• Journal of Electrical Engineering and Technology
• /
• v.2 no.1
• /
• pp.106-111
• /
• 2007

Laser cutting with the micro-control technique has great potential to be employed for acrylic machining. In this paper, the optimal conditions of acrylic etching have been investigated. The three parameters such as laser power, moving velocity, and thickness of acrylic are experimented to find out optimal conditions. From these experimental results, we have known that it is very important to control accurate power by the TRIAC switching technique. The best condition of acrylic etching is performed 10 Wand 72 mm/sec at the plastic thickness of 1.33 mm. The other case is performed 10 W and 48 mm/sec, and 12 W and 56 mm/sec at the acrylic thickness of 2.00mm, respectively.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2007.05a
• /
• pp.32.2-32.2
• /
• 2007

• Korean Journal of Materials Research
• /
• v.17 no.12
• /
• pp.642-647
• /
• 2007

We investigated dry etching of acrylic (PMMA) in $O_2/N_2$ plasmas using a multi-layers electrode reactive ion etching (RIE) system. The multi-layers electrode RIE system had an electrode (or a chuck) consisted of 4 individual layers in a series. The diameter of the electrodes was 150 mm. The etch process parameters we studied were both applied RIE chuck power on the electrodes and % $O_2$ composition in the $N_2/O_2$ plasma mixtures. In details, the RIE chuck power was changed from 75 to 200 W.% $O_2$ in the plasmas was varied from 0 to 100% at the fixed total gas flow rates of 20 sccm. The etch results of acrylic in the multilayers electrode RIE system were characterized in terms of negatively induced dc bias on the electrode, etch rates and RMS surface roughness. Etch rate of acrylic was increased more than twice from about $0.2{\mu}m/min$ to over $0.4{\mu}m/min$ when RIE chuck power was changed from 75 to 200 W. 1 sigma uniformity of etch rate variation of acrylic on the 4 layers electrode was slightly increased from 2.3 to 3.2% when RIE chuck power was changed from 75 to 200 W at the fixed etch condition of 16 sccm $O_2/4\;sccm\;N_2$ gas flow and 100 mTorr chamber pressure. Surface morphology was also investigated using both a surface profilometry and scanning electron microscopy (SEM). The RMS roughness of etched acrylic surface was strongly affected by % $O_2$ composition in the $O_2/N_2$ plasmas. However, RIE chuck power changes hardly affected the roughness results in the range of 75-200 W. During etching experiment, Optical Emission Spectroscopy (OES) data was taken and we found both $N_2$ peak (354.27 nm) and $O_2$ peak (777.54 nm). The preliminarily overall results showed that the multi-layers electrode concept could be successfully utilized for high volume reactive ion etching of acrylic in the future.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2008.11a
• /
• pp.29.1-29.1
• /
• 2008

• Korean Journal of Materials Research
• /
• v.19 no.2
• /
• pp.68-72
• /
• 2009

This study investigated dry etching of acrylic in capacitively coupled $SF_6$, $SF_6/O_2$ and $SF_6/CH_4$ plasma under a low vacuum pressure. The process pressure was 100 mTorr and the total gas flow rate was fixed at 10 sccm. The process variables were the RIE chuck power and the plasma gas composition. The RIE chuck power varied in the range of $25{\sim}150\;W$. $SF_6/O_2$ plasma produced higher etch rates of acrylic than pure $SF_6$ and $O_2$ at a fixed total flow rate. 5 sccm $SF_6$/5 sccm $O_2$ provided $0.11{\mu}m$/min and $1.16{\mu}m$/min at 25W and 150W RIE of chuck power, respectively. The results were nearly 2.9 times higher compared to those at pure $SF_6$ plasma etching. Additionally, mixed plasma of $SF_6/CH_4$ reduced the etch rate of acrylic. 5 sccm $SF_6$/5 sccm $CH_4$ plasma resulted in $0.02{\mu}m$/min and $0.07{\mu}m$/min at 25W and 150W RIE of chuck power. The etch selectivity of acrylic to photoresist was higher in $SF_6/O_2$ plasma than in pure $SF_6$ or $SF_6/CH_4$ plasma. The maximum RMS roughness (7.6 nm) of an etched acrylic surface was found to be 50% $O_2$ in $SF_6/O_2$ plasma. Besides the process regime, the RMS roughness of acrylic was approximately $3{\sim}4\;nm$ at different percentages of $O_2$ with a chuck power of 100W RIE in $SF_6/O_2$ plasma etching.

• Restorative Dentistry and Endodontics
• /
• v.18 no.1
• /
• pp.114-121
• /
• 1993

The purpose of this study was to evaluate the effect on treatment methods to shear bond strength between composite resin and amalgam when the alloy surface was finished with a diamond wheel or an sandblaster. Forty round acrylic cylinders were fabricated with a diameter of 33mm and a height of 20mm to fit into the device used during shear bond strength testing. A round undercut cavity (diameter, 8mm: depth, 2.5mm) was prepared in the center of the acrylic surface and the cavity was restored using a amalgam. A total of 40 acrylic cylinders with amalgam were divided into 4 groups according to treatment method. The group treatment were as follows : Group 1 : acid etching after finishing the amalgam with diamond wheel Group 2 : no acid etching after finishing the amalgam with diamond wheel Group 3 : acid etching after sandblasting the amalgam Group 4 : no acid etching after sandblasting the amalgam The shear bond strength of composite resin bonded to amalgam of each specimen was tested with a universal testing machine at a crosshead speed of 0.5mm/min and 500kg in full scale. The results were as follow: 1. After diamond finishing, the non-acid etching group had highest shear bond strength with 7.29kg/$cm^2$ and after sandblasting, the acidetching group had lowest shear bond strength with 4.49kg/$cm^2$. 2. In both diamond finishing and sandblasting group, acid etching of the roughened amalgam surface decreased the shear bond strength. 3. The group treated with a diamond wheel had higher shear bond strength those treated with an sandblaster but there was not significanat.

• Restorative Dentistry and Endodontics
• /
• v.20 no.1
• /
• pp.362-371
• /
• 1995

The purpose of this study was to evaluate the shear bond strength between composite resin and glass ionomer cement according to surface treatment methods of glass ionomer cement. Sixty round acrylic cylinders were fabricated. And then, a round undercut cavity(8 mm diameter, 2.5mm depth) was prepared in the center of the every acrylic cylinder. After all cavities were restored by using light-cured glass ionomer cement. A total of sixty acrylic cylinders restored with glass ionomer cement were divided into 4 groups according to surface treatment methods of glass ionomer cement. The surface treatment of each group were as follows : control group : no treatment Group 1 : acid etching Group 2 : sandblasting Group 3 : air-podwer abrasive polishing The composite resin was bonded to glass ionomer cement of each specimens. And the shear bond strength was tested with a universal testing machine at a cross-head speed of 1mm/min and 500kg in full scale. The results were as follows : 1. The sandblasting group(group 2) had the highest shear bond strength with $272.50{\pm}24.96\;kg/cm_2$ and the acid etching group(group 1) had the lowest shear bond strength with $192.89{\pm}29.32kg/cm_2$. 2. The no treated group(control group) had higher shear bond strength than acid etching group(group 1) (p<0.05). 3. The sandblasting group(group 2), air-powder abrasive polishing group(group 3) and no treated group(control group) had higher shear bond strength than the acid etching group(group 1) (p<0.05). 4. The sandblasting group(group 2) and air-powder abrasive polishing group(group 3) had higher shear bond strength than the no treatment group(control group), but there was not significant(p>0.05).

• Proceedings of the KIEE Conference
• /
• 1999.07g
• /
• pp.3316-3318
• /
• 1999

PMMA(poly-methyl methacrylate) microlens array is fabricated using transparent acrylic resin. PMMA is commonly used material for plastic lens due to its excellent visibility larger than 90% and other optical characteristics so much close to those of glass. Orthodontic resin (DENTSPLY International Inc.), commonly used in dentistry, is an transparent acrylic resin kit including MMA liquid and polymerization powder. Their mixture results in PMMA through polymerization. Using the resin PMMA layer is formed on the substrate through spin-coating. Designed pattern of lens structure is transferred to PMMA layer by RIE (Reactive Ion Etching) with oxygen plasma. Final lens shape is formed by thermal treatment that causes PMMA to reflow, The thickness of PMMA spun on the substrate is $17{\mu}m$ that is also final sag of microlens, Designed diameters of the microlenses are $200{\mu}m$, $300{\mu}m$,and $500{\mu}m$, respectively.

• Restorative Dentistry and Endodontics
• /
• v.5 no.1
• /
• pp.13-18
• /
• 1979

The purpose of this study was to measure the roughness on the acid -etching surface. The etching agents of three-kinds composite resins were used to etch the tooth surface. Newly extracted I5-anterior teeth were invested with self-curing acrylic resin, and the labial surface was exposed. The exposed labial side was polished with abrasive papers and finally polished on polishing machine with zinc oxide powder. After the teeth were polished, the specimens were washed by water and dried by air. Surface roughness tester, Taylor-Habson's Taly Surf-10, (Fig-1) was used to measure roughness of this unetched tooth surface. And that, the specimens were divided into three groups. The first group was etched with Restodent etchant, the second group was etched with Nuva-system etchant, and Hi-pol etching agent was used in the third group. And the surface roughness tester was used to measure roughness of the etching teeth surface. The results obtained were as follows. 1. The roughness of acid-etched enamel were increased $2{\mu}m$ to $6{\mu}m$. 2. Hi-pol etchant produced the smoothest surface($2.3{\mu}m$). 3. Restodent etchant($3.8{\mu}m$) and Nuva-system etchant($3.7{\mu}m$) produced rougher surface than Hi-pol.

• The Journal of Korean Academy of Prosthodontics
• /
• v.45 no.4
• /
• pp.407-418
• /
• 2007

Purpose: The objective of this study was to evaluate the effects of hydrofluoric acid concentration & etching time on the shear bond strength between IPS Empress 2 ceramic and resin cement. Material and methods: Thirty three rectangular shape ceramic specimens($20{\times}12{\times}5mm$ size, IPS Empress 2 core materials) were used for this study. The ceramic specimens divided into ten experimental groups with three specimens in each group and were etched with hydrofluoric acid(4%, 9%) according to different etching times(30s, 60s, 90s, 120s, 180s). Etched surfaces of ceramic specimens were bonded with resin cement(Rely X Unicorn) using acrylic glass tube. All cemented specimens were tested under shear loading until fracture on universal testing machine at a crosshead speed of 0.5mm/min and the maximum load at fracture(kg) was recorded. Collected shear bond strength data were analyzed with one way ANOVA and Duncan tests. All etched ceramic surfaces were examined morphologically using SEM(scanning electron microscopy). Results: Shear bond strength of etching group$(35.89{\sim}68.01MPa)$ had four to seven times greater than no-etching group$(9.53{\pm}2.29MPa)$. The ceramic specimen etched with 4% hydrofluoric acid for 60s showed the maximum shear bond strength$(68.01{\pm}11.78MPa)$. Ceramic surface etched with 4% hydrofluoric acid for 60s showed most retentive surface texture. Conclusion: It is considered that 60s etching with 4% hydrofluoric acid is optimal etching methods for IPS Empress 2 ceramic bonding.