The etching characteristics of PZT thin films in Ar/$Cl_2/BCl_3$ plasma using ICP
(ICP를 이용한 Ar/$Cl_2/BCl_3$ 플라즈마에서 PZT 식각 특성)
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- Proceedings of the KIEE Conference
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- 1999.11d
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- pp.848-850
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- 1999