• Title/Summary/Keyword: $In_{0.7}Ga_{0.3}As$

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Electrochemical Corrosion Characteristics of Dental Prostheses High-Palladium Alloys (치과용 고-Pd계 합금의 부식특성)

  • 김기주;이진형
    • Journal of Biomedical Engineering Research
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    • v.22 no.6
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    • pp.511-518
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    • 2001
  • In vitro corrosion resistance of the commercially used 76.5wt.%Pd-17.6%Cu-7.2%Ga and 77.3%Pd-6.0%Ga dental Prostheses high-Palladium system alloys in cast, degassing and porcelain-firing heat treatment conditions were evaluated by the potentiodynamic polarization technique in the de-aerated 0.9%NaCl and a modified Fusayama electrolyte. From the corrosion rate experimental results, we found that there is a small difference in the corrosion resistance depending on the microstructure. However. it was so small that there is no significant problem as a dental material. The 77.3%Pd-6.0%Ga showed better corrosion resistance than the 76.5%Pd-11.6%Cu-7.2%Ga dental Prostheses high-palladium system alloys. These experimental observations in 76.5%Pd-11.6%Cu-7.2%Ga alleys are mainly due to a rapid quenching and Cu in the alloy which accelerate the eutectic reaction with a segregation and Precipitates in the microstructure. On the ocher hand, 77.3%Pd-6.0%Ga alloys, which are solid-solution matrix, show much better col·lesion resistance compared with that of 76.5%Pd-11.6%Cu-7.2%Ga alloys.

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Design of 14.0-14.5 GHz 3Watt SSPA for VSAT Applications (VSAT용 14.0-14.5 GHz 3와트 SSPA의 설계 및 제작연구)

  • 전광일;박진우
    • The Journal of Korean Institute of Communications and Information Sciences
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    • v.19 no.5
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    • pp.920-927
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    • 1994
  • A development of an efficient 14.0~14.5GHz 3 Watt SSPA is described in this paper, which is applicable to the very small aperture terminal(VSAT) for bidirectional data and voice signal transmission in low cost and with small size. The SSPA consists of two stages of low noise amplifiers using the low noise GaAs FETs. two stages of medium power amplifiers using the medium power GaAs FETs, and three stages of power amplifiers including a balanced amplifier using an internally matched power GaAs FET. The achieved with this seven stage amplifiers are 42dB signal power gain, 7dB noise figure, 35dBm output power at 1dB gain compression point and 2.0 and 1.5 input and output VSWR respectively.

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Isolation of a Gibberellin-producing fungus (Penicillium sp. MH7) and Growth Promotion of Crown Daisy (Chrysanthemum coronarium)

  • Hamayun, Muhammad;Khan, Sumera Afzal;Iqbal, Ilyas;Ahmad, Bashir;Lee, In-Jung
    • Journal of Microbiology and Biotechnology
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    • v.20 no.1
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    • pp.202-207
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    • 2010
  • Plant growth promoting fungi (PGPF) are well known for the production of useful secondary metabolites. However, limited information is available on the gibberellin (GA) production capacity of PGPF of endophytic origin. In the current study, 15 fungal endophytes were isolated from the roots of Crown daisy, and then screened on Waito-c rice, in order to identify plant growth promoting fungi. The fungal isolate MH7 significantly increased the shoot length (12.1 cm) of Waito-c in comparison with control treatment (7.9 cm). In a separate experiment, the culture filtrate (CF) of MH7 significantly promoted the growth attributes of Crown daisy. The MH7 CF was analyzed for gibberellins and it contained all physiologically active gibberellins ($GA_1$, 1.37 ng/ml; $GA_3$, 5.88 ng/ml; $GA_4$, 8.62 ng/ml; and $GA_7$, 2.05 ng/ml) in conjunction with physiologically inactive $GA_9$ (0.83 ng/ml), $GA_{12}$ (0.44 ng/ml), $GA_{15}$ (0.74 ng/ml), $GA_{19}$ (1.16 ng/ml), and $GA_{20}$ (0.98 ng/ml). The CF of MH7 produced higher amounts of $GA_3$, $GA_4$, $GA_7$, $GA_9$, and $GA_{12}$ than wild-type Fusarium fujikuroi, which was used as a control for GA production. The fungal isolate MH7 was later identified as a new strain of Penicillium on the basis of its morphological characteristics and phylogenetic analysis of the 188 rDNA sequence.

Partial Oxidation of CH4 Using {0.7}Sr0.3Ga0.6Fe0.4O3-δ for Soild Oxide Fuel Cell (고체산화물 연료전지용 La0.7Sr0.3Ga0.6Fe0.4O3-δ계의 메탄부분산화반응)

  • Lee, Seung-Young;Lee, Kee-Sung;Lee, Shi-Woo;Kim, Jong-Won;Woo, Sang-Kuk
    • Journal of the Korean Electrochemical Society
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    • v.6 no.1
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    • pp.59-64
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    • 2003
  • We fabricated mixed ionic-electronic conducting membranes, $CH_4\;Using\;{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$, by solid state reaction method for solid oxide fuel cell. The membranes consisted of single perovskite phase and exhibited high relative density, $>95\%$. We coated $La_{0.6}Sr_{0.4}CoO_{3-\delta}$ layer using screen printing method in order to improve surface reactivity of the $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$. As a result, the oxygen permeation flux of the coated $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$ showed higher value, $0.5ml/min{\cdot}cm^2\;at\;950^{\circ}C$ than the uncoated one. Higher oxygen permeation was observed in the porously coated Lao $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$membranes with larger grain sizes. Syngas, $CO+H_2$, was successfully obtained from methane gas, $CH_4$, using the $La_{0.6}Sr_{0.4}CoO_{3-\delta}$ coated $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$, with over $40\%\;of\;CH_4$ conversion and syngas yield. $La_{0.7}Sr_{0.3}Ga_{0.6}Fe_{0.4}O_{3-\delta}$ membrane was stable even when it was exposed to the reducing environment, methane, for 600 hrs at $950^{\circ}C$.

Heteroface p-$Al_{x}Ga_{1-x}As/p-GaAs/n-GaAs/n^{+}$-GaAs Solar Cell Grown by MOCVD (MOCVD를 이용한 Heteroface p-$Al_{x}Ga_{1-x}As/p-GaAs/n-GaAs/n^{+}$-GaAs 태양전지의 개발)

  • 창기근;임성규
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.28A no.1
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    • pp.30-39
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    • 1991
  • The influence of physical parameters (Al mole fraction, thickness, doping concentration) in the window and emitter on the efficiency characteristics of heteroface p-$Al_{x}Ga_{1-x}As/p-GaAs/n-GaAs/n^{+}$-GaAs solar cell is investigated. The maximum efficiency theoretically calculated in this device is obtained when a thickness of the window is in a range of (400-1000))$\AA$and a thickness/doping concentration of the emitter is in a range of (0.5-0.8)$\mu$m/(1-7)${\times}10^{17}cm^{-3}$, respectively. Also is the efficiency improved according to the increase of Al mole fraction in the indirect gap window(0.41${\le}x{\le}1.0$). The optimum designed heteroface cell with an area of 0.165cm$^2$fabricated using MOCVD exhibits an active area conversion efficiency of 17%, having a short circuit current density of 21.2mA/cm\ulcorner an open circuit voltage of 0.94V, and a fill factor of 0.75 under ELH-100mW/cm$^2$illumination.

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Pulsed DC $BCl_3/SF_6$ 플라즈마를 이용한 GaAs와 AlGaAs의 선택적 식각에 관한 연구

  • Choe, Gyeong-Hun;Kim, Jin-U;No, Gang-Hyeon;Sin, Ju-Yong;Park, Dong-Gyun;Song, Han-Jeong;Lee, Je-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.67-67
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    • 2011
  • Pulsed DC $BCl_3/SF_6$ 플라즈마를 사용하여 GaAs와 AlGaAs의 건식 식각을 연구하였다. 식각 공정 변수는 가스 유량 (50~100 % $BCl_3$ in $BCl_3/SF_6$), 펄스 파워 (450~600 V), 펄스 주파수 (100~250 KHz), 리버스 시간 (0.4~1.2 ${\mu}s$)이었다. 식각 공정 후 표면 단차 측정기 (Surface profiler)를 사용하여 표면의 단차와 거칠기를 분석하였다. 그 결과를 이용하여 식각률 (Etch rate), 표면거칠기 (Surface roughness), 식각 선택비 (Selectivity)와 같은 특성 평가를 하였다. 실험 후 주사 현미경 (FE-SEM, Field Emission Scanning Electron Microscopy)을 이용, 식각 후 시료의 단면과 표면을 관찰하였다. 실험 결과에 의하면 1) 18 sccm $BCl_3$ / 2 sccm $SF_6$, 500 V (Pulsed DC voltage), 0.7 ${\mu}s$ (Reverse time), 200 KHz (Pulsed DC frequency), 공정 압력이 100 mTorr인 조건에서 GaAs와 Al0.2Ga0.8As의 식각 선택비가 약 48:1로 우수한 결과를 나타내었다. 2) 펄스 파워 (Pulsed DC voltage), 리버스 시간(Reverse time), 펄스 주파수(Pulsed DC frequency)의 증가에 따라 각각 500~550 V, 0.7~1.0 ${\mu}s$, 그리고 200~250 KHz 구간에서 AlGaAs에 대한 GaAs의 선택비가 감소하게 되는 것을 알 수 있었다. 이는 척 (chuck)에 인가되는 전류와 파워를 증가시키고, 따라서 GaAs의 식각률이 크게 증가했지만 AlGaAs 또한 식각률이 증가하게 되면서 GaAs에 대한 식각 선택비가 감소한 것으로 생각된다. 3) 표면 단차 측정기와 주사전자현미경 사진 결과에서는 GaAs의 경우 10% $SF_6$ (18 sccm $BCl_3$ / 2 sccm $SF_6$)가 혼합된 조건에서 상당히 매끈한 표면 (RMS roughness < 1.0 nm)과 높은 식각률 (~0.35 ${\mu}m$/min), 수직의 식각 측벽 확보에서 매우 좋은 결과를 보여주었다. 또한 같은 공정 조건에서 AlGaAs는 식각이 거의 되지 않은 결과 (~0.03 ${\mu}m$/min)를 보여주었다. 위의 결과들을 종합해 볼 때 Pulsed DC $BCl_3/SF_6$ 플라즈마는 GaAs와 AlGaAs의 선택적 식각 공정에서 매우 우수한 공정 결과를 나타내었다.

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Evidence of Spin Reorientation by Mössbauer Analysis

  • Myoung, Bo Ra;Kim, Sam Jin;Kim, Chul Sung
    • Journal of Magnetics
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    • v.19 no.2
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    • pp.126-129
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    • 2014
  • We report the crystallographic and magnetic properties of $Ni_{0.3}Fe_{0.7}Ga_2S_4$ by means of X-ray diffractometer (XRD), a superconducting quantum interference device (SQUID) magnetometer, and a M$\ddot{o}$ssbauer spectroscopy. In particular, $Ni_{0.3}Fe_{0.7}Ga_2S_4$ was studied by M$\ddot{o}$ssbauer analysis for evidence of spin reorientation. The chalcogenide material $Ni_{0.3}Fe_{0.7}Ga_2S_4$ was fabricated by a direct reaction method. XRD analysis confirmed that $Ni_{0.3}Fe_{0.7}Ga_2S_4$ has a 2-dimension (2-D) triangular lattice structure, with space group P-3m1. The M$\ddot{o}$ssbauer spectra of $Ni_{0.3}Fe_{0.7}Ga_2S_4$ at spectra at various temperatures from 4.2 to 300 K showed that the spectrum at 4.2 K has a severely distorted 8-line shape, as spin liquid. Electric quadrupole splitting, $E_Q$ has anomalous two-points of temperature dependence of $E_Q$ curve as freezing temperature, $T_f=11K$, and N$\acute{e}$el temperature, $T_N=26K$. This suggests that there appears to be a slowly-fluctuating "spin gel" state between $T_f$ and $T_N$, caused by non-paramagnetic spin state below $T_N$. This comes from charge re-distribution due to spin-orientation above $T_f$, and $T_N$, due to the changing $E_Q$ at various temperatures. Isomer shift value ($0.7mm/s{\leq}{\delta}{\leq}0.9mm/s$) shows that the charge states are ferrous ($Fe^{2+}$), for all temperature range. The Debye temperature for the octahedral site was found to be ${\Theta}_D=260K$.

MOCVD Growth of AlGaAs/InGaAs/GaAs Pseudomorphic Structures and Transport Properties of 2DEG (AlGaAs/InGaAs/GaAs Pseudomorphic 구조의 MOCVD 성장 및 2차원 전자가스의 전송특성)

  • 양계모;서광석;최병두
    • Journal of the Korean Vacuum Society
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    • v.2 no.4
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    • pp.424-432
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    • 1993
  • AlGaAs/InGaAs/GaAs pseudomorphic structures have been grown by atmosheric pressure-MOCVD . The Al incorporation efficiency is constant but slightly exceeds the Ga incorporation during the growth of AlGaAs layers at $650^{\circ}C$ . Meanwhile , the In incorporation efficiency is constant but slightly less than the Ga incorporation in InGAAs layers. InGaAs/GaAs QWs were grown and their optical properties were characterized . $\delta$-doped Al0.24Ga0.76As/In0.16 Ga0.84As p-HEMT structures were successfully grown by MOCVD and their transport properties were characterized by Hall effect and SdH measurements. SdH Measurements at 3.7K show clear magnetoresistance oscillations and plateaus in the quantum Hall effect confirming the existence of a two-dimensional electron gas(2DEG) and a parallel conduction through the GaAs buffer layer. The fabricated $1.5\mu\textrm{m}$gatelength p-HEMTs having p-type GaAs in the buffer layer show a high transconductance of 200 mS/mm and a good pinch-off characteristics.

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The recombination velocity at III-V compound heterojunctions with applications to Al/$_x$/Ga/$_1-x$/As-GaAs/$_1-y$/Sb/$_y$/ solar cells

  • 김정순
    • 전기의세계
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    • v.28 no.4
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    • pp.53-63
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    • 1979
  • Interface recombination velocity in $Al_{x}$G $a_{1-x}$ As-GaAs and $Al_{0.85}$, G $a_{0.15}$ As-GaA $s_{1-y}$S $b_{y}$ heterojunction systems is studied as a function of lattice mismatch. The results are applied to the design of highly efficient III-V heterojunction solar cells. A horizontal liquid-phase epitaxial growth system was used to prepare p-p-p and p-p-n $Al_{x}$G $a_{1-x}$ As-GaA $s_{1-y}$S $b_{y}$-A $l_{x}$G $a_{1-x}$ As double heterojunction test samples with specified values of x and y. Samples were grown at each composition, with different GaAs and GaAs Sb layer thicknesses. A method was developed to obtain the lattice mismatch and lattice constants in mixed single crystals grown on (100) and (111)B oriented GaAs substrates. In the AlGaAs system, elastic lattice deformation with effective Poisson ratios .mu.$_{eff}$ (100=0.312 and .mu.$_{eff}$ (111B) =0.190 was observed. The lattice constant $a_{0}$ (A $l_{x}$G $a_{1-x}$ As)=5.6532+0.0084x.angs. was obtained at 300K which is in good Agreement with Vegard's law. In the GaAsSb system, although elastic lattice deformation was observed in (111) B-oriented crystals, misfit dislocations reduced the Poisson ratio to zero in (100)-oriented samples. When $a_{0}$ (GaSb)=6.0959 .angs. was assumed at 300K, both (100) and (111)B oriented GaAsSb layers deviated only slightly from Vegard's law. Both (100) and (111)B zero-mismatch $Al_{0.85}$ G $a_{0.15}$As-GaA $s_{1-y}$S $b_{y}$ layers were grown from melts with a weight ratio of $W_{sb}$ / $W_{Ga}$ =0.13 and a growth temperature of 840 to 820 .deg.C. The corresponding Sb compositions were y=0.015 and 0.024 on (100) and (111)B orientations, respectively. This occurs because of a fortuitous in the Sb distribution coefficient with orientation. Interface recombination velocity was estimated from the dependence of the effective minority carrier lifetime on double-heterojunction spacing, using either optical phase-shift or electroluminescence timedecay techniques. The recombination velocity at a (100) interface was reduced from (2 to 3)*10$^{4}$ for y=0 to (6 to 7)*10$^{3}$ cm/sec for lattice-matched $Al_{0.85}$G $a_{0.15}$As-GaA $s_{0.985}$S $b_{0.015}$ Although this reduction is slightly less than that expected from the exponential relationship between interface recombination velocity and lattice mismatch as found in the AlGaAs-GaAs system, solar cells constructed from such a combination of materials should have an excellent spectral response to photons with energies over the full range from 1.4 to 2.6 eV. Similar measurements on a (111) B oriented lattice-matched heterojunction produced some-what larger interface recombination velocities.ities.ities.s.

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펄스 직류 전원 $BCl_3$/He 플라즈마를 이용한 GaAs 건식 식각

  • Choe, Gyeong-Hun;Kim, Jin-U;No, Gang-Hyeon;Sin, Ju-Yong;Park, Dong-Gyun;Jo, Gwan-Sik;Lee, Je-Won
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.159-159
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    • 2010
  • 펄스 직류 전원 $BCl_3$/He 플라즈마를 사용하여 GaAs의 건식 식각을 연구하였다. 공정 변수는 가스 유량 (0~100% $BCl_3$ in $BCl_3$/He), 펄스 파워 ($450{\sim}600\;{\nu}$), 펄스 주파수 (100~250 KHz), 펄스 시간 ($0.4{\sim}1.2\;{\mu}s$)이었다. 식각 공정 후 식각률, 포토레지스트에 대한 식각 선택도, 표면 거칠기는 표면 단차 측정기를 이용하였다. 식각 공정 동안 플라즈마 광 특성 분석은 광학 발광분석기 (Optical emission spectroscopy)를 사용하였다. 실험 후 주사 전자 현미경을 이용, 식각 후 시료의 단면과 표면을 관찰하였다. 실험 결과에 의하면 1) 펄스 파워, 주파수, 시간을 고정 ($500\;{\nu}$, $0.7\;{\mu}s$, 200 KHz)하고 10% He 가스가 혼합되어 있는 조건에서 GaAs의 식각률이 순수한 $BCl_3$를 사용한 것보다 높았다. 이를 통해 식각 공정에서 일정량 이하의 He 혼합은 GaAs 식각률을 증가시키는 시너지효과가 있음을 알 수 있었다. 2) 그러나 약 20% 이상의 He 가스의 혼합은 GaAs의 식각 속도를 저하시켰다. 3) 10% He (9 sccm $BCl_3/1$ sccm He), 200 KHz 펄스 주파수, $0.7\;{\mu}s$ 펄스 시간의 조건에서 펄스 파워가 증가함에 따라 GaAs의 식각률 또한 선형적으로 증가하였다. 4) 특히, $600\;{\nu}$의 파워에서 식각률은 ${\sim}0.5\;{\mu}m/min$로 가장 높았다. 5) 표면 단차 측정기와 전자현미경을 이용하여 식각한 GaAs를 분석한 결과 10% He이 혼합되어 있는 조건에서는 우수한 수직 측벽과 매끈한 표면 (RMS roughness <1 nm)을 관찰할 수 있었다. 6) 10% He이 혼합된 $BCl_3$/He 펄스 직류 플라즈마 식각 후 XPS 분석결과에서도 기준 샘플과 비교하였을 때, 공정 후의 GaAs 표면이 화학적으로 깨끗하며 잔류물이 거의 검출되지 않았다. 위의 결과를 정리하였을 때, 펄스 직류 $BCl_3$/He 플라즈마는 GaAs의 식각에서 매우 우수한 공정 결과를 나타내었다.

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