• Journal of Korean Society of Environmental Engineers
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• v.36 no.8
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• pp.534-541
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• 2014

This study investigated a method to determine an efficient operating condition for the $UV/H_2O_2$ process. The OH radical scavenging factor is the most important factor to predict the removal efficiency of the target compound and determine the operating condition of the $UV/H_2O_2$ process. To rapidly and simply measure the scavenging factor, Rhodamine B (RhB) was selected as a probe compound. Its reliability was verified by comparing it with a typical probe compound (para-chlorobenzoic acid, pCBA); the difference between RhB and pCBA was only 1.1%. In a prediction test for the removal of Ibuprofen, the RhB method also shows a high reliability with an error rate of about 5% between the experimental result and the model prediction using the measured scavenging factor. In the monitoring result, the scavenging factor in the influent water of the $UV/H_2O_2$ pilot plant was changed up to 200% for about 8 months, suggesting that the required UV dose could be increased about 1.7 times to achieve 90% caffeine removal. These results show the importance of the scavenging factor measurement in the $UV/H_2O_2$ process, and the operating condition could simply be determined from the scavenging factor, absorbance, and information pertaining to the target compound.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.29 no.3
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• pp.123-131
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• 2019

In this study, the development of transparent UV blocking material using $TiO_{2-x}$ oxide thin film process was developed. A process technology is related to a process technology for making a sample with ultraviolet-shielding property of visible light transmittance of 78 % or more (total light transmittance at 550 nm) and of a UV cut-off characteristic of more than 95 % at 315 nm in ultraviolet wavelength band. In this study, it is possible to establish a flexible device process condition of high performance ultraviolet (UV) shielding thin film, to design mixed type of transparent flexible device with heterogeneous characteristics and to formulate composite deposition technology, according to various market demands. Establishment of actual roll-to-roll continuous process and equipment and process technology will affect related industries greatly.

• Proceedings of the Korea Water Resources Association Conference
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• 2011.05a
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• pp.137-137
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• 2011

급격한 세계인구의 증가에 의해 물 부족지역이 세계 각지로 확산되고 있다. 이에 따라, 건전한 수자원으로써 하수처리수의 재이용이 주목을 받고 있다. 하수처리수의 재이용시에는 특히, 재이용수의 미생물학적 안전성과 더불어 화학물질 등으로부터 기인할 수 있는 인체 및 생태계에의 리스크를 고려해야 한다. 미국 EPA는 병원성 미생물 뿐만 아니라 화학물질에 대한 안전성을 확보 차원에자외선/과산화수소 등의 고도산화처리법을 검토하였다. 1일 $10m^3$ 처리규모의 연속실험장치를 이용, 검토된 공정별 실제 하수 2차 처리수중에 존재하는 의약품류의 제거효과, 에너지 소비량 및 생태리스크 저감효과 등을 비교, 평가하였다. 에너지 소비량에 있어서는 공정별로 다소 차이가 있었으나, 본 실험동안 검출된 38종의 의약품류 제거에는 각 공정 모두 매우 효과적이었다. 에너지 소비측면에서는 오존 단독공정이 가장 적은 에너지 소비량에서 타 공정과 동일한 수준의 의약품류 서 막처리나 자외선 처리 등의 고도처리시설에 대한 정보를 재이용수 가이드라인에 제시하고 있는 반면, 우리나라에서는 재이용수중에 일정농도 이상의 염소가 잔류하도록 함으로써, 재이용수의 미생물학적 안전성 확보만을 고려하고 있다. 최근, 수환경분야에서는 의약품류라는 화학물질이 유럽, 미국 및 일본 등지를 중심으로 주목을 받아오고 있으며, 이들은 ng/L-${\mu}g$/L 수준으로 수환경중에서 검출되고 있다. 이들의 주요 발생원으로 하수처리시설이 지목되고 있으며, 따라서 하수처리수의 재이용시 잔류 의약품류에 의한 리스크 발생 가능성이 우려되고 있다. 이를 배경으로, 하수처리시설에서 의약품류를 효과적으로 제거할 수 있는 공정으로 오존 및 오존/자외선, 제거효과가 얻어졌다. 한편, 오존처리시 발암성 물질인 브로메이트($BrO_3^-$) 등과 같은 부생성물 생성 가능성을 고려하면, 오존 단독공정보다 상대적으로 많은 에너지를 소비하는 오존/자외선, 자외선/과산화수소 등의 고도산화처리법이 높은 적용성을 갖는 것으로 나타났다. 향후, 수자원 부족문제로 재이용수의 용도가 훨씬 다양해 질 것으로 예상된다. 그에 따라, 재이용수의 안전성 확보를 위해 보다 폭넓은 검토가 예상되지만, 현 단계에서는 오존을 포함, 다소 많은 에너지 소비가 예상되는 자외선을 이용한 고도산화처리법이 다양한 미량 화학물질의 제거에 유효한 공정으로 판단된다.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.40 no.8
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• pp.731-736
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• 2016

Three-dimensional (3D) high-aspect-ratio (HAR) microstructures for biomedical applications (e.g., microneedle, microadhesive, etc.) are microfabricated using the hybrid ultraviolet (UV) lithography in which inclined, rotational, and reverse-side UV exposure processes are combined together. The inclined and rotational UV exposure processes are intended to fabricate tapered axisymmetric HAR microstructures; the reverse-side UV exposure process is designed to sharpen the end tip of the microstructures by suppressing the UV reflection on a bottom substrate which is inevitable in conventional UV lithography. Hybrid UV lithography involves fabricating 3D HAR microstructures with an epoxy-based negative photoresist, SU-8, using our customized UV exposure system. The effects of hybrid UV lithography parameters on the geometry of the 3D HAR microstructures (aspect ratio, radius of curvature of the end tip, etc.) are measured. The dependence of the end-tip shape on SU-8 soft-baking condition is also discussed.

• Journal of Korean Society of Environmental Engineers
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• v.37 no.1
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• pp.34-44
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• 2015

This study was initiated to remove free cyanide from wastewater using the process of photocatalytic oxidation. UV lamp has been extensively used as a light source in conventional photocatalytic oxidation, but numerous drawbacks of UV lamp have been raised so far. Thus, this study focused on evaluating the applicability of UV LED as an alternative light source to overcome the drawbacks of UV lamp. Furthermore, the effects of diverse operational parameters on the performance of process were investigated. The results demonstrated the applicability of UV LED as a substitute of UV lamp. Also, the results show that the performance of process was improved by the increase in the number of UV LEDs used. To acquire economic feasibility as well as high efficacy, however, it is required to determine the optimum number of UV LED prior to practical implementation of the process. Among the three types of photocatalysts (anatase, rutile, and Degussa P25) tested, the Degussa P25 showed the greatest performance, and it was proven that the process was not improved as much as the Degussa P25 through simple mixing of anatase and rutile without any pretreatment. In addition, the removal efficiency of free cyanide appeared to be increased with the decrease in the particle size of $TiO_2$ photocatalyst. Besides, the process was enhanced with injection of oxygen which is considered as a major electron acceptor in the photocatalytic oxidation.

• Proceedings of the Korea Air Pollution Research Association Conference
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• 1999.10a
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• pp.459-460
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• 1999

자외선을 이용한 분자의 광분해반응은 석유화학, 고분자합성 및 신물질 개발 등의 화학공정분야에 널리 이용되고 있으나, 기존의 환경오염물질을 처리하는 기술에 대한 응용은 아직 미역하다. 한편 전자빔이나 플라즈마를 이용한 환경오염물질의 처리방법에 대한 연구는 여러 연구기관들을 통하여 꾸준히 연구, 발표되고 있으나, 아직까지는 이러한 기술을 산업현장에 적용하기에는 실제적인 어려움과 실제 공정에 적용시 외국 기술에 비해 상대적으로 많은 비용으로 인하여 어려움을 겪고 있다.(중략)

• Journal of Korean Society of Environmental Engineers
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• v.36 no.11
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• pp.739-746
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• 2014

In this study, The effects of empty bed contact time (EBCT) and water temperature on the biodegradation of 8 UV filters in biological activated carbon (BAC) process were investigated. Experiments were conducted at two water temperatures (7 and $18^{\circ}C$) and three EBCTs (5, 10 and 15 min). Increasing EBCT and water temperature increased the biodegradation efficiency of UV filters in BAC column. EHMC and BZC were the highest biodegradation efficiency, but BP and 4-MBC were the lowest. The kinetic analysis suggested a first-order reaction model for biodegradation of 8 UV filters at various water temperatures and EBCTs. The first-order biodegradation rate constants ($k_{bio}$) of 8 UV filters ranging from $0.2730{\sim}0.6365min^{-1}$ at $7^{\circ}C$ to $0.4824{\sim}0.8743min^{-1}$ at $18^{\circ}C$. By increasing the water temperature from $7^{\circ}C$ to $18^{\circ}C$, the biodegradation rate constants ($k_{bio}$) were increased 1.5~2.1 times.

• Applied Chemistry for Engineering
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• v.19 no.2
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• pp.236-241
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• 2008

The possibility of silicon oxidation through the aerial-diffusion of active oxygen species has been evaluated. The species originate from the surface of $TiO_2$ exposed by UV. Among process parameters such as UV intensity, substrate temperature and chamber pressure with oxygen, UV intensity was a major parameter to the influence on the oxide growth rate. When 1 kW high pressure Hg lamp was used as a UV source, the growth rate of silicon oxide was 8 times as faster as that of a 60 W BLB lamp. However, as the chamber pressure increased, the growth rate was declined due to the suppression of aerial diffusion of active oxygen species. According to the results, it could be confirmed that the aerial-diffusion of active oxygen species from UV-irradiated photocatalytic surface can be applied to a new method for preparing an ultra-thin silicon oxide at the range of relatively low temperature.

• Journal of the Korean Society for Precision Engineering
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• v.19 no.8
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• pp.16-25
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• 2002

• Journal of Korean Society of Environmental Engineers
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• v.39 no.1
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• pp.9-18
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• 2017

Arsenic (As) has been considered as the most toxic one among various hazardous materials and As contamination can be caused naturally and anthropogenically. Major forms of arsenic in groundwater are arsenite [(As(III)] and/or arsenate [(As(V)], depending on redox condition: arsenite and arsenate are predominant in reduced and oxidized environments, respectively. Because arsenite is much more toxic and mobile than arsenate, there have been a number of studies on the reduction of its toxicity through oxidation of As(III) to As(V). This study was initiated to develop photocatalytic oxidation process for treatment of groundwater contaminated with arsenite. The performance of two types of light sources (UV lamp and UV LED) was compared and the feasibility of goethite as a photocatalyst was evaluated. The highest removal efficiency of the process was achieved at a goethite dose of 0.05 g/L. Based on the comparison of oxidation efficiencies of arsenite between two light sources, the apparent performance of UV LED was inferior to that of UV lamp. However, when the results were appraised on the basis of their emitting UV irradiation, the higher performance was achieved by UV LED than by UV lamp. This study demonstrates that environmentally friendly process of goethite-catalytic photo-oxidation without any addition of foreign catalyst is feasible for the reduction of arsenite in groundwater containing naturally-occurring goethite. In addition, this study confirms that UV LED can be used in the photo-oxidation of arsenite as an alternative light source of UV lamp to remedy the drawbacks of UV lamp, such as long stabilization time, high electrical power consumption, short lifespan, and high heat output requiring large cooling facilities.