• 제목/요약/키워드: Alloy target

검색결과 113건 처리시간 0.022초

이중 타겟의 동시 스퍼터링을 이용한 CuNi 박막 제작시 증착변수가 박막의 물성에 미치는 영향 (Effects of Deposition Conditions on Properties of CuNi thin Films Fabricated by Co-Sputtering of Dual Targets)

  • 서수형;이재엽;박창균;박진석
    • 대한전기학회논문지:전기물성ㆍ응용부문C
    • /
    • 제50권1호
    • /
    • pp.11-16
    • /
    • 2001
  • CuNi alloy films are deposited by co-sputtering of dual targets (Cu and Ni, respectively). Effects of the co-sputtering conditions, such as powers applied to the targets, deposition pressures, and substrate temperatures, on the structural and electrical properties of deposited films are systematically investigated. The composition ratio of Ni/Cu is almost linearly decreased by increasing the DC power applied to the Cu target from 25.6 W to 69.7 W with the RF power applied to the Ni target unchanged(140 W). it is noted that the chamber pressure during deposition and the film thickness give rise to a change of the Ni/Cu ratio within the films deposited. The former may be due to a higher sputtering yield of Cu atom and the latter due to the re-sputtering phenomenon of Cu atoms on the surface of deposited film. The film deposited at higher pressures or at lower substrate temperatures have a smaller crystallite size, a higher electrical resistivity, and much more voids. This may be attributed to a lower surface mobility of sputtered atoms over the substrate.

  • PDF

NMOS 소자의 Ta-Ti 게이트 전극 특성 (Characteristics of Ta-Ti Gate Electrode for NMOS Device)

  • 강영섭;서현상;노영진;이충근;홍신남
    • 한국항행학회논문지
    • /
    • 제7권2호
    • /
    • pp.211-216
    • /
    • 2003
  • 본 논문에서는 오래 전부터 NMOS의 게이트 전극으로 사용된 폴리실리콘을 대체할 수 있는 Ta-Ti 합금의 특성에 대해 연구하였다. 실리콘 기판 위에 열적으로 성장된 $SiO_2$ 위에 Ta과 Ti의 두 타깃을 사용하여 co-sputterring 방법으로 Ta-Ti 합금을 증착하였다. 각각의 타깃은 100W의 sputtering power로 증착하여 시편을 제작하였다. 또한 비교 분석을 위하여 Ta을 100W의 sputtering power로 증착한 시편도 제작하였다. 제작된 Ta-Ti 합금 게이트의 열적/화학적 안정성을 검토하기 위하여 $600^{\circ}C$에서 급속열처리를 수행한 결과 소자의 성능 저하는 나타나지 않았다. 또한 전기적 특성 분석 결과 Ta-Ti 합금은 NMOS에 적합한 일함수인 4.13eV를 산출해 낼 수 있었고, 면저항 역시 폴리실리콘에 비해 낮은 값을 얻을 수 있었다.

  • PDF

스퍼터링을 이용한 바나듐 합금 박막화에 관한 연구 (Characterization of the Vanadium Alloy Thin Films Coated by Sputtering)

  • 윤용호;정지훈
    • Korean Chemical Engineering Research
    • /
    • 제54권5호
    • /
    • pp.598-605
    • /
    • 2016
  • V-Cr-Y 합금은 높은 투과도와 선택도를 가진 수소 분리막 재료이다. V-Cr-Y 분리막의 투과속도를 증가시키기 위하여 sputtering을 이용한 V-Cr-Y 박막을 제조하고 그 특성을 연구하였다. V-Cr-Y 성분이 각각 89.8%, 10.0%, 0.2%인 타겟을 이용하여 실리콘웨이퍼 위에 박막을 증착시켰으며, EDS 분석을 통해 박막조성이 타겟조성과 일치함을 확인하였다. 스퍼터링 온도와 출력이 증가할수록 박막의 성장속도와 결정크기가 증가하였으며, 압력이 감소할수록 결정구조가 보다 미세하고 치밀해졌다. 최적 스퍼터링 조건은 교류 고주파(RF), 2mTorr, 300W, 상온이었으며, 이 조건으로 제조한 박막을 열처리 하여 수소분리에 적합한 박막을 얻을 수 있었다.

Dynamic numerical simulation of plastic deformation and residual stress in shot peening of aluminium alloy

  • Ullah, Himayat;Ullah, Baseer;Muhammad, Riaz
    • Structural Engineering and Mechanics
    • /
    • 제63권1호
    • /
    • pp.1-9
    • /
    • 2017
  • Shot peening is a cold surface treatment employed to induce residual stress field in a metallic component beneficial for increasing its fatigue strength. The experimental investigation of parameters involved in shot peening process is very complex as well as costly. The most attractive alternative is the explicit dynamics finite element (FE) analysis capable of determining the shot peening process parameters subject to the selection of a proper material's constitutive model and numerical technique. In this study, Ansys / LS-Dyna software was used to simulate the impact of steel shots of various sizes on an aluminium alloy plate described with strain rate dependent elasto-plastic material model. The impacts were carried out at various incident velocities. The influence of shot velocity and size on the plastic deformation, compressive residual stress and force-time response were investigated. The results exhibited that increasing the shot velocity and size resulted in an increase in plastic deformation of the aluminium target. However, a little effect of the shot velocity and size was observed on the magnitude of target's subsurface compressive residual stress. The obtained results were close to the published ones, and the numerical models demonstrated the capability of the method to capture the pattern of residual stress and plastic deformation observed experimentally in aluminium alloys. The study can be quite helpful in determining and selecting the optimal shot peening parameters to achieve specific level of plastic deformation and compressive residual stress in the aluminium alloy parts especially compressor blades.

갈륨에 기초한 액체금속 X밴드 레이더 반사신호 측정 (X-band RADAR Reflected Signal Measurement of Gallium-based Liquid Metal)

  • 김민혁;강세혁;두석주;김대영
    • 한국군사과학기술학회지
    • /
    • 제26권3호
    • /
    • pp.246-251
    • /
    • 2023
  • RADAR(Radio Detection and Ranging) is an important system for surveillance and reconnaissance by detecting a reflected signal which obtains the range from the radar to the target, and the velocity of the target. The magnitude of the reflected signal varies due to the radar cross section of the target, characteristic of the transmission and reception antenna, distance between the radar and the target, and power and wavelength of the transmitted signal. Thus, the RCS is the important characteristic of the target to determine if the target can be observed by the RADAR system. It is based on the material and shape of the target. We have measured the reflection signal of a simple square-shaped (20 × 20 cm) target made of a new material, a gallium-based liquid metal alloy and compared that of well-known metals including copper, aluminum. The magnitude of reflected signal of the aluminum target was the largest and it was 2.4 times larger than that of the liquid metal target. We also investigated the effect of the shape by measuring reflectance of the F-22 3D model(~1/95 ratio) target covered with/without copper, aluminium, and liquid metal. The largest magnitude of the reflected signal measured from side-view with the copper-covered F-22 model was 2.6 times greater than that of liquid metal. The reflectance study of the liquid metal would be helpful for liquid metal-based frequency selective surface or metamaterials.

Spatial Distributions of Alloying Elements Obtained from Atom Probe Tomography of the Amorphous Ribbon Fe75C11Si2B8Cr4

  • Shin, Jinkyung;Yi, Seonghoon;Pradeep, Konda Gokuldoss;Choi, Pyuck-Pa;Raabe, Dierk
    • 한국재료학회지
    • /
    • 제23권3호
    • /
    • pp.190-193
    • /
    • 2013
  • Spatial distributions of alloying elements of an Fe-based amorphous ribbon with a nominal composition of $Fe_{75}C_{11}Si_2B_8Cr_4$ were analyzed through the atom probe tomography method. The amorphous ribbon was prepared through the melt spinning method. The macroscopic amorphous natures were confirmed using an X-ray diffractometer (XRD) and a differential scanning calorimeter (DSC). Atom Probe (Cameca LEAP 3000X HR) analyses were carried out in pulsed voltage mode at a specimen base temperature of about 60 K, a pulse to base voltage ratio of 15 %, and a pulse frequency of 200 kHz. The target detection rate was set to 5 ions per 1000 pulses. Based on a statistical analyses of the data obtained from the volume of $59{\times}59{\times}33nm^3$, homogeneous distributions of alloying elements in nano-scales were concluded. Even with high carbon and strong carbide forming element contents, nano-scale segregation zones of alloying elements were not detected within the Fe-based amorphous ribbon. However, the existence of small sub-nanometer scale clusters due to short range ordering cannot be completely excluded.

Ti-Al-Si-N 박막 제작을 위한 합금 타겟 제조 및 박막의 기계적 특성 (Fabrication of Alloy Target for Formation of Ti-Al-Si-N Composite Thin Film and Their Mechanical Properties)

  • 이한찬
    • 한국전기전자재료학회논문지
    • /
    • 제29권10호
    • /
    • pp.665-670
    • /
    • 2016
  • Prevailing dissemination of machine tools and cutting technology have caused drastic developments of high speed dry machining with work materials of high hardness, and demands on the high-hardness-materials with high efficiency have become increasingly important in terms of productivity, cost reduction, as well as environment-friendly issue. Addition of Si to TiAlN has been known to form nano-composite coating with higher hardness of over 30 GPa and oxidation temperature over $1,000^{\circ}C$. However, it is not easy to add Si to TiAlN by using conventional PVD technologies. Therefore, Ti-Al-Si-N have been prepared by hybrid process of PVD with multiple target sources or PVD combined with PECVD of Si source gas. In this study, a single composite target of Ti-Al-Si was prepared by powder metallurgy of MA (mechanical alloying) and SPS (spark plasma sintering). Properties of he resulting alloying targets were examined. They revealed a microstructure with micro-sized grain of about $1{\sim}5{\mu}m$, and all the elements were distributed homogeneously in the alloying target. Hardness of the Ti-Al-Si-N target was about 1,127 Hv. Thin films of Ti-Al-Si-N were prepared by unbalanced magnetron sputtering method by using the home-made Ti-Al-Si alloying target. Composition of the resulting thin film of Ti-Al-Si-N was almost the same with that of the target. The thin film of Ti-Al-Si-N showed a hardness of 35 GPa and friction coefficient of 0.66.

스퍼터링 타겟용 Cu-50In-13Ga 3원계 합금 분말의 소결 및 압연 거동 (Sintering and Rolling Behavior of Cu-50In-13Ga Ternary Alloy Powder for Sputtering Target)

  • 김대원;김용호;김정한;김대근;이종현;최광보;손현택
    • 한국분말재료학회지
    • /
    • 제19권4호
    • /
    • pp.264-270
    • /
    • 2012
  • In this study, we mainly focus on the study of densification of gas-atomized Cu-50 wt.%In-13 wt.%Ga alloy powder without occurrence of crack during the forming process. Cu-50 wt.%In-13 wt.%Ga alloy powder was consolidated by sintering and rolling processes in order to obtain high density. The phase and microstructure of formed materials were examined by X-ray diffraction (XRD), scanning electron microscopy (SEM) and optical microscopy (OM), respectively. Warm rolling using copper can result in the improvement of density. The specimen obtained with 80% of rolling reduction ratio at $140^{\circ}C$ using cooper can have the highest density of $8.039g/cm^3$.

방전 플라즈마 소결에 의한 Ge2Sb2Te5 스퍼터링 타겟 제조 및 특성 (Synthesis and Properties of a Ge2Sb2Te5 Sputtering for Use as a Target by Spark Plasma Sintering)

  • 방창욱;김기범;이진규
    • 한국분말재료학회지
    • /
    • 제21권2호
    • /
    • pp.137-141
    • /
    • 2014
  • In this study, we report the sintering behavior and properties of a $Ge_2Sb_2Te_5$ alloy powders for use as a sputtering target by spark plasma sintering. The effect of various sintering parameters, such as pressure, temperature and time, on the density and hardness of the target has been investigated in detail. Structural characterization was performed by scanning electron microscopy and X-ray diffraction. Hardness and thermal properties were measured by differential scanning calorimetry and micro-vickers hardness tester. The density and hardness of the sintered $Ge_2Sb_2Te_5$ materials were 5.8976~6.3687 $g/cm^3$ and 32~75 Hv, respectively.

EXPERIMENTAL VALIDATION OF THE BACKSCATTERING GAMMA-RAY SPECTRA WITH THE MONTE CARLO CODE

  • Hoang, Sy Minh Tuan;Yoo, Sang-Ho;Sun, Gwang-Min
    • Nuclear Engineering and Technology
    • /
    • 제43권1호
    • /
    • pp.13-18
    • /
    • 2011
  • In this study, simulations were done of a 661.6 keV line from a point source of $^{137}Cs$ housed in a lead shield. When increasing the scattering angle from 60 to 120 degrees with a 6061 aluminum alloy target placed at angles of 30 and 45 degrees to the incident beam, the spectra showed that the single scattering component increases and that the multiple scattering component decreases. The investigation of the single and multiple scattering components was carried out using a MCNP5 simulation code. The component of the single Compton scattering photons is proportional to the target electron density at the point where the scattering occurs. The single scattering peak increases according to the thickness of the target and saturates at a certain thickness. The signal-to-noise ratio was found to decrease according to the target thickness. The simulation was experimentally validated by measurements. These results will be used to determine the best conditions under which this method can be applied to testing electron densities or to assess the thickness of samples to locate defects in them.