• Korean journal of food and cookery science
• /
• v.19 no.1
• /
• pp.83-95
• /
• 2003

Investigations were conducted on the changes in carotenoids content, and quantification of cis-trans-${\beta}$-carotene Isomers in pureed and cooked carrot and spinach during storage. The isomerization and degradation of carotenoids were monitored by high-performance liquid chromatography on a C$\_$30/ reversed-phase column with diode-array detection. The results showed that lutein, ail-trans-${\beta}$-carotene, ${\alpha}$-carotene, 9-cis-${\beta}$-carotene and 13-cis-${\beta}$-carotene were present in carrot and spinach. Zeaxanthin and cryptoxanthin were present in raw spinach. The contents of lutein, zeaxanthin, cryptoxanthin, ${\alpha}$-carotene and all-trans-${\beta}$-carotene in pureed and cooked carrot and spinach decreased with increasing storage period. The 9-cis and 13-cis carotenoid isomers were the major types formed in cooked carrot during storage. Cooking was not found to alter the carotenoid profile of the sample, but increased the total amount of carotenoids compared with pured ones. This increase could be explained that cooking itself increased the extraction efficiency and inactivated the enzymes degradating carotenoids.

• Journal of the Korean institute of surface engineering
• /
• v.44 no.4
• /
• pp.149-154
• /
• 2011

Martensitic stainless steel STS 431 has been nitrided by active screen ion nitriding under the various temperature and time. The thickness of diffusion layer, case depth, hardness and composition phases were investigated using field emission scanning electron microscopy (FE-SEM), micro-Vickers hardness tester, X-ray diffraction (XRD) and glow discharge spectroscopy (GDS). It was observed that the thickness of diffusion layer depends strongly on the treatment temperature and time. A sample, which was nitrided at $450^{\circ}C$ for 8hours, was a maximum hardness of Hv0.01 1558 and nitride layer of $70{\mu}m$. As shown in XRD patterns, $\varepsilon(Fe_{2-3}N)$ and expanded martensite (${\alpha}_N$) phases which was saturated with nitrogen solid solution were in the nitrided layer treated at $450^{\circ}C$ for 2 hours. Composition phases of $\varepsilon$ $(Fe_{2-3}N)$ and ${\gamma}'$ ($Fe_4N$) were observed after active screen nitriding at $450^{\circ}C$ for 8 hours.

• Korean Journal of Materials Research
• /
• v.14 no.4
• /
• pp.265-269
• /
• 2004

Plasma nitrocarburising and post oxidation were performed on SCM435 steel by a pulsed plasma ion nitriding system. Plasma oxidation resulted in the formation of a very thin ferritic oxide layer 1-2 $\mu\textrm{m}$ thick on top of a 15～25 $\mu\textrm{m}$ $\varepsilon$-F $e_{2-3}$(N,C) nitrocarburized compound layer. The growth rate of oxide layer increased with the treatment temperature and time. However, the oxide layer was easily spalled from the compound layer either for both oxidation temperatures above $450^{\circ}C$, or for oxidation time more than 2 hrs at oxidation temperature $400^{\circ}C$. It was confirmed that the relative amount of $Fe_2$$O_3$, compared with $e_3$$O_4$, increased rapidly with the oxidation temperature. The amounts of ${\gamma}$'-$Fe_4$(N,C) and $\theta$-$Fe_3$C, generated from dissociation from $\varepsilon$-$Fe_{2-3}$ /(N,C) phase during $O_2$ plasma sputtering, were also increased with the oxidation temperature.e.

• Korean Journal of Materials Research
• /
• v.12 no.7
• /
• pp.568-572
• /
• 2002

Plasma sulfnitriding technology was employed to harden the surface of SKD61 steel. The plasma sulfnitriding was performed with 3 torr gas pressure at $580^{\circ}C$ for 20 hours. Plasma sulfnitriding resulted in the formation of very thin $2-3\mu\textrm{m}$ FeS sulfide layer on top of $15-20\mu\textrm{m}$ compound layer, which consisted of predominantly $\varepsilon$- $Fe{2-3}$ N and a second phase of $\Upsilon'-Fe_4$N. In comparision with plasma nitriding treatment, plasma sulfnitriding treatment showed better surface roughness and corrosion resistance due to the presence of the thin FeS layer. which coated microvoids and microcracks on top of the nitrided layer. It was also found that plasma sulfnitrided sample showed better wear resistance due to the presence of the thin FeS layer which acted as a solid lubricant.

• Design & Manufacturing
• /
• v.13 no.1
• /
• pp.13-18
• /
• 2019

The size and prospects of the domestic semiconductor equipment market are increasing every year. In the case of various parts used inside semiconductor equipments, high durability such as high strength and abrasion resistance is demanded. Particularly, the gases used in semiconductor production processes are toxic. In order to prevent such toxic gas leakage, a precision processing technique and a surface treatment technique for preventing corrosion are required. Electro-polishing is an electro-chemical method of polishing a metal surface to make it smooth and polished. Electro-polishing is mainly used in the finishing process of metal surface. Unlike mechanical polishing, electro-polishing is used in many fields, such as fine chemical etching equipment, since no damaged layer or burr, fine polishing groove and particles are generated. However, in order to withstand the gas used in the semiconductor equipment, the parts must have high corrosion resistance. However, the surface hardness generally become lowered through electro-polishing. Therefore, in this study, surface hardness were experimentally observed before and after electro-polishing. Then, a method of improving hardness by preparing a nitrided layer by plasma ion nitriding treatment.

• Korean Journal of Metals and Materials
• /
• v.48 no.3
• /
• pp.225-234
• /
• 2010

Salt bath nitriding, which has been developed recently by domestic company, is an emerging ecofriendly surface treatment. The salt bath nitriding is accompanied by the electrolysis process in the pretreatment step, and this whole processis called Pseudo-Electrolysised Salt bath Nitriding (PESN). The PESN creates only $NH_3$ and non-toxic salts without harmful $CN^{-}$ or toxic gas such as that found in previous salt bath nitriding. In general, ion nitriding and gas nitriding create high hardness and a strong brittle white layer on the surface. However, the PESN shows a thin white and gray layer. The PESN was applied to the defense material, 3%Cr-Mo-V steel, to study the surface characteristics at $480^{\circ}C$, $530^{\circ}C$, and $580^{\circ}C$ for 4 hrs, 20 hrs, 40 hrs, and 60 hrs of nitriding time condition. As a result, the best nitriding layer was found at $530^{\circ}C$ for 40 hrs. If we improve corrosion resistance and nitriding layer depth, the PESN will be able to be applied to the defense industry parts.

• Korean Journal of Materials Research
• /
• v.31 no.11
• /
• pp.635-641
• /
• 2021

Cr thin films with O added are deposited on sapphire substrate by DC sputtering and are nitrided in NH₃ atmosphere between 300 and 900 ℃ for various times. X-ray diffraction results show that nitridation begins at 500 ℃, forming CrN and Cr₂N. Cr oxides of Cr₂O₃ are formed at 600 ℃. And, at temperatures higher than 900 ℃, the intermediate materials of Cr₂N and Cr₂O₃ disappear and CrN is dominant. The atomic concentration ratios of Cr and O are 77% and 23%, respectively, over the entire thickness of as-deposited Cr thin film. In the sample nitrided at 600 ℃, a CrN layer in which O is substituted with N is formed from the surface to 90 nm, and the concentrations of Cr and N in the layer are 60% and 40%, respectively. For this reason, CrN and Cr₂N are distributed in the CrN region, where O is substituted with N by nitridation, and Cr oxynitrides are formed in the region below this. The nitridation process is controlled by inter-diffusion of O and N and the parabolic growth law, with activation energy of 0.69 eV.

• Korean Journal of Materials Research
• /
• v.33 no.7
• /
• pp.309-314
• /
• 2023

This study aimed to address the limitations of traditional plasma nitriding methods by implementing a short-term plasma oxy-nitriding treatment on the surface of AISI 420 martensitic stainless steel. This treatment involved the sequential formation of nitride and oxide layers, to enhance surface hardness and corrosion resistance, respectively. The process resulted in the formation of a 20 ㎛-thick nitride layer and a 3 ㎛-thick oxide layer on the steel surface. Initially, the hardness increased by 2.2 times after nitriding, followed by a subsequent decrease of approximately 31 % after oxidation. While the nitriding process reduced corrosion resistance, the subsequent oxidation process led to the formation of a passive oxide film, effectively resolving this issue. The pitting corrosion of the oxide passive film started at 82.6 mVssc, providing better corrosion resistance characteristics than the nitride layer. Consequently, the trade-off between surface hardness and corrosion resistance in plasma oxy-nitrided AISI 420 martensitic stainless steel is anticipated to be recognized as an innovative and comprehensive surface treatment process for biomedical components.

• Journal of the Society of Cosmetic Scientists of Korea
• /
• v.23 no.2
• /
• pp.118-151
• /
• 1997

Allergic contact dermatitis is a common skin disease resulting from specific immumologic sensitization to topically applied various allergen. Purpose of this study was to investigate skin morphologic chganges by light microscopic, changes of protein band by SDS-PAGE in the skin treated on the surfactant. Furthermore, lectin histochemistry is used to know the chagnges of the terminal sugar of the glycoconjugate in the skin treated on the surfactant. The results were as follows : The 1 day of treated group was indicated the enlargement of capillary, the 3 days of treated group was showed that the cytoplasm was eosinophlic by the pyknotic of nucleus. The 6 days of treated group was observed hyperkeratinoid, increased of inflammation cells to epithelium. The 9 days of treated group was appeares that serum crust was sheded and formed a acanthosis. But dermis layer was cytoplasmic vaculation and enlargement of intercellular space. The 12 days treated group made up new epidermis layer of seven layer and of observed an decreased in quantity of inflammation cells. The mast cell of degranulated type was increased in treated surfactnat. It was secreating granules hold histamin, serotonin and heparin. Accordingly, protein band of electrophortic phase was observed a sudden changes since 3 days treated group. At observeation of the cell-surface glycoconjugates, LCA, PNA, SBA and WGA lectin positive cells but inducated lectin negative cells in Con-A. Furthermore, PNA and SBA showed stroger positive reaction as treated surfactant group.

• Journal of the Korean Vacuum Society
• /
• v.19 no.1
• /
• pp.10-13
• /
• 2010

We studied the effect of $O_2$ plasma treatments on the electrical property of Ti / Al ohmic contacts to N-face n-type GaN. The surface of N-face, n-type GaN has been treated with $O_2$ plasma for 120 s before the deposition of bilayered electrodes, Ti (50 nm) / Al (35 nm), and its contact resistance was compared with that of the reference sample without $O_2$ plasma. As a result, we found that the ohmic contact was reduced from $4.3\;{\times}\;10^{-1}\;{\Omega}cm^2$ to $1.25\;{\times}\;10^{-3}\;{\Omega}cm^2$ by applying $O_2$ plasma on the surface of n-type GaN, which was attributed to the reduction in the Schottky barrier height (SBH), caused by nitrogen vacancies formed during the $O_2$ plasma process.