Figure 1. Chemical structure of cure accelerators: (a) cyclohexyl benzothiazyl sulfenamide (CBS), (b) diphenyl guanidine (DPG), (c) tetrabenzylthiuram disulfide (TBzTD).
Figure 2. Chemcal structure of bis[3-(triethoxysilyl)propyl]tetrasulfide (TESPT).
Figure 3. Cure characteristics of the compounds by controlling DPG/TBzTD content.
Figure 4. Mechanical properties of the compounds by controlling DPG/TBzTD content.
Figure 5. Tan δ curves of the compounds by controlling DPG/TBzTD content as a function of temperature.
Figure 6. Cure characteristics of the compounds by changing sulfur/CBS content.
Figure 7. Mechanical properties of the compounds by changing sulfur/CBS content.
Figure 8. Tan δ curves of the compounds by changing sulfur/CBS content.
Table 1. Recipe of ESBR Silica WMB
Table 2. Formulations of ESBR Silica WMB/BR Silica DMB Blend Compounds.
Table 3. Compounding Procedure for the ESBR Silica WMB/BR Silica DMB Blend Compounds
Table 4. Cure Characteristics of the Compounds by Controlling DPG/TBzTD Content
Table 5. Crosslink Densities of the Compounds by Controlling DPG/TBzTD Content
Table 6. Mechanical Properties of the Compounds by Controlling DPG/TBzTD Content
Table 7. DIN abrasion Loss of the Compounds by Controlling DPG/TBzTD Content
Table 8. Dynamic viscoelastic Properties of the Compounds by Controlling DPG/TBzTD Content
Table 9. Cure Characteristics of the Compounds by Changing Sulfur/CBS Content
Table 10. Crosslink Densities of the Compounds by Changing Sulfur/CBS Content
Table 11. Mechanical Properties of the Compounds by Changing Sulfur/CBS Content
Table 12. DIN abrasion Loss of the Compounds by Changing Sulfur/CBS Content
Table 13. Dynamic viscoelastic Properties of the Compounds by Changing Sulfur/CBS Content
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