• Title/Summary/Keyword: Amorphous Silicon

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Electro-Thermal Modeling and Experimental Validation of Integrated Microbolometer with ROIC

  • Kim, Gyungtae;Kim, Taehyun;Kim, Hee Yeoun;Park, Yunjong;Ko, Hyoungho
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.16 no.3
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    • pp.367-374
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    • 2016
  • This paper presents an electro-thermal modeling of an amorphous silicon (a-Si) uncooled microbolometer. This modeling provides a comprehensive solution for simulating the electro-thermal characteristics of the fabricated microbolometer and enables electro-thermal co-simulation between MEMS and CMOS integrated circuits. To validate this model, three types of uncooled microbolometers were fabricated using a post-CMOS surface micromachining process. The simulation results show a maximum discrepancy of 2.6% relative to the experimental results.

Schottky barrier Thin-Film-Transistors crystallized by Excimer laser annealing and solid phase crystallization method (ELA 결정화와 SPC 결정화를 이용한 쇼트키 장벽 다결정 실리콘 박막 트랜지스터)

  • Shin, Jin-Wook;Choi, Chel-Jong;Cho, Won-Ju
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.129-130
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    • 2008
  • Polycrystalline silicon (poly-Si) Schottky barrier thin film transistors (SB-TFT) are fabricated by erbium silicided source/drain for n-type SB-TFT. High quality poly-Si film were obtained by crystallizing the amorphous Si film with excimer laser annealing (ELA) or solid phase crystallization (SPC) method. The fabricated poly-Si SB-TFTs have a large on/off current ratio with a low leakage current. Moreover, the electrical characteristics of poly-Si SB TFTs are significantly improved by the additional forming gas annealing in 2 % $H_2/N_2$, because the interface trap states at the poly-Si grain boundaries and at the gate oxide/poly-Si channel decreased.

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LCD Cell Aging Tester

  • Son, Hyuk;Baek, Sung-Sik;Oh, Hyeong-Geun;Choi, Byoung-Deog
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.1383-1385
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    • 2009
  • This paper suggests that testing method and equipment structure to detect potential failures of LCD cells. LCD Cell Aging Tester is the unique process to detect failures related with ASG circuits. This system consists of four components that is Aging chamber, work table, probe contact unit, and pattern generator. The key factor of the concept is temperature aging and HVS driving. Complicated combination of test parameters including voltage, temperature and frequency provided practical burn-in conditions eligible for prediction of mass production.

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LTPS produced by JIC (Joule-heating Induced Crystallization) for AMOLED TFT backplanes

  • Hong, Won-Eui;Lee, Seog-Young;Chung, Jang-Kyun;Lee, Joo-Yeol;Ro, Jae-Sang;Kim, Dong-Hyun;Park, Seung-Ho;Kim, Cheol-Su;Lee, Won-Pil;Kim, Hye-Dong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.378-381
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    • 2009
  • As a Joule-heat source, a conductive Mo layer was used to crystallize amorphous silicon for AMOLED backplanes. This Joule-heating induced crystallization (JIC) process could produce poly-Si having a grain size ranging from tens of nanometers to greater than several micrometers. Here, the blanket (single-shot whole-plane) crystallization could be achieved on the $2^{nd}$ and the $4^{th}$ generation glass substrate.

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14.1" XGA AMLCD with Integrated Black Data Insertion as an application of a-Si TFT Gate Driver

  • Choi, Woo-Seok;Kim, Hae-Yeol;Cho, Hyung-Nyuck;Ryu, Chang-Il;Yoon, Soo-Young;Jang, Yong-Ho;Park, Kwon-Shik;Kim, Binn;Choi, Seung-Chan;Cho, Nam-Wook;Moon, Tae-Woong;Kim, Chang-Dong;Kang, In-Byeong
    • 한국정보디스플레이학회:학술대회논문집
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    • 2009.10a
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    • pp.583-586
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    • 2009
  • A 14.1" XGA (1024${\times}$768) LCD panel with Integrated Black Data Insertion (IBDI) has been world first developed successfully based on the integrated amorphous Silicon TFT gate driver which we previously introduced. The notable features compared with the conventional integrated a-Si TFT gate driver circuit are that the circuit consists of Dual buffer, Carry buffer structure, and Q-node cross charging for stable signal scanning characteristic and prevention of coupling between signal lines.

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The thermal annealing effect on electrical performances of a-Si:H TFT fabricated on a metal foil substrate

  • Han, Chang-Wook;Nam, Woo-Jin;Kim, Chang-Dong;Kim, Ki-Yong;Kang, In-Byeong;Chung, In-Jae;Han, Min-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.745-748
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    • 2007
  • Hydrogenated amorphous silicon thin film transistors (a-Si:H TFTs) were fabricated on a flexible metal substrate at $150\;^{\circ}C$. To increase the stability of the flexible a-Si:H TFTs, they were thermally annealed at $230\;^{\circ}C$. The field effect mobility was reduced because of the strain in a- Si:H TFT under thermal annealing.

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Design of Integrated a-Si:H Gate Driver Circuit with Low Noise for Mobile TFT-LCD

  • Lee, Yong-Hui;Park, Yong-Ju;Kwag, Jin-Oh;Kim, Hyung-Guel;Yi, Jun-Sin
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.822-824
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    • 2007
  • This paper investigated a gate driver circuit with amorphous silicon for mobile TFT-LCD. In the conventional circuit, the fluctuation of the off-state voltage causes the fluctuation of gate line voltages in the panel and then image quality becomes worse. Newly designed gate driver circuit with dynamic switching inverter and carry out signal reduce the fluctuation of the off-state voltage because dynamic switching inverter is holding the off-state voltage and the delay of carry signal is reduced. The simulation results show that the proposed a-Si:H gate driver has low noise and high stability compared with the conventional one.

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Large Size Plastic Display for Outdoor Application

  • Roh, Nam-Seok;Hwang, Tae-Hyung;Lee, Woo-Jae;Hong, Wang-Su;Kim, Sung-Jin;Kim, Sang-Il;Shin, Peter
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.255-256
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    • 2007
  • A A4 size black and white reflective plastic display was developed for out door application. For document readability, high resolution of 180ppi plastic TFT backplane and high reflectance electrophoretic front panel sheet was used. Preparation of display was held near $100^{\circ}C$ process on PEN substrate.

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A substrate bias effect on the stability of a-Si:H TFT fabricated on a flexible metal substrate

  • Han, Chang-Wook;Nam, Woo-Jin;Kim, Chang-Dong;Kim, Ki-Yong;Kang, In-Byeong;Chung, In-Jae;Han, Min-Koo
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08a
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    • pp.257-260
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    • 2007
  • Hydrogenated amorphous silicon thin film transistors were fabricated on a flexible metal substrate. A negative voltage at a floated gate can be induced by a negative substrate bias through a capacitor between the substrate and gate electrode. This can recover the shifted-threshold voltage to an original value.

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Investigation of Annealing Effect for a-SiC:H Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition (플라즈마 화학기상 증착방식으로 성장시킨 비정질 실리콘 카바이드 박막의 열처리 효과에 관한 특성분석)

  • 박문기;김용탁;최원석;윤대호;홍병유
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.13 no.10
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    • pp.817-821
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    • 2000
  • In this work, we have investigated the dependence of annealing temperature(T$\_$a/) on optical and electrical properties of amorphous hydrogenated SiC(a-SiC:H) films. The a-SiC:H films were deposited on corning glass and p-type Si(100) wafer by PECVD (plasma enhanced vapor deposition) using SiH$_4$+CH$_4$+N$_2$ gas mixture. The experimental results have shown that the optical energy band gap(E$\_$opt/)of the thin films annealed at high temperatures have shown that the graphitization of carbon clusters and micro-crystalline silicon occurs. The current-voltage characteristics have shown good electrical properties at the annealed films.

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