• Journal of Navigation and Port Research
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• v.32 no.5
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• pp.363-368
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• 2008

This paper presents a miniaturization design technique of radio frequency identification (RFID) tag antenna operated in 910 MHz band. Miniaturization structure design for a tag antenna is performed by structure application of the folded dipole and meander line. In order to realize the maximum power transmission, imaginary part of a chip impedance and a tag antenna impedance is matched by complex conjugate number. The optimized tag antenna size is $50\;nm\;{\times}\;40\;nm\;{\times}\;1.6\;nm$ and its size is reduced about 62 % comparison with antenna size of reference [4]. The measured results of fabricated tag antenna are confirmed the reasonable agreement with prediction. The read range of the tag antenna with chip observed about 5 m.

• Transactions on Electrical and Electronic Materials
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• v.17 no.2
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• pp.121-124
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• 2016

ZnSnO₃ (ZTO)/Ag/ ZnSnO₃ (ZTO) trilayer films were prepared on glass substrates by radio frequency (RF) and direct current (DC) magnetron sputtering. The electrical resistivity and optical transmittance of the films were investigated as a function of the Ag interlayer thickness. ZTO films with a 15 nm thick Ag interlayer show the highest average visible transmittance (83.2%) in the visible range. In this study, the highest figure of merit (2.1×10⁻² Ω cm) is obtained with the ZTO 50 nm/Ag 15 nm/ZTO 50 nm films. The enhanced optical and electrical properties of ZTO films with a 15 nm thick Ag interlayer are attributed to the crystallization of the Ag interlayer, as supported by the distinct XRD pattern of the Ag (111) peaks. From the observed results, higher optical and electrical performance of the ZTO film with a 15 nm thick Ag interlayer seems to make a promising alternative to conventional transparent conductive ITO films.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.21 no.10
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• pp.938-942
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• 2008

Electrical and optical properties of semitransparent Ag and Al layer were studied, which are used for the electrodes in top-emission organic light-emitting diodes. Sheet resistance and transmittance of visible light through a thin layer were measured and analyzed. Several thin metal layers of Ag and Al were deposited onto a glass substrate up to a thickness of 50 nm using a thermal evaporation. Sheet resistance measurements show that a layer thickness is needed more than 15 nm and 20 nm for Ag and Al, respectively, when a proper sheet resistance is assumed to be less than $50{\Omega}/sq$. From the measurements of transmittance of visible light through a thin-metal layer, metallic behavior was observed when the layer thickness is over 25 nm for both films. Thus, from a study of sheet resistance and transmittance of visible light, a minimum proper thickness of semitransparent metal layer is 20 nm and 25 nm for Ag and Al, respectively.

• JSTS:Journal of Semiconductor Technology and Science
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• v.4 no.1
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• pp.41-44
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• 2004

The trend of decreasing the minimal structure sizes in microelectronics is still being continued. Therefore in its roadmap the Semiconductor Industries Association predicts a printed minimum MOS-transistor channel length of 10 nm for the year 2018. Although the resolution of optical lithography still dramatically increases, there are known and proved solutions for structure sizes significantly below 50 nm up to now. In this work a new method for the fabrication of extremely small MOS-transistors with a channel length and width below 50 nm with low demands to the used lithography will be explained. It's a further development of our deposition and etchback technique which was used in earlier research to produce transistors with very small channel lengths down to 30 nm, with a scaling of the transistor's width. The used technique is proved in a first charge of MOS-transistors with a channel area of W=200 nm and L=80 nm. The full CMOS compatible technique is easily transferable to almost any other technology line and results in an excellent homogeneity and reproducibility of the generated structure size. The electrical characteristics of such small transistor will be analyzed and the ultimate limits of the technique will be discussed.

• Journal of radiological science and technology
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• v.39 no.4
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• pp.637-642
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• 2016

In this study, we prepared and characterized a acrylate based UV-curable plastic scintillator. It was used co-polymers TMPTA, DHPA and Ultima $Gold^{TM}$ LLT organic scintillator. The emission spectrum of the plastic scintillator was located in the range of 380~520 nm, peaking at 423 nm. And the scintillator is more than 50% transparent in the range of 400~800 nm. The emission spectrum is well match to the quantum efficiency of photo-multiplier tube and the fast decay time of the scintillation is 12 ns, approximately. This scintillation material provides the possibility of combining 3D printing technology, and then the applications of the plastic scintillator may be expected in human dosimetry etc.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.217.2-217.2
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• 2015

본 연구에서는 ITZO를 용액으로 제작하여, $O_2$ 플라즈마 처리를 통해 표면 및 광학적 특성을 분석하였다. 열처리 전 처리시간(0초~70초)을 가변하여 $O_2$ 플라즈마 처리하였다. 박막의 표면 상태를 RMS (Root Mean Square)로 비교하였다. 처리 전 표면의 거칠기는 1.38 nm이고, 50초에서 0.67nm로 표면의 상태가 좋아지며, 이후에는 RMS가 증가하여 표면 상태가 안 좋아짐을 확인하였다. 50초까지는 $O_2$ 플라즈마 처리를 통해 표면 상태의 개선된 효과를 얻을 수 있지만, 70초 이후에는 표면이 에칭되어 저하된 특성을 보이는 것을 확인하였다. 광학적 특성은 투과도와 밴드갭으로 차이를 확인하였다. 가시광선 영역 (380 nm~770 nm)에서의 투과도는 92%에서 90%로 감소하였고, 밴드갭은 3.64eV에서 3.57eV로 줄어들었다. $O_2$ 플라즈마 처리 시간에 따라 개선효과를 얻을 수 있지만, 70초 이후에는 표면에 결함을 야기하여 표면 및 광학적 특성의 저하를 보였다.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.05a
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• pp.693-695
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• 2003

In this paper, we have investigated temperature-dependent characteristics of current-voltage for double gate MOSFET with main gate and side gate. DG MOSFET has the main gate length of 50nm and the side gate length of 70nm. We have investigated the temperature-dependent characteristics of current-voltage and drain voltage is changed from 0V to 5.0V at $V_{mg}$ =1.5V and $V_{sg}$ =3.0V. We have obtained a very good characteristics of current-voltage for 77K. We have simulated using ISE-TCAD tool for characteristics analysis of device.

• Journal of Korean Society for Atmospheric Environment
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• v.19 no.2
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• pp.133-143
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• 2003

Numerous evidence have been reported that fine particulate matters can play an important role in threatening human health. Recently concerns on fine particle pollution from various engines may require re-examination of particulate emission standards. The particles emitted by most diesel engines are mainly divided into their size ranges such as Dp< 50 nm and 50 nm< Dp< 1,000 nm. In this work, the number concentration and the size distribution of fine particles emitted from an exhaust manifold of a railroad diesel engine were measured under load test conditions using a scanning mobility particle sizer (SMPS). The fine particles observed were within the range of 7 to 304 nm under different load conditions with two different dilution ratios. The fine particles exhibited unique patterns showing bimodal shapes in size distribution.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.903-906
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• 2003

Doping a small amount of a phosphorescent dye into an organic light-emitting diodes(OLED) can lead to a significant improvement in the device properties. The fluorescent host materials like TAZ, CBP have been used, but have a problem of rapid decay of efficiency at high current densities. To alleviate this problem, phosphorescent host was introduced. The whole configuration of OELD fabricated was ITO/a-NPD(50nm)/Zn $cluster:Ir(ppy)_{3}(30nm)/BCP{(10nm)/Alq_{3}(20nm)$ /Al:Li. The OLED showed high luminance (> 50,000 $cd/m^{2}$ ) and external efficiency(5.7%). At higher current densities, rapid decay of external quantum efficiency or host emission, which was frequently observed in the fluorescent host system, were not observed.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.26 no.9
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• pp.682-685
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• 2013

We have fabricated blue phosphorescent organic light-emitting devices (OLEDs) on a plastic substrate. The solution coated poly (9-vinylcarbazole) (PVK) host doped with Bis (3,5-difluoro-2-(2-pyridyl)phenyl_(2-carboxypyridyl)irdium(III) (FIrPic) guest molecules was used as an hole transporting emission layer. The device structure was ITO/PVK:FIrpic (50 nm, xwt%)/TAZ 50 nm)/LiF (0.5 nm)/Al (100 nm). The concentration of FIrpic molecule was varied from 1 wt% to 10 wt%. The OLED on plastic substrate exhibited maximum current efficiency of 18 cd/A with 5 wt% FIrpic molecules were doped into the PVK layer.