• 제목/요약/키워드: 50nm

검색결과 2,606건 처리시간 0.033초

Infrared Scanning Near-Field Optical Microscopy (IR-SNOM) Below the Diffraction Limit

  • Sanghera, J.S.;Aggarwal, I.D.;Cricenti, A.;Generossi, R.;Luce, M.;Perfetti, P.;Margoritondo, G.;Tolk, N.;Piston, D.
    • 세라미스트
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    • 제10권3호
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    • pp.55-66
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    • 2007
  • Infrared Scanning Near-field Optical Microscopy (IR-SNOM) is an extremely powerful analytical instrument since it combines IR spectroscopy's high chemical specificity with SNOM's high spatial resolution. In order to do this in the infrared, specialty chalcogenide glass fibers were fabricated and their ends tapered to generate SNOM probes. The fiber tips were installed in a modified near field microscope and both inorganic and biological samples illuminated with the tunable output from a free-electron laser located at Vanderbilt University. Both topographical and IR spectral images were simultaneously recorded with a resolution of ${\sim}50\;nm$ and ${\sim}100\;nm$, respectively. Unique spectroscopic features were identified in all samples, with spectral images exhibiting resolutions of up to ${\lambda}/60$, or at least 30 times better than the diffraction limited lens-based microscopes. We believe that IR-SNOM can provide a very powerful insight into some of the most important bio-medical research topics.

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WDM 시스템을 위한 반도체 광 증폭기의 특성 (Characteristics of Semiconductor Optical Amplifier for WDM Systems)

  • 박윤호;강병권;이석;우덕하;김선호
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 디스플레이 광소자 분야
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    • pp.201-203
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    • 2000
  • To improve characteristics of optical devices that used be WDM system optimally, we investigated characteristics of two types structures that consisted of non-uniform thickness Quantum well. They have high characteristic temperature and 3dB bandwidth of spontaneous emission are 57nm, 50nm respectively, which are 1.4times, 1.3times wider than conventional structure.

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Optimizing Effective Channel Length to Minimize Short Channel Effects in Sub-50 nm Single/Double Gate SOI MOSFETs

  • Sharma, Sudhansh;Kumar, Pawan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제8권2호
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    • pp.170-177
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    • 2008
  • In the present work a methodology to minimize short channel effects (SCEs) by modulating the effective channel length is proposed to design 25 nm single and double gate-source/drain underlap MOSFETs. The analysis is based on the evaluation of the ratio of effective channel length to natural/ characteristic length. Our results show that for this ratio to be greater than 2, steeper source/drain doping gradients along with wider source/drain roll-off widths will be required for both devices. In order to enhance short channel immunity, the ratio of source/drain roll-off width to lateral straggle should be greater than 2 for a wide range of source/drain doping gradients.

DPSS UV 레이저를 이용한 블라인드 비아 홀 가공 (Blind Via Hole Drilling Using DPSS UV laser)

  • 김재구;장원석;신보성;장정원;황경현
    • 한국레이저가공학회지
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    • 제6권1호
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    • pp.9-16
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    • 2003
  • Micromachining using the DPSS 3rd Harmonic Laser (355nm) has outstanding advantages as a UV source in comparison with Excimer lasers in various aspects such as maintenance cost, maskless machining, high repetition rate and so on. It also has the greater absorptivity of many materials in contrast to other IR sources. In this paper, the process for micro-drilling of blind hole in Cu/PI/Cu substrate with the DPSS UV laser and the scanning device is investigated by the experimental methods. It is known that there is a large gap between the ablation threshold of copper and that of PI. We use the Archimedes spiral path for the blind hole with different energy densities to ablate the different material. Finally, the blind via hole of diameter 100$\mu\textrm{m}$ and 50$\mu\textrm{m}$ was drilled.

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금속 및 유리 기판 위에 알루미나 졸을 바인더로 한 $TiO_2$광 촉매의 코팅 (The Coating of Photocatalytic $TiO_2$on Metal and Glass using Alumina Sols as a Binder)

  • 석상일;안복엽;최경훈;서태수;유영문
    • 한국세라믹학회지
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    • 제38권7호
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    • pp.621-627
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    • 2001
  • 알루미나 졸에 평균 25nm의 TiO$_2$(Degussa P25) 광 촉매 분말을 분산하여 광촉매 코팅제를 제조하였다. 점도 약 24 cps를 가지 4.4 wt%의 알루미나 졸로부터 약 300nm 두께의 코팅막이 제조되었으며, 졸 점도의 증가에 비례하여 코팅막의 두께도 증가하였다. TiO$_2$광 촉매의 코팅용 바인더로 이용한 알루미나 졸의 결정형은 25~30$0^{\circ}C$에서 pseudo boehmite (AlOOH)이었으며, 50$0^{\circ}C$ 이상에서는 ${\gamma}$-Al$_2$O$_3$으로 전환되었다. AlOOH/TiO$_2$코팅막은 oleic acid와 humic acid에 대한 기상 및 수상 조건에서의 광 촉매 실험에서 우수한 유기물의 광분해 효능을 나타내었다. 아울러 EGI(Electro-Galvanized Iron)에 코팅된 AlOOH/TiO$_2$코팅막은 내식성 및 내지문성의 효과도 부수적으로 나타내었다.

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고분자에 대한 산화아연(ZnO) 나노입자의 열안정화 효과 (Effect of ZnO Nano Particles on Thermal Stabilization of Polymers)

  • 조광수;홍정일;정찬일
    • 한국섬유공학회:학술대회논문집
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    • 한국섬유공학회 2002년도 봄 학술발표회 논문집
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    • pp.171-172
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    • 2002
  • 나노미터 규모의 작은 충전제 입자는 마이크로 미터 규모의 일반적인 충전제 입자에 비해서 많은 다른 점이 발견되어 왔다. 이 연구에서는 최근에 알게된 입경이 100nm 이하인 ZnO 입자가 radical 중합된 고분자의 열안정성을 향상시키는 현상을 보다 자세하게 연구한 것이다. HDPE, LDPE, LLDPE, PP 및 PS를 열분해가 아주 느리게 일어나는 낮은 RPM으로 Haake사의 Torque Rheometer의 internal mixer 안에서 녹인 후 평균입경 49nm인 ZnO 나노입자를 약4분간 충부히 분산되도록 혼합하고 50 RPM으로 혼합속도를 높여서 시간에 따른 Trque의 변화를 측정하므로써 열안정성 효과를 관찰하였다. (중략)

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Preparation of Melamine Resin Microcapsules by Using Microreactor with Telomeric Surfactants

  • Hideto Shosenji;Misaki Korenori;Katsuki Ito;Yutaka Kuwahara;Tsuyoshi Sawada;Park, Soo-Min
    • 한국섬유공학회:학술대회논문집
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    • 한국섬유공학회 2003년도 The Korea-Japan Joint Symposium
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    • pp.37-38
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    • 2003
  • Melamine resin microcapsules with mean sizes from 500 to 600 m were prepared by using a micro-tubular reactor (microreactor) with toluene and sodium dodecylsulfate (SDS) as emulsifiers. Conventional stirring method with telomeric surfactant in place of SDS produced microcapsules with mean sizes from 100 to 200 nm. Preparation by means of microreactor method with telomeric surfactant gave microcapsules with sizes below 200 nm in narrow particle size distribution. TG analysis revealed that the microcapsules contained 50 wt% of toluene.

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힘 및 변위 감지기구를 적용한 초정밀 가공시스템 개발 (Development of an Ultra Precision Machining System Using a Force and Displacement Sensing Module)

  • 방진혁;권기환;조남규
    • 한국정밀공학회지
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    • 제22권12호
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    • pp.42-50
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    • 2005
  • This paper presents an ultra precision machining system using a high sensitive force sensing module to measure machining forces and penetration displacement in a tip-based nanopatterning. The force sensing module utilizes a leaf spring mechanism and a capacitive displacement sensor and it has been designed to provide a measuring range from 80 ${\mu}N$ to 8 N. This force sensing module is mounted on a PZT driven in-feed motion stage with 1 nm resolution. The sample can be moved by X-Y scanning motion stage with 5 nm resolution. In nano indentation experiments and patterning experiments, the machining forces were controlled and monitored by the force sensing module. Then, the patterned samples were measured by AFM. Experimental results demonstrated that the developed system can be used as an effective device in nano indentation and nanopatterning operation.

실험계획법에 의한 파라미터 분석과 Run to Run 제어를 이용한 폴리싱 공정 제어 (Run-to-Run Process Control and the Analysis of Process Parameters using Design of Experiment in Surface Finishing)

  • 안병운;박성준;이상조;윤종학
    • 한국정밀공학회:학술대회논문집
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    • 한국정밀공학회 2004년도 추계학술대회 논문집
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    • pp.92-96
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    • 2004
  • In this paper, polishing method using bonded magnetic abrasive particle has been applied to the micro mold polishing. Through process control using the Run-to-Run control, it tried to form the surface roughness In order to grasp the influence of the surface roughness which is reached by selection of control factor and the factor, a design of experiment was been processed. The study is processed with a purpose of to embody and to maintain the surface roughness of nano scale by the basis of an influence between a control factor and the factors which has been selected in this way. As a result, the result of the process control converged at a target value of surface roughness Ra 10nm and Rmax 50nm

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초고속 광변조기를 위한 Au coplanar waveguide 전극의 도금 특성 (Electro-Plating Properties of Au Coplanar Waveguide Electrode for High-Speed Optical Modulation)

  • 이승태;양우석;김우경;이한영;장호정
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2003년도 춘계학술발표강연 및 논문개요집
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    • pp.140-140
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    • 2003
  • Ti:LiNbO$_3$ 광 도파로를 이용한 광 변조기의 마이크로파 손실을 감소시키고 RF와 광파의 속도정합의 조건하에서 초고속 광변조의 제작을 위해서는 두꺼운 TW(travelling wave) 전극이 필수적이다 또한, 두꺼운 Au 전극이 우수한 RF 특성을 갖기 위해서는 도금된 Au 전극이 고순도의 작은 grain size를 갖는 도금 층을 제조하여야 하며, 도금 후 Au 층의 뒤틀림 현상이 작아야 한다. 따라서, 본 연구에서는 LiNbO$_3$ 기판 위에 30nm Ni-Cr과 50nm의 Au의 기저 막을 올렸으며 감광제를 이용한 photo-lithography 공정으로 CPW(coplanar waveguide) 구조의 패턴을 약 13$\mu\textrm{m}$의 두께로 형성 한 후 non-cyanidic 액을 이용하여 전류밀도 0.02 - 0.06 mA, bubble 및 non-bubble flow를 조건으로 하여 도금된 Au 전극의 특성을 관찰하였다.

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