• 한국재료학회지
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• 제15권1호
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• pp.66-72
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• 2005

Surface modification of the silicon-coated graphite was carried out at $200^{\circ}C\~800^{\circ}C$ under hydrogen atmosphere. The silicon-coated graphites were prepared by fluidized-bed spray coating method. The components of silicon films prepared on the graphite consist of SiO, $SiO_x\;(1. The components of silicon films at $200^{\circ}C$ of heat treatment brought on the higher fraction of SiO and $SiO_x$ than that of $SiO_2$. However, inactive $SiO_2$ fraction increases with increase of the heat treatment temperature. The high content of SiO and $SiO_x$ in the silicon film on graphite leads to the higher discharge capacity in our experimental range.

• 한국응용과학기술학회지
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• 제25권2호
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• pp.130-136
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• 2008

$xTiO_2$-$ySiO_2$ system photocatalysts were developed by sol-gel method based on the change of production parameters, and their structure of crystallization and the specific surface area were measured. Considering the efficiency of the ethanol and phenol degradation using the catalyst, the conclusions were obtained as follows: By means of X-ray analysis of $xTiO_2$-$ySiO_2$ powder that is obtained from Titanium and Silicon alkoxide by sol-gel process, it is shown that crystal structure of anatase type is a dominating structure and, on the other hand, the structure of rutile also partly exists. The increase of $SiO_2$ contents causes the decrease of the degree of crystallization of the gel, whereas the specific surface area preferentially increases. It is shown that more than 90% of ethanol and phenol are degraded when reaction time is about three and an hours, and the maximum degradation rate of ethanol and phenol is shown in $60TiO_2$-$40SiO_2$ catalyst.

• 한국재료학회지
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• 제30권5호
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• pp.262-266
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• 2020

In this paper, we investigated the effect of the passivation stack with Al₂O₃, hydrogenated silicon nitride (SiN_x:H) stack and Al₂O₃, silicon oxynitride (SiON_x) stack in the n type bifacial solar cell on monocrystalline silicon. SiNx:H and SiON_x films were deposited by plasma enhanced chemical vapor deposition on the Al₂O₃ thin film deposited by thermal atomic layer deposition. We focus on passivation properties of the two stack structure after laser ablation process in order to improve bifaciality of the cell. Our results showed SiN_x:H with Al₂O₃ stack is 10 mV higher in implied open circuit voltage and 60 ㎲ higher in minority carrier lifetime than SiON_x with Al₂O₃ stack at Ni silicide formation temperature for 1.8% open area ratio. This can be explained by hydrogen passivation at the Al₂O₃/Si interface and Al₂O₃ layer of laser damaged area during annealing.

• 한국세라믹학회지
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• 제37권1호
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• pp.50-56
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• 2000

Precursor gels with the composition of xZrO2·(100-x)SiO2 systems (x=10, 20 and 30 mol%) were prepared by the sol-gel method. Kinetic parameters, such as activation energy, Avrami's exponent, n, and dimensionality crystal growth value, m, have been simultaneously calculated from the DTA data using Kissinger and Matusita equations. The crystallite size dependence of tetragonal to monoclinic transformation of ZrO2 was investigated using XRD, in relation to the fracture toughness. The crystallization of tetragonal ZrO2 occurred through 3-dimensional diffusiion controlled growth(n=m=2) and the activation energy for crystallization was calculated using Kissinger and Matusita equations, as about 310∼325±10kJ/mol. The growth of t-ZrO2, in proportion to the cube of radius, increased with increasing heating temperature and hteat-treatment time. It was suggested that the diffusion of Zr4+ ions by Ostwald ripening was rate-limiting process for thegrowth of t-ZrO2 crystallite size. The fracture toughness of xZrO2·(100-x)SiO2 systems glass ceramics increased with increasing crystallite size of t-ZrO2. The fracture toughness of 30ZrO2·70SiO2 system glass ceramics heated at 1,100℃ for 5h was 4.84 MPam1/2 at a critical crystaliite size of 40 nm.

• 청정기술
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• 제23권1호
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• pp.104-112
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• 2017

해조류로부터 수열 액화 반응을 통해 생성된 원료를 이용하여 수소가스를 생산하기 위해 개질 반응용 상용화 촉매와 $K_2Ti_xO_y$가 첨가된 니켈(Ni) 제조 촉매를 사용하여 반응온도에 따른 수증기 개질 반응을 수행하였다. 반응원료는 해조류 바이오매스를 503 K의 반응온도에서 2시간 동안 수열 액화를 통해 생성된 액화 원료를 사용하였으며, 상용화 촉매(FCR-4-02)와 제조 촉매($Ni/K_2Ti_xO_y-Al_2O_3$, $Ni/K_2Ti_xO_y-SiO_2$, $Ni/K_2Ti_xO_y-ZrO_2/CeO_2$, Ni/$K_2Ti_xO_y$-MgO) 및 반응온도에 따른 수증기 개질 반응의 활성을 비교 연구하였다. 실험결과 제조 촉매 4종 모두 상용화 촉매와 비교하여 반응활성이 높게 나타나는 것이 확인되었으며, 제조 촉매의 지지체에 따라 생성되는 가스의 조성이 달라지는 것이 확인되었다. 특히, 산성이나 염기성을 띄는 $Al_2O_3$와 MgO의 지지체와 중성을 띄는 $SiO_2$의 지지체에서는 CO가 선택적으로 높게 생성이 되었으며 환원성을 띄는 $CeO_2$를 포함하는 지지체에서는 수성가스 전환 반응이 일어나 $CO_2$가 높게 생성됨을 보였다.

• 한국표면공학회지
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• 제55권6호
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• pp.441-447
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• 2022

Silicon-based materials are one of the most promising anode active materials in lithium-ion battery. A carbon layer decorated on the surface of silicon particles efficiently suppresses the large volume expansion of silicon and improves electrical conductivity. Carbon coating through chemical vapor deposition (CVD) is one of the most effective strategies to synthesize carbon- coated silicon materials suitable for mass production. Herein, we synthesized carbon coated SiOx via pilot scale CVD reactor (P-SiO_x@C) and carbon coated SiO_x via industrial scale CVD reactor (I-SiO_x@C) to identify physical characteristic changes according to the CVD capacity. Reduced size silicon domains and local non-uniform carbon coating layer were detected in I-SiO_x@C due to non-uniform temperature distribution in the industrial scale CVD reactor with large capacity, resulting in increased surface area due to severe electrolyte consumption.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1222-1225
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• 1997

A gaseous oxygen detector has been developed in a configuration of Pd-$SnO_x$-$Si_3N_4$-$SiO_2$-Si-Al with highly resistive $SnO_x$ layer as the oxygen adsorptive element. In this paper, we present the characteristics of the device in response to oxygen adsoption/desorption under applied d.c. bias. Experimental results showed that the oxygen adsorptive response by the device was reduced significantly under a positive gate bias, for all experimental regions of $O_2$ partial pressure. On the other hand, the application of a negative gate bias increased the device's adsorptive response of oxgyen. A device model concerning this electroadsorption/desorption behavior of the device is provided.

• 한국재료학회지
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• 제6권7호
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• pp.709-715
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• 1996

${Ti}_{5}{Si}_{3}$와 ${Ti}_{5}{Si}_{3}-{ZrO}_{2}$ 복합재료의 연소합성에 미치는 전기장의 영향에 관하여 연구하였다. 45mole% 이상 첨가한 ${Ti}_{5}{Si}_{3}-{ZrO}_{2}$ 복합재료는 전기장하에서만 연소합성할 수 있었다. ${Ti}_{5}{Si}_{3}$-45mole% ${ZrO}_{2}$와 Ti5Si3-60mole% ${ZrO}_{2}$ 복합재료는 전기장을 가하지 않은 상태에서는 불안정한 연소파가 전파되었지만 반응은 완전히 일어나지 않았다 즉, 불안정한 연소파는 시편의 중앙 부근까지 전파 된 후 멈추었다. ${Ti}_{5}{Si}_{3}$-ZrO2 복합재료의 연소파 속도는 시편에 가해준 전기장에 의해 약간 증가하였다.

• 폴리머
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• 제37권3호
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• pp.373-378
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• 2013

폴리카보네이트(PC) 필름을 유연기판으로 사용하기 위해서는 $SiO_x$ 증착에 의한 베리어 특성 개선이 필요하며 이때 베리어 층과 PC 계면 접착력이 매우 중요하다. 본 연구에서는 언더 코팅, UV/$O_3$ 및 저온 플라즈마와 같은 다양한 표면 처리 방법에 의하여 PC 필름 표면을 개질하여 표면의 물리적 화학적 변화가 증착된 베리어 층 계면 접착력에 미치는 영향을 살펴보았다. 표면 처리 전의 PC 필름은 표면 거칠기 및 표면 에너지가 매우 낮아 $SiO_x$ 베리어 층과의 접착력이 현저히 떨어짐을 알 수 있었다. PC 필름을 저온 플라즈마로 표면 처리한 결과, 표면의 거칠기 증가와 극성 관능기 생성에 의하여 극성 표면 에너지가 향상되는 반면 UV/$O_3$ 처리의 경우, 표면 거칠기 변화 없이 표면에 생성된 극성 관능기에 의해 극성 표면 에너지가 증가됨을 알 수 있었다. 이러한 표면의 변화는 베리어층과 PC 기판의 계면 접착력 증가에 기여함을 알 수 있었다. 표면 처리 방법으로 언더 코팅을 사용하는 경우 표면에 에너지를 가하지 않아도 코팅제의 아크릴산과 $SiO_x$의 접착력 향상에 의하여 PC 필름과의 계면 접착력이 증가되며 유무기 하이브리드 다층 구조에 의한 베리어 특성 개선이 함께 일어남을 알 수 있었다.

• JSTS:Journal of Semiconductor Technology and Science
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• 제14권5호
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• pp.666-672
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• 2014

We have investigated the gate insulator effects on the electrical performance of p-type tin monoxide (SnO) thin-film transistors (TFTs). Various SnO TFTs are fabricated with different gate insulators of a thermal $SiO_2$, a plasma-enhanced chemical vapor deposition (PECVD) $SiO_x$, a $150^{\circ}C$-deposited PEVCD $SiO_x$, and a $300^{\circ}C$-deposited PECVD $SiO_x$. Among the devices, the one with the $150^{\circ}C$-deposited PEVCD $SiO_x$ exhibits the best electrical performance including a high field-effect mobility ($=4.86cm^2/Vs$), a small subthreshold swing (=0.7 V/decade), and a turn-on voltage around 0 (V). Based on the X-ray diffraction data and the localized-trap-states model, the reduced carrier concentration and the increased carrier mobility due to the small grain size of the SnO thin-film are considered as possible mechanisms, resulting in its high electrical performance.