• The korean journal of orthodontics
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• v.26 no.5 s.58
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• pp.497-507
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• 1996

The aim of present study in vitro was to evaluate and compare the effects of different washing times of enamels etched with low phosphoric acid solution which makes unsoluble salts and etched but contaminated with saliva on shear bond strength of an orthodontic adhesive to enamel, and to observe the washing effect on the etched enamel surface by scanning electron microscope. All brackets were bonded with Mono-$Lok2^{TM)}$) on the labial surface of extracted human bicuspids after etching with $20w/w\%\;and\;37w/w$ and phosphoric acid solution for 60seconds and then washing for 0,5,10 and 20seconds respectedly. After etching with $37w/w\%$ phosphoric acid solution and contaminating with saliva for 30seconds and then washing for 0,5,20 and 30seconds and re-etching for 10seconds. After 24hours passed in the $37^{\circ}C$ water bath, the shear bond strengths were measured on Universal Test Machine. The data were evaluated and tested by ANOVA and Duncan's multiple range test, and those results were as follows. 1. There was no significant differences between (p>0.05) shear bond strength of bonded brackets with 5, 10, 20seconds washing etched enamel using $37{\%}w/w{\%}$ phosphoric acid solution. 2. The shear bond strength of bonded brackets with $20w/w\%$ phosphoric acid and then washing for 5seconds showed bonded strength durable to occlusal force but its coefficiency score was high and etched surface was not cleaned completely and therefore it was assumed that its clinical application is not applicable. 3. There was no significant differences between (p>0.05) shear bond strengths of bonded brckets with washing for 5seconds etched enamel using $37w/w\%$ phosphoric acid solution and 10,20 seconds washing etched enamel using $20w/w\%$ phosphoric acid solution. 4. The shear bond strength of washing for 5seconds etched enamel which was contaminated with saliva showed sufficient bonded strength durable to occlusal force but its coefficiency score was high and therefore its clinical application was not applicable. 5. After etching, the sample contaminated with saliva showed the sufficient shear bond strength even washing 20seconds without re-etching.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.303.2-303.2
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• 2016

현재 플라즈마를 이용한 기술은 반도체, 태양광 발전, 디스플레이 등 산업의 전반적인 분야에서 특히 반도체 공정을 이용한 산업에서는 핵심적인 기술이다. 반도체 공정 중에서 박막 증착과 식각 분야에서 플라즈마를 사용한 기술은 매우 높은 가치를 지니고 있다. 중요한 플라즈마 연구로는 이론적 접근을 통한 플라즈마 소스 개발과, 기 개발된 플라즈마 소스를 적용하여 반도체 공정에 적용함으로써 최적의 조건을 찾아내며, 그에 대한 메커니즘을 연구하는 분야로 크게 분리할 수 있다. 따라서 이러한 플라즈마 기술이 발달함에 따라 nano-scale의 연구 또한 상당히 중요한 부분으로 자리 잡고 있다. 본 실험에서는 RF magnetron sputter를 사용하고 질소 유량을 0.5 sccm으로 고정하여 AlN 박막을 증착하였다. 이후 상압 플라즈마를 이용하여 식각을 진행하였다. AlN 박막 전체 표면에 대하여 3초 및 6초간 식각을 진행하였다. 이후 Nano-Indenter를 사용하여 $100{\sim}7000{\mu}N$까지 힘을 증가시키며 측정하였다. 3초간 식각을 진행한 시료의 경우 압입 깊이 대비 Hardness 그래프에서 약 40 ~ 100 nm 까지 약 2.5 GPa 정도의 차이가 발생하였고 6초간 식각을 진행한 시료의 경우 압입 깊이 대비 Hardness의 그래프에서 약 40 ~ 130 nm 까지 약 1 GPa 정도의 차이가 발생함을 확인하였다. 이후 WET-SPM 장비를 사용하여 AFM 모드를 이용하여 박막 표면이 거칠기를 확인하였다. 플라즈마 식각공정을 거치지 않은 시료의 경우 박막의 거칠기는 7.77 nm로 측정되었고 3초간 플라즈마 식각공정을 거친 시료의 경우 6.53 nm, 6초간 플라즈마 식각공정을 거친 시료의 경우 8.45 nm로 나타남을 확인할 수 있었다. 이와 같은 결과들로부터 플라즈마 식각공정은 박막의 표면에도 영향을 미치지만 박막 내부 일정 부분까지 영향을 받는 것을 확인하였다.

• Journal of the korean academy of Pediatric Dentistry
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• v.28 no.2
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• pp.199-206
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• 2001

The purpose of study was to compare the plasma arc light with the halogen light in compostie resin curing. Three composite resin materials(Z-100, 3M, USA; Tetric Ceram, Vivadent, Liechtenstein; SureFil, Dentsply, USA) were filled in the teflon molds (4mm in diameter and 2, 3, 4, 5mm in thickness) and cured with either the conventional low-intensity light curing unit with a halogen lamp (Optilux 360, Demetron, U.S.A.) for duration of 40 seconds or with the high-intensity light curing unit with a plasma arc lamp (Flipo, Lokki, France) for duration of 3, 6, and 9 seconds. The intensity of halogen light was about $370mW/cm^2$ and that of plasma light was about $1,900mW/cm^2$. After one week, the surface hardnesses of both the top and the bottom of the resin samples were measured with a microhardness tester(MXT70, Matsuzawa, Japan). There were significant differences in the hardness between the top and the bottom of the resin samples except the 2mm thickness samples cured by halogen light for 40s or by plasma light for 9s. There was no significant difference between the hardness values of the top surfaces of the thickness groups. The hardness values of the bottom surfaces decreased as the curing time decreased and as the thickness of resin samples increased, and the three kinds of resin composites showed similar patterns. The results suggest that the halogen light for 40 seconds might be able to cure greater depth of resin composites than the plasma light for 3, 6, or 9 seconds.

• Journal of the korean academy of Pediatric Dentistry
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• v.28 no.3
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• pp.471-479
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• 2001

The purpose of this study was to compare the effect of the high intensity halogen light $(850\sim1000mW/cm^2)$ with that of the conventional halogen light $(400mW/cm^2)$ on the hardness of composite resin. Three resin composites (Z-100, 3M, U.S.A. : Tetric Ceram, Vivadent, Liechtenstein; SureFil, Dentsply, U.S.A.) were filed in the stainless steel moulds which were 4mm in diameter and 2, 3, 4, and 5mm in depth, respectively. They were cured under the four different modes : (1) conventional mode, 40 seconds at $400mW/cm^2$; (2) 'ramp' mode, 10 seconds at 100 to $1000mW/cm^2$ plus 10 seconds at $1000mW/cm^2$; (3) 'boost' mode, 10 seconds at $1000mW/cm^2$; and (4) 'standard' mode, 20 seconds at $850mW/cm^2$. The surface hardnesses of the top and the bottom of the resin samples were measured with a microhardness tester (MXT70, Matsuzawa, Japan). The top surface hardness was not significantly different among the curing modes. The bottom surface hardness was generally the highest in the conventional mode and the lowest in the high intensity boost mode. There was no significant difference in the bottom surface hardness between the conventional mode and the high intensity standard mode in 2mm depth. The results suggest that the curing time of the high intensity halogen light $(850mW/cm^2)$ should be at least 20 seconds to produce the equal level of the bottom surface hardness of 2mm resin composite as compared to the hardness produced by the conventional halogen light $(400mW/cm^2)$.

• Restorative Dentistry and Endodontics
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• v.27 no.2
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• pp.158-174
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• 2002

The aim of this study was to investigate the effect of light irradiation modes on polymerization shrinkage, degree of cure and microleakage of a composite resin. VIP$^{TM}$ (Bisco Dental Products, Schaumburg, IL, USA) and Optilux 501$^{TM}$ (Demetron/Kerr, Danbury, CT, USA) were used for curing Filtek$^{TM}$ Z-250 (3M Dental Products, St. Paul., MN, USA) composite resin using following irradiation modes: VIP$^{TM}$ (Bisco) 200mW/$\textrm{cm}^2$ (V2), 400mW/$\textrm{cm}^2$ (V4), 600mW/$\textrm{cm}^2$ (V6), Pulse-delay (200 mW/$\textrm{cm}^2$ 3 seconds, 5 minutes wait, 600mW/$\textrm{cm}^2$ 30seconds, VPD) and Optilux 501$^{TM}$ (Demetron/Kerr) C-mode (OC), R-mode (OR). Linear polymerization shrinkage of the composite specimens were measured using Linometer (R&B, Daejeon, Korea) for 90 seconds for V2, V4, V6, OC, OR groups and for up to 363 seconds for VPD group (n=10, each). Degree of conversion was measured using FTIR spectrometer (IFS 120 HR, Bruker Karlsruhe, Germany) at the bottom surface of 2 mm thick composite specimens V2, Y4, V6, OC groups were measured separately at five irradiation times (5, 10, 20, 40, 60 seconds) and OR, VPD groups were measured in the above mentioned irradiation modes (n=5 each). Microhardness was measured using Digital microhardness tester (FM7, Future-Tech Co., Tokyo, Japan) at the top and bottom surfaces of 2mm thick composite specimens after exposure to the same irradiation modes as the test of degree of conversion(n=3, each). For the microleakage test, class V cavities were prepared on the distal surface of the ninety extracted human third molars. The cavities were restored with one of the following irradiation modes : V2/60 seconds, V4/40 seconds, V6/30 seconds, VPD , OC and OR. Microleakage was assessed by dye penetration along enamel and dentin margins of cavities. Mean polymerization shrinkage, mean degree of conversion and mean microhardness values for all groups at each time were analyzed using one-way ANOVA and Duncan's multiple range test, and using chi-square test far microleakage values. The results were as follows : . Polymerization shrinkage was increased with higher light intensity in groups using VIP$^{TM}$ (Bisco) : the highest with 600mW/$\textrm{cm}^2$, followed by Pulse-delay, 400mW/$\textrm{cm}^2$ and 200mW/$\textrm{cm}^2$ groups, The degree of polymerization shrinkage was higher with Continuous mode than with Ramp mode in groups using Optilux 501$^{TM}$ (Demetron/Kerr). . Degree of conversion and microhardness values were higher with higher light intensity. The final degree of conversion was in the range of 44.7 to 54.98% and the final microhardness value in the range of 34.10 to 56.30. . Microleakage was greater in dentin margin than in enamel margin. Higher light intensity showed more microleakage in dentin margin in groups using VIP$^{TM}$ (Bisco). The microleakage was the lowest with Continuous mode in enamel margin and with Ramp mode in dentin margin when Optilux 501$^{TM}$ (Demetron/Kerr) was used.

• Journal of the Korean Society of Food Science and Nutrition
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• v.39 no.5
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• pp.776-781
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• 2010

The properties and bactericidal activities of strongly acidic electrolyzed water (SEW) against food-borne pathogenic bacteria, vegetables and kitchen apparatuses were investigated. The available chlorine concentration, pH and oxidation reduction potential (ORP) of SEW were $35{\pm}1.2\;ppm$, $2.3{\pm}0.2$, and $1,140{\pm}20.4\;mV$, respectively. Five strains of food-borne bacteria with initial cell number of 7.00 log CFU/mL were not detected except Bacillus cereus after treatment with SEW for 60 sec. The numbers of Bacillus cereus were reduced to 2.08{\pm}1.00 log CFU/mL at the same condition. In vegetables, SEW treatment after washing strongly in alkalic electrolyzed water (AEW) showed better bactericidal effects than SEW only. The viable cell on stainless steel bowl ($3.86{\pm}2.49\;\log\;CFU/100\;cm^2$) and cup for water ($2.40{\pm}1.80\;\log\;CFU/100\;cm^2$) were not detected by SEW treatment (35 ppm of available chlorine concentration) for 30 sec, but survival of more than 1.00 log CFU/$100\;cm^2$ of viable cell was shown by washing of sodium hypochlorite solution at the same condition. On the other hand, the coliform group bacteria ($5.08{\pm}4.00\;CFU/100\;cm^2$) were detected on rubber globe only, and more than 2.00 log CFU/$100\;cm^2$ of viable cell and coliform group bacteria on it survived, though it was washed with flowing SEW for 30 sec.

• Journal of Information Management
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• v.17 no.2
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• pp.63-85
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• 1984

• Korean Journal of Heritage: History & Science
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• v.7
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• pp.1-13
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• 1973

• The Korean Journal of Zoology
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• v.6 no.1
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• pp.9-14
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• 1963

S.M.계인 마우스♂♀를 정상군과 4개의 실험군 즉 양성가속도(5G-50초간과 11G-50초간 매일 각각 폭로) 및 전격(5volt-2초간과 10 volt 2 초간 매일 각각 전격)군으로 나누어 최소한 22일간 순화시킨 후 여지 전지영동법에 의해서 Albumin/Globulin 바와 단백질분할을 측정하고 또한 혈청 전단백질, 혈색소량, Hematocrit 비, 적혈구포약성 및 간, 신장의 중량을 측정하였다. A/G 와 전단백질은 양성가속도의 G-force 증가와 전격적 증가의 각군이 정확군보다 유의하게 현저히 낮은 치를 나타내고 있다. 간장중량, 혈색소량 및 Hematocrit 비는 또한 정상군보다 양성가속도, 전격적 각 조건하에서 낮은 치를 나타내고 있다. 그러나 신장중량은 현저히 증가된 치를 나타낸다. 양성가속도와 전격적조건군의 간장의 조직학적 소견은 혈관적 변화가 나타나고 그리고 양성가속도에서는 또한 액포가 출현하였다. 적혈구 포약성은 거의 변화가 없었다. 이상의 결과로 미루어보아 상기 두 효과로 인해서 주로 간장기능 즉 단백질대사에 이상을 초래하는 것으로 생각된다.

• Electrical & Electronic Materials
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• v.4 no.4
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• pp.304-311
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• 1991

본 연구에서는 p형(100) 실리콘 기판 위에 LPCVD법으로 산화막과 다결정 실리콘을 증착하고 그 위에 Magnetron Sputtering법으로 티타늄을 500.angs.을 증착한 후, 열처리 온도 500-900.deg.C 사이에서 열처리 시간을 변화시키면서 N$_{2}$ 분위기 속에서 급속 열처리하여 티타늄 실리사이드를 형성하고 그 특성을 조사하였다. 500-600.deg.C 온도 범위에서 10초간 열처리한 시료에서는 실리사이드상은 나타나지 않고, 산소등의 불순물이 티타늄 박막 내로 확산되어 600.deg.C에서 면 저항이 최대값을 보였으며 열처리 온도는 675-750.deg.C로 높이자 TiSi상이 나타나면서 면저항이 감소되고 결정립의 크기가 크게 증가하였다. 또한 열처리온도 800.deg.C에서 나타나기 시작한 TiSi$_{2}$상은 열처리 온도 850.deg.C까지 TiSi상과 공존하면서 면저항과 reflectance는 계속 감소했다. 900.deg.C에서 10초간 열처리한 시료에서는 orthorhombic구조의 완전한 실리사이드 상만 나타났다. 최종적인 티타늄 실리사이드 박막의 두께는 1200.angs.이며 비저항은 18.mu..OMEGA.cm였다.