Fig. 1. Manufacturing process of micro louver patterns.
Fig. 2. Viewing angle of micro louver patterns.
Fig. 3. SEM image of micro louver patterns.
Fig. 4. Viewing angle calculation of privacy film.
Fig. 5. Transmittance simulation results of privacy film at top viewing angle.
Fig. 6. Transmittance simulation results of privacy film at 13.24° viewing angle.
Fig. 7. SEM image of deposited SiO2/SiON multi-layer.
Fig. 8. Measurement results with Hamamatsu spectrometer at 13.24° viewing angle (550 nm).
Fig. 9. Anglar characteristic measurement process with spectrometer.
Fig. 10. Measurement results with Hamamatsu spectrometer at top viewing angle (550 nm).
Fig. 11. Variation of display effect of SiO2/SiON applied privacy film with varying viewing angle.
Table 1. SiO2/SiON multi-layer deposition condition.
Table 2. Conditions for the thickness of SiO2/SiON multi-layer.
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