• 한국재료학회지
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• 제25권9호
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• pp.462-467
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• 2015

Pellicle is defined as a thin transparent film stretched over an aluminum (Al) frame that is glued on one side of a photomask. As semiconductor devices are pursuing higher levels of integration and higher resolution patterns, the cleaning of the Al flame surface is becoming a critical step because the contaminants on the Al flame can cause lithography exposure defects on the wafers. In order to remove these contaminants from the Al frame, a highly concentrated nitric acid ($HNO_3$) solution is used. However, it is difficult to fully remove them, which results in an increase in the Al surface roughness. In this paper, the pellicle frame cleaning is investigated using various cleaning solutions. When the mixture of sulfuric acid ($H_2SO_4$), hydrofluoric acid (HF), hydrogen peroxide ($H_2O_2$), and deionized water with ultrasonic is used, a high cleaning efficiency is achieved without $HNO_3$. Thus, this cleaning process is suitable for Al frame cleaning and it can also reduce the use of chemicals.

• 보존과학회지
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• 제28권3호
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• pp.229-233
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• 2012

본 연구에서는 상아 시편에 습식 세척과 약산을 통한 색상 회복 처리를 실시하고, 이에 대한 안정성 평가를 실시하였다. 사용된 상아 시편은 블랙라이트와 능형무늬 분석을 통해 진위여부를 확인하였다. 습식 세척제로는 상아 및 골각류 유물 처리에 주로 사용되는 증류수, 에틸알코올, 아세톤으로 처리하였으며, 세척 결과 표면관찰, 중량 측정, 색도 측정에서 특별한 변화가 관찰되지 않았다. 약산을 통한 색상 회복 실험에서는 UV-A, UV-B, UV-C 세 가지 파장 하에서 1주일간 인공 열화 시킨 시편을 대상으로 약산 용액인 2%와 5%로 희석된 아세트산 용액과 레몬즙을 이용해서 처리하였다. 처리 결과, 모든 시편에서 표면에 균열과 공극이 관찰되었으며, 레몬즙을 사용한 경우 시편의 색이 붉게 변색되어 유물에 적용이 불가능하다고 판단된다.

• 상하수도학회지
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• 제31권3호
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• pp.229-236
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• 2017

In this study, a direct contact membrane module was manufactured to be used in a pilot scale membrane distillation process to treat $3m^3/day$ of the digestate produced from anaerobic digestion of livestock manure. In order to investigate the performance of the membrane module, permeate flux was measured with and without spacer inside the module under various condition of temperature difference and cross flow velocity (CFV) through the membrane surfaces. Flux recovery rate after chemical cleaning was also investigated by applying three different cleaning methods. Additionally, thermal energy consumption was theoretically simulated based on actual pilot plant operation conditions. As results, we observed flux of the module with spacer was almost similar to the theoretically predicted value because the installation of spacer reduced the channeling effect inside the module. Under the same operating condition, the permeate flux also increased with increasing temperature difference and CFV. As a result of chemical in-line cleaning using NaOCl and citric acid for the fouled membranes, the recovery rate was 83.7% compared to the initial flux when NaOCl was used alone, and 87% recovery rate was observed when only citric acid was used. However, in the case of using only citric acid, the permeate flux was decreased at a rapid rate. It seemed that a cleaning by NaOCl was more effective to recover the flux of membrane contaminated by the organic matter as compared to a cleaning by citric acid. The total heat energy consumption increased with increasing CFV and temperature difference across the membrane. Thus, further studies should be intensively conducted to obtain a high permeate flux while keeping the energy consumption to a minimum for a practical application of membrane distillation process to treat wastewater.

• Restorative Dentistry and Endodontics
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• 제47권2호
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• pp.21.1-21.11
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• 2022

Objectives: This study aimed to investigate the bonding effects of cleaning protocols on dentin impregnated with endodontic sealer residues using ethanol (E) or xylol (X). The effects of dentin acid etching immediately (I) or 7 days (P) after cleaning were also evaluated. For bonding to dentin, universal adhesive (Scotchbond Universal; 3M ESPE) was used. The persistence of sealer residues, hybrid layer formation and microshear bond strength were the performed analysis. Materials and Methods: One hundred and twenty bovine dentin specimens were allocated into 4 groups (n = 10): G1 (E+I); G2 (X+I); G3 (E+P); and G4 (X+P). The persistence of sealer residues was evaluated by SEM. Confocal laser scanning microscopy images were taken to measure the formed hybrid layer using the Image J program. For microshear bond strength, 4 resin composite cylinders were placed over the dentin after the cleaning protocols. ANOVA followed by Tukey test and Kruskal-Wallis followed by Dunn test were used for parametric and non-parametric data, respectively (α = 5%). Results: G2 and G4 groups showed a lower persistence of residues (p < 0.05) and thicker hybrid layer than the other groups (p < 0.05). No bond strength differences among all groups were observed (p > 0.05). Conclusions: Dentin cleaning using xylol, regardless of the time-point of acid etching, provided lower persistence of residues over the surface and thicker hybrid layer. However, the bond strength of the universal adhesive system in etch-and-rinse strategy was not influenced by the cleaning protocols or time-point of acid etching.

• 분석과학
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• 제6권5호
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• pp.521-530
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• 1993

몬트리올의정서에 의하여 오존층 파괴물질로 규정된 전자산업의 필수불가결한 세정제인 CFC 113(1,1,2-trichloro 1,2,2,-trifluoroethane)의 사용이 앞으로 규제가 됨에 따라서 대체세정제의 개발이 활발히 진행되고 있다. 따라서 현재 시판중인 세정제의 종류는 상당히 많다. 이 중에서 Axarel 32(DuPont), Cleanthru 750H(KAO Chemical), EC-Ultra(Petroferm)를 선정하여 CFC 113과 세정성능을 비교하였다. CFC 113과 대체세정제의 세정성능 검사방법은 기본적은 물성측정, 재질호환성에 대한 실험, 증발속도의 측정, 오염물질의 제거효율에 관한 실험으로 구성되어 있다. CFC 113과 대체세정제들의 기본적인 물성들은 서로 상이하였다. 대체세정제는 비점이 높고 표면장력과 점도가 CFC 113보다 큰 값을 가지고 있다. 전자산업에서의 로진계 flux를 오염물질로 하고 각기의 세정제와의 용해도를 비교한 결과 비극성 유기물질은 abietic acid에 대한 용해도는 서로 유사하였으나 대체세정제의 경우 극성 유기물질에 대한 용해도는 CFC 113에 비해서 월등히 좋았다. 또한 비점이 낮은 CFC 113의 건조성은 대체세정제와는 비교할 수 없을 정도로 우수하였고 특히 대체세정제 중에서 EC-Ultra는 건조성이 매우 낮았다. CFC 113과 대체세정제에서의 PCB의 구성 재질인 FR4와 Cu-coated FR4에 대한 재질호환성은 거의 비슷하였다. Abietic acid의 제거효율에 관한 실험에서는 초음파 세정에 의해서 우수한 세정효과를 보여 주었으며 침적에 의해 세정에서는 건조성이 좋은 세정제가 유리하지만 초음파 세정에 의해서 대체세정제간의 제거효율의 차이는 거의 없었다. CFC 113의 대체세정제로서 로진계 flux를 제거하는 대체세정제간의 세정성능은 큰 차이는 없으나 최종 세정제로 선정하기 위해서는 세정장치의 적용, 환경문제 및 경제성의 고려가 병행되어야 한다.

• Membrane and Water Treatment
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• 제5권3호
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• pp.207-219
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• 2014

Fouling is one of the critical factors associated with the application of membrane technology in treating palm oil mill effluent (POME), due to the presence of high concentration of solid organic matter, oil, and grease. In order to overcome this, chemical cleaning is needed to enhance the effectiveness of membranes for filtration. The potential use of sodium hydroxide (NaOH), sodium chloride (NaCl), hydrochloric acid (HCl), ethylenediaminetetraacetic acid (EDTA), and ultrapure water (UPW) as cleaning agents have been investigated in this study. It was found that sodium hydroxide is the most powerful cleaning agent, the optimum conditions that apply are as follows: 3% for the concentration of NaOH, $45^{\circ}C$ for temperature solution, 5 bar operating pressure, and solution pH 11.64. Overall, flux recovery reached 99.5%. SEM images demonstrated that the membrane surface after cleaning demonstrated similar performance to fresh membranes. This is indicative of the fact that NaOH solution is capable of removing almost all of the foulants from PES membranes.

• 한국재료학회지
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• 제27권11호
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• pp.577-582
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• 2017

Self-cleaning and photocatalytic $TiO_2$ thin films were prepared by a facile sol-gel method followed by spin coating using peroxo titanic acid as a precursor. The as-prepared thin films were heated at low temperature($110^{\circ}C$) and high temperature ($400^{\circ}C$). Thin films were characterized by X-ray diffraction(XRD), Field-emission scanning electron microscopy(FESEM), UV-Visible spectroscopy and water contact angle measurement. XRD analysis confirms the low crystallinity of thin films prepared at low temperature, while crystalline anatase phase was found the for high temperature thin film. The photocatalytic activity of thin films was studied by the photocatalytic degradation of methylene blue dye solution. Self-cleaning and photocatalytic performance of both low and high temperature thin films were compared.

• 한국재료학회지
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• 제19권3호
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• pp.174-178
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• 2009

The effects of post-CMP cleaning on the chemical and galvanic corrosion of copper (Cu) and titanium (Ti) were studied in patterned silicon (Si) wafers. First, variation of the corrosion rate was investigated as a function of the concentration of citric acid that was included in both the CMP slurry and the post-CMP solution. The open circuit potential (OCP) of Cu decreased as the citric acid concentration increased. In contrast with Cu, the OCP of titanium (Ti) increased as this concentration increased. The gap in the OCP between Cu and Ti increased as citric acid concentration increased, which increased the galvanic corrosion rate between Cu and Ti. The corrosion rates of Cu showed a linear relationship with the concentrations of citric acid. Second, the effect of Triton X-$100^{(R)}$, a nonionic surfactant, in a post-CMP solution on the electrochemical characteristics of the specimens was also investigated. The OCP of Cu decreased as the surfactant concentration increased. In contrast with Cu, the OCP of Ti increased greatly as this concentration increased. Given that Triton X-$100^{(R)}$ changes its micelle structure according to its concentration in the solution, the corrosion rate of each concentration was tested.

• Corrosion Science and Technology
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• 제8권6호
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• pp.209-216
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• 2009

In this study the effect of different surface finishing techniques on the pitting corrosion behaviour of a commercial 304 stainless steel alloy was investigated. Surface finishing methods were divided into two categories, i.e. mechanical and chemical. Mechanical treatment methods include power tooling such as grinding, emery paper brushing, stainless steel wire brushing and stainless steel shot blasting. Chemical treatment methods include chemical passivation (phosphoric acid, citric acid, nitric acid) and electro-cleaning (phosphoric acid and citric acid). Potentiodynamic polarization experiments were carried out in 3.5 wt. % NaCl solution at room temp. (20 $^{\circ}C$). The results showed that chemical treatment methods improved the corrosion resistance of stainless steel 304, measured in terms of pitting potential ($E_{pit}$). Corrosion resistance of the specimens was increased in the order of; electro-cleaning > manual passivation > mechanical cleaning. Surface of electro-cleaned specimens was smoother than rest of the surface treatment methods. Chrome content in chemically treated specimens was higher than in mechanically treated specimens as shown by EDX analysis.

• 공업화학
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• 제33권2호
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• pp.229-233
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• 2022

In this study, a gas-liquid hybrid atmospheric pressure plasma reactor of the dielectric barrier discharge method was fabricated and characterized. The solubility of copper oxide in the organic acid solution was increased when argon having a larger atomic weight than helium was used during plasma discharge. There was no significant effect of mixing organic acid solutions under plasma discharge treatment on the variation of copper oxide's solubility. As the applied voltage for plasma discharge and the concentration of the organic acid solution increased, the dissolution and removal power of the copper oxide layer increased. Solubility of copper oxide was more affected by the concentration in organic acid solution rather than the variation of plasma applied voltage. The usefulness of hybrid plasma reactor for the surface cleaning process was confirmed.