• Journal of the Semiconductor & Display Technology
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• v.8 no.2
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• pp.55-58
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• 2009

Density functional theory was used to investigate the adsorption and reaction of $HfCl_4$ with two hydroxyls on Si (001)-$2{\times}1$ surface in atomic layer deposition (ALD) process. We prepared a reasonable Si substrate which consisted of six inter-dimer dissociated $H_2O$ molecules and two intra-dimer dissociated $H_2O$ molecules. The $HfCl_4$must react with two hydroxyls to be a bulk-like structure. When $HfCl_4$ was adsorbed on a hydroxyl, there was energy benefit of -0.55 eV. Though there was energy loss for $HfCl_4$ to react with H of hydroxyl, thermal energy of ALD chamber would be enough to pass the energy barriers. There were five reaction pathways for $HfCl_4$ to react with two hydroxyls; inter-dimer, intra-dimer, cross-dimer, inter-row, and cross-row. Inter-row, inter-dimer and intra-dimer were relatively favorable among the five reaction pathways based on the energy difference. The electron densities between O and Hf in these three reactions were higher than the others and they had shorter Hf-O and O-O bond lengths than the other two reaction pathways.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2012.11a
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• pp.117-117
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• 2012

부식용액 중의 붕산 농도 및 붕산 외 불순물(Cl, F, S)의 농도변화가 탄소강(SA106)의 부식특성에 미치는 영향을 조사하였다. 붕산농도 및 붕산 외 불순물(Cl, F, S)의 농도 변화가 탄소강의 부식특성에 많은 영향을 미쳤음을 관찰할 수 있었다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.1
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• pp.6-12
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• 2000

In this study, molybdenum thin films were etched with Cl\ulcorner/(Cl\ulcorner+SF\ulcorner) gas mixing ratio in an magneti-cally enhanced reactive ion etching(MERIE) by the etching parameters such as rf power of 250 watts, chamber pressure of 100 mTorr and B-field of 30 gauss. The etch rate was 150nm/min under Cl\ulcorner/(Cl\ulcorner+SF\ulcorner) gas mixing ratio of 0.25. At this time, the selectivity of Mo to SiO\ulcorner, photoresist were respectively 0.94, 0.05. The surface reaction of the etched Mo thin films was investigated with X-ray photoelectron spectroscopy(XPS). It was analyzed that Mo peaks was mainly observed in Mo-O bonds formed MoO\ulcorner compounds and F was detected in Mo-F and O-F bonds. Cl peaks were detected by the peak of Cl 2p\ulcorner in Cl-Mo bonds of MoCl\ulcorner or MoO\ulcornerCl\ulcorner formulas. Almost all of both Cl and S atoms had been com-bined with Mo, respectively.

• Journal of dental hygiene science
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• v.11 no.5
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• pp.405-410
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• 2011

The aim of this study was to evaluate antibacterial effect of Cl coated titanium. To coat the Cl on the titanium, first, the titanium was modified by blasting treatment with hydroxyapatite and alumina powder. Anodization process was completed using electrolyte solution of 0.04 M ${\beta}$-glycerol phosphate disodium salt n-hydrate, 0.4 M calcium acetate n-hydrate and 1 M NaCl on the condition of 250 voltages for 3 min. Surface morphology and elements' observation were performed with scanning electron microscopy and energy dispersive spectroscopy and surface profiler was used to analyze the surface roughness. Antibacterial effect was evaluated by film adhesion method. The anodized titanium after blasting showed dimpled surface contained the Cl. Surface average roughness of these surfaces had significantly higher compared to polished titanium. Result of antibacterial test showed that anodized titanium after blasting had an enhanced antibacterial effect compared to the polished titanium. Therefore, these results suggested that titanium contained Cl by anodization after blasting had a rough surface as well as antibacterial effect.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.14 no.9
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• pp.714-719
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• 2001

SrBi$_2$Ta$_2$$O_{9}$ thn films were etched in inductively coupled Cl$_2$/CF$_4$/Ar plasma. THe maximum etch rate was 1060 $\AA$/min at a Cl$_2$/(Cl$_2$+CF$_4$+Ar)=0.2. The 20% additive Cl$_2$ into CF$_4$/Ar plasma decreased carbon and fluorine radicals, but increased Cl radicals. Sr was effectively removed by reacting with Cl radical because the boiling point of SrCl$_2$(125$0^{\circ}C$) is lower than that of SrF$_2$(246$0^{\circ}C$). The chemical reactions on the etched surface were studied with x-ray photoelectron spectroscopy and secondary ion mass spectrometry. The etching profile was evaluated by using scanning electron microscopy.y.

• Korean journal of food and cookery science
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• v.5 no.2
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• pp.9-17
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• 1989

This study was carried out in order to study the emulsifying properties of kidney bean protein isolate. Kidney bean protein isolate was tested for the purpose of finding out the effect of pH, addition of NaCl, and heat treatment on the solbulity and emulsion capacity, emulsion stability, surface hydropobicity and emulsion viscosity. The results were summarized as follows. 1 The solubility of kidney bean protein isolate was affected by pH and showed the lowest value at pll 4.5 which is isoelectric point of kidney bean isolate. When the kidney bean protein isolate was heated, the highest value observed at pH 2 and pH 7 was 96.11%, 97.41% respectively. 2. The emulsion capacity of kidney bean protein isolate was not significantly different with each pH. With addition of NaCl, emulsion capacity decreased steadily. When heated thr highest value observed at pH 2 and pH 7 was 82.91 ml oil/100 mg protein ($60^{\circ}C$), 82.08 m1 oil/100 mg protein ($80^{\circ}C$) respectively. 3. The emulsion stability was significantly higher at pH 4.5 than that of pH 2 and pH 7 (p 0.05) When NaCl was added, emulsion stability was generally increased after 2hrs. When heated, the highest value observed at pH 2 and pH 7 was 21.25% ($80^{\circ}C$),23.7%($100^{\circ}C$) respectively after 2hrs. 4. Surface hydrophobicity increased sharply as 0.2 M NaCl was added to pH 4.5. When heated, the surface hydrophobicity increased as the temperature increased. 5. The highest value of emulsion viscosity was observed at pH 4.5 and pH 7 when 0.2 M NaCl was added. Under heat treatment, the highest value was 48,000 cps at pH 4.5 ($40^{\circ}C$). In the case of pH 7, the highest value was 105,000 cpa at $100^{\circ}C$.

• Journal of Surface Science and Engineering
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• v.41 no.6
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• pp.269-273
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• 2008

The etch of $(Na_{0.5}K_{0.5})NbO_3$ (NKN) thin film was performed in $BCl_3/Cl_2/Ar$ inductively coupled plasma. It was found that the 1sccm addition $BCl_3$ (5%) into $Cl_2/Ar$ plasma caused a non-monotonic behavior of the NKN etch rate. The maximum etch rate of NKN was 95.3 nm/min at $BCl_3$ (1 sccm)/$Cl_2$ (16 sccm)/Ar (4 sccm), 800 W ICP power, 1 Pa pressure and 400 W bias power. The NKN etch rate shows a monotonic behavior a s the bias power increases. The analysis of the narrow scan spectra of XPS for both a s-deposited and etched NKN films allowed one to assume ion assisted etch mechanism. The most probable reason for the maximum etch rate can be defined as a concurrence of chemical and physical etch pathways.

• Journal of Environmental Science International
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• v.19 no.7
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• pp.889-900
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• 2010

The experimental design and response surface methodology (RSM) have been applied to the investigation of the electro-UV complex process for the disinfection of E. coli in the water. The disinfection reactions of electro-UV process were mathematically described as a function of parameters power ($X_1$), NaCl dosage ($X_2$), initial pH ($X_3$) and disinfection time ($X_4$) being modeled by use of the Box-Behnken technique. The application of RSM using the Box-Behnken technique yielded the following regression equation, which is an empirical relationship between the residual E. coli number and test variables in actual variables: Ln (CFU) = 23.57 - 0.87 power - 1.87 NaCl dosage - 2.13 pH - 2.84 time - 0.09 power time - 0.07 NaCl dosage pH + 0.14 pH time + 0.03 $power^2$ + 0.47 NaCl $dosage^2$ + 0.20 $pH^2$+ 0.33 $time^2$. The model predictions agreed well with the experimentally observed result ($R^2$ = 0.9987). Graphical response surface and contour plots were used to locate the optimum point. The estimated ridge of maximum response and optimal conditions for the E. coli disinfection using canonical analysis was Ln 1.06 CFU (power, 15.40 W; NaCl dosage, 1.95 g/L, pH, 5.94 and time, 4.67 min). To confirm this optimum condition, the obtained number of the residual E. coli after three additional experiments were Ln 1.05, 1.10 and Ln 1.12. These values were within range of 0.62 (95% PI low)~1.50 (95% PI high), which indicated that conforming the reproducibility of the model.

• Journal of the Korean Ceramic Society
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• v.40 no.9
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• pp.886-890
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• 2003

The etching characteristics of a LiNbO$_3$ single crystal have been investigated using helicon wave plasma source with bias power and the mixture of CF$_4$, HBr, SF$_{6}$ gas parameters. The etching rate of LiNbO$_3$ with etching parameters was evaluated by surface profiler. The etching surface was evaluated by Atomic Force Microscopy (AFM). The surface morphology of the etched LiNbO$_3$ changed with bias power and the mixture of CF$_4$/Ar/Cl$_2$, HBr/Ar/Cl$_2$, and SF$_{6}$/Ar/Cl$_2$ parameters. Optimum etching conditions, considering both the surface flatness and etch rate were determined.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.18 no.4
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• pp.160-164
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• 2008

Insulating and conducting 12CaO ${\cdot}7Al_2O_3$ (Cl2A7)-doped indium tin oxide (ITO) (ITO:Cl2A7 insulator and electride) thin films were deposited on glass substrates by an RF magnetron co-sputtering method with increasing number of insulating and conducting Cl2A7 target chips. The structural, electrical and optical properties of these films were investigated. The carrier concentration decreased and resistivity increased in the films with increasing number of Cl2A7 target chips. The optical transmittance of all of the thin films was above 80 % in the visible wavelength range. The structural property and surface roughness of the films were examined and the decrease of crystallinity and surface roughness was strongly dependent on the change of grain size.