• Title/Summary/Keyword: 전계 효과 트랜지스터

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Optimization for Higher Sensitive Measurements of FET-type Sensors (FET센서 감도 향상 측정을 위한 최적화)

  • Sohn, Young-Soo
    • Applied Chemistry for Engineering
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    • v.26 no.1
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    • pp.116-119
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    • 2015
  • Field-effect transistor (FET)-based ion or biosensors have been intensively studied so far. Among many measurement methods, the variation of the drain current can be induced when ions or biomolecules are interacted with sensing membranes located on the gate insulator of FET. One of typical FET-type sensors is an ion-sensitive field-effect transistor (ISFET) utilized in this study. In ISFET, the voltage is usually applied to the reference electrode instead of the gate voltage. Firstly, the voltage applied to the reference electrode versus the drain current was observed, and the steepest slope in this graph was found. Using this point, the optimized condition was established for the larger variation of the drain current in the saturated region in response to the variation of the input in the dynamic range.

The Change of I-V Characteristics by Gate Voltage Stress on Few Atomic Layered MoS2 Field Effect Transistors (수 원자층 두께의 MoS2 채널을 가진 전계효과 트랜지스터의 게이트 전압 스트레스에 의한 I-V 특성 변화)

  • Lee, Hyung Gyoo;Lee, Gisung
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.3
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    • pp.135-140
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    • 2018
  • Atomically thin $MoS_2$ single crystals have a two-dimensional structure and exhibit semiconductor properties, and have therefore recently been utilized in electronic devices and circuits. In this study, we have fabricated a field effect transistor (FET), using a CVD-grown, 3 nm-thin, $MoS_2$ single-crystal as a transistor channel after transfer onto a $SiO_2/Si$ substrate. The $MoS_2$ FETs displayed n-channel characteristics with an electron mobility of $0.05cm^2/V-sec$, and a current on/off ratio of $I_{ON}/I_{OFF}{\simeq}5{\times}10^4$. Application of bottom-gate voltage stresses, however, increased the interface charges on $MoS_2/SiO_2$, incurred the threshold voltage change, and degraded the device performance in further measurements. Exposure of the channel to UV radiation further degraded the device properties.

Electrical Properties of CuPC FET with Varying Substrate Temperature (CuPC PET의 기판온도에 따른 전기적 특성 연구)

  • Lee, Ho-Shik;Cheon, Min-Woo;Park, Yong-Pil
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.13 no.1
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    • pp.110-114
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    • 2009
  • Organic field-effect transistors (OFETs) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with different substrate temperature. The CuPc FET device was made a top-contact type and the substrate temperature was room temperature and $150^{\circ}C$. The CuPc thickness was 40nm, and the channel length was $50{\mu}m$, channel width was 3mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET.

Fabrication and Electrical Properties of CuPc FET with Different Substrate Temperature (CuPc FET의 기판온도에 따른 제작 및 전기적 특성 연구)

  • Lee, Ho-Shik;Yang, Seong-Ho;Park, Yong-Pil
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2007.06a
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    • pp.548-551
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    • 2007
  • Organic field-effect transistors (OFETs) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with different substrate temperature. The CuPc FET device was made a top-contact type and the substrate temperature was room temperature and $150^{\circ}C$. The CuPc thickness was 40nm, and the channel length was $50{\mu}m$, channel width was 3mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET.

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Low-Voltage Operating N-type Organic Field-Effect Transistors by Charge Injection Engineering of Polymer Semiconductors and Bi-Layered Gate Dielectrics (N형 고분자 반도체의 전하주입 특성 향상을 통한 저전압 유기전계효과트랜지스터 특성 연구)

  • Moon, Ji-Hoon;Baeg, Kang-Jun
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.10
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    • pp.665-671
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    • 2017
  • Herein, we report the fabrication of low-voltage N-type organic field-effect transistors by using high capacitance fluorinated polymer gate dielectrics such as P(VDF-TrFE), P(VDF-TrFE-CTFE), and P(VDF-TrFE-CFE). Electron-withdrawing functional groups in PVDF-based polymers typically cause the depletion of negative charge carriers and a high contact resistance in N-channel organic semiconductors. Therefore, we incorporated intermediate layers of a low-k polymerto prevent the formation of a direct interface between PVDF-based gate insulators and the semiconducting active layer. Consequently, electron depletion is inhibited, and the high charge resistance between the semiconductor and source/drain electrodes is remarkably improved by the in corporation of solution-processed charge injection layers.

Nanopiezotronics Technology (Nanopiezotronics 기술)

  • Lee, S.J.;You, I.K.;Chu, H.Y.
    • Electronics and Telecommunications Trends
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    • v.27 no.1
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    • pp.1-18
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    • 2012
  • 미래 사회는 나노기술(NT)을 바탕으로 IT-ET-BT 기술이 융합된 유비쿼터스 사회로 진화하고 있으며, 미래 산업 사회로의 전환을 위해서는 성능개선이 아닌 성능한계 돌파의 패러다임 전환이 가능한 임계성능의 나노 소재/신소자의 개발이 절실히 요구되고 있다. 또한 차세대 단말기는 휴대성의 편리함, 융복합화/다기능화, 인간 친화형이 요구되고, flexible/stretchable/bendable한 형태로 발전하고 있는 상황이다. 나노 피에조트로닉스(nanopiezotronics) 기술은 역학적 에너지를 전기적 에너지로 변환하는 나노 발전 소자(nanogenerator)의 원리를 기반으로 하며 나노선, 나노벨트와 같은 1차원적 나노구조 소재의 압전성과 반전도성이 결합된 특성을 이용한 신기능의 미래 IT 융합 나노 전자/에너지 소자를 구현하는 기술로서 미래 유망 기술로 부각되고 있다. 현재 기술 수준은 압전 전계 효과 트랜지스터, 압전-다이오드, 압전 센서, 압전 나노 발전 소자 등과 같은 prototype 소자를 제작하는 수준에 머무르고 있으나 향후 초고감도 압전 센서, 자가발전 MEMS/NEMS 및 나노 시스템, 스마트 웨어러블 시스템, 건강 모니터링 시스템, 인체 삽입형 소자, portable 및 투명 유연 전자소자 등의 다양한 미래 융합 나노 소자 및 시스템에 광범위한 활용이 가능하며, 향후 신기능의 소자/부품/시스템 창출을 위한 기술로 자리매김할 것으로 전망된다. 본고에서는 압전 나노선, 나노튜브, 나노섬유 등의 1차원적 나노구조체 기반의 nanopiezotronics 기술과 최근의 연구결과들을 소개한다.

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Electrical Properties of CuPc-OFET with Metal Electrode (금속 전극에 따른 CuPc-OFET 의 전기적 특성)

  • Lee, Ho-Shik;Park, Yong-Pil
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2007.10a
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    • pp.751-753
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    • 2007
  • Organic field-effect transistors (OFETs) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with different metal electrode. The CuPc FET device was made a top-contact type and the substrate temperature was room temperature. The source and drain electrodes were used an Au and Al materials. The CuPc thickness was 40nm. and the channel length was $50{\mu}m$, channel width was 3mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET with different electrode materials.

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Field Effect Transistors for Biomedical Application (전계효과트랜지스터의 생명공학 응용)

  • Sohn, Young-Soo
    • Applied Chemistry for Engineering
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    • v.24 no.1
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    • pp.1-9
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    • 2013
  • As the medical paradigm is changing from disease treatment to disease prevention and an early diagonosis, the demand to develop techniques for the detection of minute concentrations of biomolecules is increasing. Among the various techniques to sense the minute concentration of biomolecules, the biosensors utilizing the matured semiconductor techniques are presented here. To understand such biosensors, the structure and working principle of a MOSFET (Metal-oxide-semiconductor field-effect transistor) which is the basic semiconductor device is firstly introduced, and then the ISFET (Ion sensitive FET), BioFET (Biologically modified FET), Nanowire FET, and IFET (Ionic FET) are introduced, and their applications to biomedical fields are discussed.

Fabrication and Properties of MFSFET′s Using $BaMgF_4$/Si Structures for Non-volatile Memory ($BaMgF_4$/Si 구조를 이용한 비휘발성 메모리용 MFSFET의 제작 및 특성)

  • 이상우;김광호
    • Electrical & Electronic Materials
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    • v.10 no.10
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    • pp.1029-1033
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    • 1997
  • A prototype MFSFET using ferroelectric fluoride BaMgF$_4$as a gate insulator has been successfully fabricated with the help of 2 sheets of metal mask. The fluoride film was deposited in an ultrai-high vacuum system at a substrate temperature of below 30$0^{\circ}C$ and an in-situ post-deposition annealing was conducted for 20 seconds at $650^{\circ}C$ in the same chamber. The interface state density of the BaMgF$_4$/Si(100) interface calculated by a MFS capacitor fabricated on the same wafer was about 8$\times$10$^{10}$ /cm$^2$.eV. The I$_{D}$-V$_{G}$ characteristics of the MFSFET show a hysteresis loop due to the ferroelectric nature of the BaMgF$_4$film. It is also demonstrated that the I$_{D}$ can be controlled by the “write” plus which was applied before the measurements even at the same “read”gate voltage.ltage.

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Selective Elimination of Metallic Single-walled Carbon Nanotubes via Microwave Irradiation

  • Kim, Seong-Hwan;Kim, Yu-Seok;Song, U-Seok;Park, Jong-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.492-492
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    • 2011
  • 단일벽 탄소나노튜브(Single-Walled Carbon Nanotubes, SWCNTs)는 매우 우수한 전기적, 광전자적 특성을 가지고 있어 차세대 나노 전자소자 물질로 각광받고 있다. 특히, 이들의 전기적 특성은 직경과 카이랄리티(chirality)에 따라 금속성(metallic)과 반도체성(semiconducting)으로 구분된다. 각 특성에 따라 금속성은 투명전극, 반도체성은 전계효과 트랜지스터(CNT-FET)로 활용가능성이 높다. 하지만, 일반적으로 단일벽 탄소나노튜브는 이 두 가지의 특성이 혼재되어 합성되기 때문에, 그들의 선택적 분리는 나노튜브 기반 전자소자 응용을 위해 매우 중요한 과정 중 하나이다. 최근에는 반응 가스를 이용한 선택적 제거, 밀도차를 이용한 원심분리법(density gradient ultracentrifugation) 등 다양한 방법들이 보고된 바 있다. 본 연구는 대기 중에서 마이크로웨이브 조사하여 금속성 나노튜브만을 선택적으로 제거하였다. 마이크로웨이브 조사는 CVD 방법과 전기 방전법으로 성장된 단일벽 탄소나노튜브에 800W로 조사 시간을 변화하며 수행하였다. 실험 결과, 조사 시간이 증가할수록 두 종류의 나노튜브에서 반도체성 나노튜브는 남아있는 반면 금속성 나노튜브는 점차 제거되었다. 이러한 원인은 각 전기적 특성에 따른 유전상수 차이에 의하여 기인한 것이다. 전기적 특성과 결정성은 라만 분광법(Raman spectroscopy)을 통하여 분석하였으며, 직경 및 분산정도는 주사전자현미경(scanning electron microscope), 투과전자현미경(tunneling electron microscope)으로 관찰하였다.

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