• Title/Summary/Keyword: AZO films

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Effect of process parameters of antimony doped tin oxide films prepared on flexible substrate at room temperature

  • Lee, Seong-Uk;Hong, Byeong-Yu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.175-175
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    • 2010
  • Transparent conducting oxide (TCO) films are widely used as transparent conducting thin film material for application in various fields such as solar cells, optoelectronic devices, heat mirrors and gas sensors, etc. Recently the increased utilization of many transparent electrodes has accelerated the development of inexpensive TCO materials. Indium tin oxide (ITO) film is well-known for TCO materials because of its low resistivity, but there is disadvantage that it is too expensive. ZnO film is cheaper than ITO but it shows thermally poor stability. On the contrary, antimony-doped tin oxide films (ATO) are more stable than TCO films such as Al-doped zinc oxide (AZO) and ITO. Moreover, SnO2 film shows the best thermal and chemical stability, low cost and mechanical durability except the poor conductivity. However, annealing is proved to improve the conductivity of ATO film. Therefore, in this work, antimony (6 wt%) doped tin oxide films to improve the conductivity were deposited on 7059 corning glass by RF magnetron sputtering method for the application to transparent electrodes. In general, of all TCO films, glass is the most commonly selected substrate. However, for future development in flexible devices, glass is limited by its intrinsic inflexibility. In this study, we report the growth and properties of antimony doped tin oxide (ATO) films deposited on PES flexible substrate by using RF magnetron sputtering. The optimization process was performed varying the sputtering parameters, such as RF power and working pressure, and parameter effect on the structural, electrical and optical properties of the ATO films were investigated.

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Effect of Work Function of Zn-doped ITO Thin Films on Characteristics of Silicon Heterojunction Solar Cells (실리콘 이종접합 태양전지 특성에 대한 Zn 도핑된 ITO 박막의 일함수 효과)

  • Lee, Seung-Hun;Tark, Sung-Ju;Choi, Su-Young;Kim, Chan-Seok;Kim, Won-Mok;Kim, Dong-Hhwan
    • Korean Journal of Materials Research
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    • v.21 no.9
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    • pp.491-496
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    • 2011
  • Transparent conducting oxides (TCOs) used in the antireflection layer and current spreading layer of heterojunction solar cells should have excellent optical and electrical properties. Furthermore, TCOs need a high work function over 5.2 eV to prevent the effect of emitter band-bending caused by the difference in work function between emitter and TCOs. Sn-doped $In_2O_3$ (ITO) film is a highly promising material as a TCO due to its excellent optical and electrical properties. However, ITO films have a low work function of about 4.8 eV. This low work function of ITO films leads to deterioration of the conversion efficiency of solar cells. In this work, ITO films with various Zn contents of 0, 6.9, 12.7, 28.8, and 36.6 at.% were fabricated by a co-sputtering method using ITO and AZO targets at room temperature. The optical and electrical properties of Zn-doped ITO thin films were analyzed. Then, silicon heterojunction solar cells with these films were fabricated. The 12.7 at% Zn-doped ITO films show the highest hall mobility of 35.71 $cm^2$/Vsec. With increasing Zn content over 12.7, the hall mobility decreases. Although a small addition of Zn content increased the work function, further addition of Zn content over 12.7 at.% led to decreasing electrical properties because of the decrease in the carrier concentration and hall mobility. Silicon heterojunction solar cells with 12.7 at% Zn-doped ITO thin films showed the highest conversion efficiency of 15.8%.

Optical and electrical property of Indium-doped ZnO (IZO) grown by Atomic Layer Deposition (ALD) using Et2InN(TMS)2 as In precursor and H2O oxidant

  • Jo, Yeong-Jun;Jang, Hyo-Sik
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.421.1-421.1
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    • 2016
  • We studied indium-doped zinc oxide (IZO) film grown by atomic layer deposition (ALD) as transparent conductive oxide (TCO). A variety of TCO layer, such as ZnO:Al (AZO), InSnO2(ITO), Zn (O,S) etc, has been grown by various method, such as ALD, chemical vapor deposition (CVD), sputtering, laser ablation, sol-gel technique, etc. Among many deposition methods, ALD has various advantages such as uniformity of film thickness, film composition, conformality, and low temperature deposition, as compared with other techniques. In this study, we deposited indium-doped zinc oxide thin films using diethyl[bis(trimethylsilyl)amido]indium [Et2InN(TMS)2] as indium precursor, DEZn as zinc precursor and H2O as oxidant for ALD and investigated the optical and electrical properties of IZO films. As an alternative, this liquid In precursor would has several advantages in indium oxide thin-film processes by ALD, especially for low resistance indium oxide thin film and high deposition rate as compared to InCp, InCl3, TMIn precursors etc. We found out that Indium oxide films grown by Et2InN(TMS)2 and H2O precursor show ALD growth mode and ALD growth window. We also found out the different growth rate of Indium oxide as the substrate and investigated the effect of the substrate on Indium oxide growth.

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Azimuthal Angle Scan Distribution, Third Order Response, and Optical Limiting Threshold of the Bismarck Brown Y:PMMA Film

  • Fadhil Abass Tuma;Hussain Ali Badran;Harith Abdulrazzaq Hasan;Riyadh Chassib Abul-Hail
    • Current Optics and Photonics
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    • v.7 no.6
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    • pp.721-731
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    • 2023
  • This paper studies various roughness parameters, besides waviness, texture, and nonlinear parameters of Bismarck brown Y (BBY)-doped Poly(methyl methacrylate) (PMMA) films based on the computed values of optical limiting (OL) threshold power and nonlinear refractive index. The films' morphology, grain size, and absorption spectra were investigated using atomic force microscopy in conjunction with ultraviolet-visible (UV-Vis) spectrophotometer. The particle size of the films ranged between 4.11-4.51 mm and polymer films showed good homogeneity and medium roughness, ranging from 1.11-4.58 mm. A polymer film's third-order nonlinear optical features were carried out using the Z-scan methodology. The measurements were obtained by a continuous wave produced from a solid-state laser with a 532 nm wavelength. According to the results, BBY has a nonlinear refractive index of 10-6 cm2/W that is significantly negative and nonlinear. The optical limiting thresholds are roughly 10.29, 13.52, and 18.71 mW, respectively. The shift of nonlinear optical features with the film's concentration was found throughout the experiment Additionally, we found that the polymer samples have outstanding capabilities for restricting the amount of optical power that may be transmitted through them. We propose that these films have the potential to be used in a wide variety of optoelectronic applications, including optical photodetectors and optical switching.

Fabrication of the Superhydrophobic Surface Inspired from Lotus-Effect (연꽃잎을 모사한 초소수성 표면 제작)

  • Jung, Dae-Hwan;Lim, Hyun-Eui;Noh, Jeong-Hyun;Kim, Wan-Doo
    • Proceedings of the KSME Conference
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    • 2007.05a
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    • pp.409-414
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    • 2007
  • Wettability of solid surfaces with liquids is governed by the chemical properties and the microstructure of the surfaces. We report on the preparation of liquid-repellent surfaces using surface-attached monolayers of perfluorinated polymer molecules on porous silica substrates. A covalent attachment of the polymer molecules to the substrate is achieved by generation of the polymer chains through starting a surface-initiated radical-chain polymerization of a fluorinated monomer. To this, self-assembled monolayers of azo initiators are attached to silica substrates, which are used to kick off the polymerization reaction in situ. The growth of the fluorinated polymer films and the characterization of the obtained surfaces by surface plasmon spectroscopy, XPS, and contact angle measurements is described. It is shown that perfluorinated polymer films can be grown with controlled thicknesses on flat and even on porous silica surfaces, essentially without changing the surface roughness. The combination of the low surface energy coating and the surface porosity allows generation of materials which are both water and oil repellent.

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Characteristics of phosphorescent OLED fabricated on IAZO anode grown by co-sputtering method (Co-sputtering 방법으로 제작한 IAZO 박막의 특성과 이를 이용하여 제작한 인광 OLED의 특성 분석)

  • Bae, Jung-Hyeok;Kim, Han-Ki
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.60-61
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    • 2007
  • IAZO (indium aluminium zinc oxide) anode films were co-sputtered on glass substrate using a dual target DC magnetron sputtering system. For preparation of IATO films, at constant DC power of IZO (indium zinc oxide) target of 100 W, the DC power of AZO (Aluminum zinc oxide) target was varied from 0 to 100 W. To analyze electrical and optical properties of IAZO anode, Hall measurement examination and UV/V is spectrometer were performed, respectively. In addition, structure of IAZO anode film was examined by X-ray diffraction (XRD) method. Surface smoothness was investigated by Scanning Electron Microscopy (SEM) and Atomic Force Microscopy (AFM). From co-sputtered IAZO anode, good conductivity($2.32{\times}10^{-4}{\Omega}.cm$) and high transparency(approximately 80%) in the visible range were obtained even at low temperature deposition. Finally, J-V-L characteristics of phosphorescent OLED with IAZO anode were studied by Keithley 2400 and compared with phosphorescent OLED with conventional ITO anode.

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A Study on Properties of Al:ZnO Thin Films by Used RTP Method

  • Yang, Hyeon-Hun;Kim, Han-Wool;So, Soon-Youl;Park, Gye-Choon;Lee, Jin;Na, Kil-Ju
    • Transactions on Electrical and Electronic Materials
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    • v.14 no.2
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    • pp.90-93
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    • 2013
  • Al:ZnO thin films were deposited using the radio frequency magnetron sputtering technique at various temperatures and sputtering powers. With the increase in the deposition temperature and the decrease in the radio frequency sputtering power, the crystallinity was increased and the surface roughness was decreased, which lead to the decrease in the electrical resistivity of the film. It is also clearly observed that, the intensity of the (002) XRD peak increases with increasing the substrate temperature [1,2]. The electrical resistivity and optical transmittance of the Al:ZnO thin film were analyzed as a function of the post-annealing temperature. It can be seen that with the annealing temperature set at $400^{\circ}C$, the resistivity decreases to a minimum value of $4.1{\times}10^{-3}{\Omega}cm$ and the transmittance increases to a maximum value of 85% of the Al:ZnO thin film.

Effect of Thickness on the Properties of Al Doped ZnO Thin Films Deposited by Using PLD (Al이 도핑된 ZnO 소재의 PLD 박막 두께 변화가 특성에 미치는 영향)

  • Pin, Min-Wook;Bae, Ki-Ryeol;Park, Mi-Seon;Lee, Won-Jae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.7
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    • pp.568-573
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    • 2011
  • AZO (Al doped ZnO) thin films were deposited on the quartz substrates with thickness variation from 25 to 300 nm by using PLD (pulsed laser deposition). XRD (x-ray diffractometer), SPM (scanning probe microscopy), Hall effect measurement and uv-visible spectrophotometer were employed to investigate the structural, morphological, electrical and optical properties of the thin films. XRD results demonstrated that films were preferrentially oriented along the c-axis and crystallinity of film was improved with increase of film thickness. As for the surface morphologies, the mean diameter and root mean square of grains were increased as the film thickness was increased. When the film thickness was 200 nm, the lowest resistivity of $4.25{\times}10^{-4}\;{\Omega}cm$ obtained with carrier concentration of $6.84{\times}10^{20}\;cm^{-3}$ and mobility of $21.4\;cm^2/V{\cdot}S$. All samples showed more than 80% of transmittance in the visible range. Upon these results, it is found that the samples thickness can affect their structural, morphological, optical and electrical properties. This study suggests that the resistivity can be improved by controlling film thickness.

New Azo Polymers and Their Applications to High Density Optical Memory Devices

  • Han, Yang-Kyoo;Lee, Min-Jeong
    • Proceedings of the Polymer Society of Korea Conference
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    • 2006.10a
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    • pp.169-169
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    • 2006
  • Novel liquid crystalline malonic ester monomers were synthesized from malonyl dichloride and mesogenic alcohols as a photoresponsive group. The monomers were polymerized with aliphatic or aromatic dibromides in the presence of sodium hydride to give 8 kinds of novel poly(malonic esters) with two symmetrical azobenzene groups. We found that the resulting polymer films could be used as rewritable optical data storage (or holographic image) media through a photoisomerization of azobenzene group by Ar laser irradiation. The sensitivity of data recording was dependent not only on the thickness of the polymeric thin film but also on the intensity of laser beam.

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Characterisecs of GAZO Films Deposited by DC Magnetron Co-Sputtering System (DC 마그네트론 동시방전 시스템을 이용하여 증착한 GAZO 박막의 특성 평가)

  • Jie, Luo;Park, Se-Hun;Song, Pung-Geun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2009.05a
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    • pp.187-187
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    • 2009
  • GAZO 박막의 증착은 $Ga_{2}O_{3}$의 첨가량 (6.65wt%) GZO 타겟과 $Al_{2}O_{3}$의 첨가량 (2.0wt%) AZO 타겟이 각각 장착된 2개의 캐소드를 이용한 DC 마그네트론 동시방전법에 의하여 non-alkali glass 기판위에 다양한 조건(파워, 기판온도, $H_2$ 참가량)에서 행하였다. GAZO박막의 전기적 특성은 Hall Effect measurements를 사용하여 측정 하였으며, 구조적 특성, 박막의 화학적 조성 및 광학적 특성은 XRD(X-ray diffraction), FESEM(Filed Emission Scanning Electron Microscope) 및 UV-Vis Spectrophotometer를 사용하여 평가 하였다. Al을 도입함으로써 캐리어밀도의 증가에 의해 GZO 박막의 특성은 개선됨을 확인 할 수 있었다.

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