanically contacted crystals.

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자외선 조사된 HTV 실리콘 고무의 표면열화 분석 (Analysis of the Surface Degradation in UV-irradiated High-Temperature Vulcanized Silicone Rubber)

  • 연복희;이태호;허창수;이종한
    • 한국전기전자재료학회논문지
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    • 제13권5호
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    • pp.411-419
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    • 2000
  • In this paper we have investigated the surface degradation by ultraviolet-irradiation in high-temperature vulcanized silicone rubber. Through the measurement of surface potential decay by corona-charging and of contact angle it is found that the change of surface electrostatic properties and the decrease of contact angle under UV-radiation. For the changes in micro-morphological and chemical structure of the UV-treated silicone rubber we utilized several analytical techniques such as SEM, ATR-FTIR,XPS. From this study it is shown that the chemical reactions(scissoring of side chain(S-$CH_3$) cross-linking and branching) occur on the surface of silicone rubber during the UV-irradiation. Also we obtained the results of the loss of low molecular weight chain by cross-linking and oxidation reaction.

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n형 GaN의 doping 농도에 따르는 건식 식각 손상 (Doping-level dependent dry-etch damage of in n-type GaN)

  • 이지면
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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    • pp.417-420
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    • 2004
  • The electrical effects of dry-etch on n-type GaN by an inductively coupled $Cl_2/CH_4/H_2/Ar$ plasma were investigated as a function of ion energy, by means of ohmic and Schottky metallization method. The specific contact resistivity(${\rho}_c$) of ohmic contact was decreased, while the leakage current in Schottky diode was increased with increasing ion energy due to the preferential sputtering of nitrogen. At a higher rf power, an additional effect of damage was found on the etched sample, which was sensitive to the dopant concentration in terms of the ${\rho}_c$ of ohmic contact. This was attributed to the effects such as the formation of deep acceptor as well as the electron-enriched surface layer within the depletion layer. Furthermore, thermal annealing process enhanced the ohmic and Schottky property of heavily damaged surface.

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