• Proceedings of the Korean Institute of IIIuminating and Electrical Installation Engineers Conference
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• 2002.11a
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• pp.329-334
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• 2002

This study evaporates TiO$_2$ layer thickness differently with RF sputtering method on Si Wafer(n-100). Thin film is made with the structure of Si+TiO$_2$ and Si+TiO$_2$+Al by evaporating TiN which is used as Antireflection of superintegrated semiconductor integrated circuit with Photo Catalyst. The research is performed to increase the characteristics of photon energy according to TiO$_2$ thickness and the reliability and reproducibility of TiO$_2$ thin film. Reversal of electric Permittivity values is induced by dipole polarization shown in the dielectric of thin film. Complex electric constant ($\varepsilon$$_1$, $\varepsilon$$_2$) has larger peak values as it's thickness is thinner and then it is larger according to the increase of frequency. Electric Permittivity by photon energy has large value in imaginary number and is reduced exponentially by the increase of carrier density according to that of photon energy.

• Journal of radiological science and technology
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• v.14 no.1
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• pp.49-60
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• 1991

Thermoluminescent phosphors, which are now being used widely in radiation dosimetry, have an excellent sensitivity to ionizing radiation. In this study, thermoluminescent phosphors of $CaSO_4$ : Mn, $CaSO_4$ : Dy and $CaSO_4$ : Tm are prepared and their physical properties are investigated by measuring the trapping parameters and their luminescent spectra. By considering the sensitivity to X-ray and fading characteristics, $CaSO_4$ : Dy is most adequate to imaging plate. The imaging plate are prepared by coating the $CaSO_4$ : Dy powder on the Al substrate and its dose dependence is linear within the range of 40 mGy-20 Gy X-ray. The sensitivity of imaging plate depends linearly on the thickness of coated phosphor layer up to $35\;mg/cm^2$ and is independent on the grain size of the phosphor in the range of $70{\sim}250\;{\mu}m$. By photographing the imaging plate, X-ray images of the test object are obtained and better than those of X-ray films.

• 한국전산유체공학회:학술대회논문집
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• 2001.05a
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• pp.189-194
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• 2001

In this paper, non-reacting and reacting flowfields were computed using a preconditioned Navier-Stokes solver. The preconditioning technique of Merkle et al. and TVD scheme or Chakravarthy and Osher was employed and the results obtained using developed code have a good agreement with the previous results and experimental data. The preconditioned Wavier-Stokes equation set with low Reynolds number $\kappa-\epsilon$ equation and species continuity equations, are discretized with strongly implicit manner and time integrated with LU-SSOR scheme. For the purpose of treating unsteady problem the duel-time stepping scheme was employed. For the validation of the code in incompressible flow regime, steady driven square cavity flow was considered and calculation result shows reasonably good agreement with the result of incompressible code. Shock wave/boundary layer interaction problem was considered to show the shock capturing performance of preconditioned-TVD scheme. To validate unsteady flow, acoustic oscillation problem was calculated, and supersonic premix flame of $H_2$-air reaction problem which is calculated with turbulence model, 9-species/18-reaction step reaction model, shows reasonable agreement with the previous results. As a result, the preconditioning method has an advantage to calculate incompressible and compressible flow through one code and preconditioned solver easily developed from standard compressible code with minor efforts. But additional computational time and computer memory is required due to preconditioning matrix.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.6
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• pp.562-568
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• 2008

In this paper, the hole injection layer(HIL) materials have been synthesized and analyzed. Their HOMO levels are $4.93{\sim}5.22\;eV$, and their energy band gaps are $2.74{\sim}3.19\;eV$. Their glass transition temperatures($T_g$) are all above $114^{\circ}C$, which implies that they are highly thermal-stable. The green OLED devices with a structure of ITO(150 nm)/NEW_HIL(50 nm)/NPB(30 nm)/$Alq_3$(50 nm)/Al:Li(100 nm) were fabricated and tested, incorporating these newly synthesized HIL materials. According to the test results of OLED devices, the I-V-L performances of these devices increase in the following sequence: ELM307 > ELM200 > ELM321 > ELM327 > ELM325. In addition, the OLED device with ELM307 as a HIL has the highest brightness and efficiency at the same driving voltage. These experimental results have shown that ELM307 can be used as one of the most promising candidates for HIL materials.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.11
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• pp.679-685
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• 2014

For the measurements of surface shape milled using FIB (focused ion beam), the silicon bulk, $Si_3N_4/Si$, and Al/Si samples are used and observed the shapes milled from different sputtering rates, incident angles of $Ga^+$ ions bombardment, beam current, and target material. These conditions also can be influenced the sputtering rate, raster image, and milled shape. The fundamental ion-solid interactions of FIB milling are discussed and explained using TRIM programs (SRIM, TC, and T-dyn). The damaged layers caused by bombarding of $Ga^+$ ions were observed on the surface of target materials. The simulated results were shown a little bit deviation with the experimental data due to relatively small sputtering rate on the sample surface. The simulation results showed about 10.6% tolerance from the measured data at 200 pA. On the other hand, the improved analytical model of damaged layer was matched well with experimental XTEM (cross-sectional transmission electron microscopy) data.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.27 no.5
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• pp.317-321
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• 2014

Hydrothermal synthesis technique could be carried out for growth of ZnO nanowires at relatively low process temperature, and it could be freely utilized with various substrates for fabrication process of functional electronic devices. However, it has also a demerit of relatively slow growth characteristics of the resulting ZnO nanowires. In this paper, an external DC bias of positive and negative 0.5 [V] was applied in the hydrothermal synthesis process for 2~8 [h] to prepare ZnO nanowires on a seed layer of AZO with high electrical conductivity. Growth characteristics of the synthesized ZnO nanowires were analyzed by FE-SEM. Material property of the grown ZnO nanowires was examined by PL analysis. The ZnO nanowires grown with positive bias revealed distinctively enhanced growth characteristics, and they showed a typical material property of ZnO.

• Transactions on Electrical and Electronic Materials
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• v.15 no.2
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• pp.73-76
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• 2014

$Pt/Al_2O_3/La_2Si_5O_x/SiO_2/Si$ charge trap memory capacitors were prepared, in which the $La_2Si_5O_x$ film was used as the charge trapping layer, and the effects of post annealing atmospheres ($NH_3$ and $N_2$) on their memory characteristics were investigated. $La_2O_3$ nanocrystallites, as the storage nodes, precipitated from the amorphous $La_2Si_5O_x$ film during rapid thermal annealing. The $NH_3$ annealed memory capacitor showed higher charge storage performances than either the capacitor without annealing or the capacitor annealed in $N_2$. The memory characteristics were enhanced because more nitrogen was incorporated at the $La_2Si_5O_x/SiO_2$ interface and interfacial reaction was suppressed after the $NH_3$ annealing treatment.

• Proceedings of the KIEE Conference
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• 2009.07a
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• pp.1236_1237
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• 2009

Organic light emitting diode (OLED) is currently the focus of intense interest in the field of photonics. It is attractive for the in low-operating voltage, low power consumption, easy fabrication and low cost. A typical OLED consists of one or more organic layers sandwiched between a high work function anode, such as indium tin oxide (ITO), and a low work function cathode such as Ca, Mg:Ag, and Al. Tris-(8-hydroxy)quinolinealuminum ($Alq_3$) has taken a prominent position in the development of OLED due to its relative stability as an electron transporting and emitting material. We investigated an efficiency improvement of the OLED depending on thickness variation of $Alq_3$.

• 한국신재생에너지학회:학술대회논문집
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• 2009.06a
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• pp.91-91
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• 2009

태양전지의 전극소성 시 알루미늄 후면 전극이 실리콘으로 확산되어 후면전계(Back Surface Field)를 형성한다. 후면 패시베이션층은 후면반사율을 높여 내부광흡수경로를 늘리고 후면재결합속도를 감소시킨다. 본 논문은 후면 패시베이션층이 알루미늄 후면전계 형성에 미치는 영향 및 온도에 따른 변화를 관찰하였다. 절삭손상(Saw damage)이 제거된 실리콘 기판의 후면에 패시베이션층이 없는 것과 후면 패시베이션층으로 사용되는 실리콘 산화막을 형성시킨 시편을 제작하였다. 알루미늄 후면전극을 스크린 인쇄 후 소성온도를 달리하여 실리콘과 알루미늄과의 반응을 비교하였다. 주사전자현미경(SEM)을 사용하여 시편의 단면사진으로부터 소성온도에 따른 실리콘과 알루미늄간의 반응 여부를 관찰하였고, 열분석을 통해 반응 온도를 조사하였다. 패시베이션층이 없는 경우에는 약 $600^{\circ}C$부터 실리콘과 알루미늄간의 반응이 시작되었고, 패시베이션층이 있는 경우에는 약 $700^{\circ}C$부터 반응이 시작되는 결과를 얻었다.

• Proceedings of the Korean Society of Tribologists and Lubrication Engineers Conference
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• 2004.11a
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• pp.66-74
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• 2004

The sliding wear behavior of $ZrO_2-22wt\%MgO\;(MZ)\;and\;ZrO_2-8wt\%Y_2O_3\;(YZ)$ deposited on a casting aluminum alloy with bond layer (NiCrCoAlY) by plasma spray against an SiC ball was investigated under dry test conditions at room temperature. At all load conditions, the wear mechanisms of the MZ and the YZ coatings were almost the same. The wear mechanisms involved the forming of a smooth film by material transferred on the sliding surface and pullout. The wear rate of the MZ coating was less than that of the YZ coating. With an increase normal load the wear rate of the studied coatings increased. The SEM was used to examine the sliding surfaces and elucidate likely wear mechanisms. The EDX analysis of the worn surface indicated that material transfer was occurred from the SiC ball to the disk. It was suggested that the material transfer played an important role in the wear performance.