DOI QR코드

DOI QR Code

Numerical Investigation of Factors affecting Photoresist Stripping Process on the ITO Surface using the Spray Method

노즐 분사 방식의 ITO 표면 포토레지스트 박리과정 요인의 수치해석

  • Kim, Joon Hyun (Mechanical and Automotive Engineering, Seoul National University of Science & Technology) ;
  • Lee, Joon Hyuck (Mechanical and Automotive Engineering, Seoul National University of Science & Technology) ;
  • Kang, Tae Seong (Mechanical and Automotive Engineering, Seoul National University of Science & Technology) ;
  • Joo, Gi-Tae (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology) ;
  • Kim, Young Sung (Graduate School of NID Fusing Technology, Seoul National University of Science & Technology) ;
  • Jeong, Byung Hyun (Eotech, GERI) ;
  • Lee, Dae Won (DS Techopia)
  • Received : 2016.11.23
  • Accepted : 2017.03.13
  • Published : 2017.04.15

Abstract

This study investigated spraying factors applicable to stripper usage. Cyclodextrine, as environment-friendly material, was included in the stripper composition. An efficient spray technology was applied for the Photoresist strip. For industrial applications, stripping requires a temperature below $50^{\circ}C$, a strip time within 50 s, and chemically stable activation. Spraying factors were organized considering many conditions-orifice diameter, working pressure (inlet speed), spray distance, and spray angle. For commercial practicability, the flow rate was limited to 3 L/min. The nozzle parameters were nozzle orifice diameter of 1.8-2.2 mm, spray distance of 40-60 mm, and injection speed of 0.7-1.2 m/s. Through the thermal spray movement of the fluid, the thermal boundary layer for a chemical reaction just above the ITO-glass surface and momentum region for sufficient agitation (above 4 m/s) was achieved.

Keywords

References

  1. Li, Z. R., 2015, Organic Light-Emitting Materials and Devices, 2nd Edition, CRC Press, Boca Raton.
  2. Kim, K. H., 2014., viewed 9 Nov. 2016, [Display Dynamics] TFT-LCD Chemical Materials Market Remains Robust on Growth of Chinese Panel Makers - Part 1: 4 Key TFT Materials, .
  3. Korea IT Times, 2010., viewed 9 Nov. 2016, Korean LCD Material Market facing Intensified Competition between Global and Local Companies, .
  4. Park, N. H., Kim, D. H., Park, B., Jeong, E., Lee, J. W., 2013, The Industry Trend Analysis and Perspectives of Biodegradable Polymers, Biomaterials Research, 17:3 114-120.
  5. Ojima, S., Jizaimaru, T., Omae, S., Ohmi, T., 1997, Room Temperature Photoresist Stripper, J. Electrochem. Soc., 144:1 4005-4018. https://doi.org/10.1149/1.1838127
  6. Nguyen, T. H., Lee, M. S., 2014, Extraction and Stripping of Inorganic Acids by Tris 2-ethylhexyl Amine, J. Korean Inst. Met. Ma., 52:10 799-803. https://doi.org/10.3365/KJMM.2014.52.10.799
  7. Song, S. S., Yoon, H. J., Kim, T. H., 2014, Stripper Composition and Cleaning Method, KR Patent: 10-1426088.
  8. Moore, J. C., 2002, Successful Photoresist Removal: Incorporating Chemistry, Conditions, and Equipment, Proc. SPIE 4690, Advances in Resist Technology and Processing XIX, 892-903.
  9. Choi, H. H., 2010, Co-teaching Textbook on Display Process: Understanding for the TFT-LCD Manufacturing Process, Korea Display Industry Association, Seoul.
  10. Kim, J. H., Shim, J. M., Joo, G. T., Kim, Y. S., Jeong, B. H., 2016, An Efficient Photoresist Stripping Process on the ITO Surface Using the Dipping Method, Journal of the Korean Society of Manufacturing Technology Engineers, 25:4 281-289. https://doi.org/10.7735/ksmte.2016.25.4.281
  11. Kim, J. H., Kim, S. H., Jeong, B. H., Joo, G-T., Kim Y. S., 2016, Green Photoresist Stripping Process with the Influence of Free Surface from Dip Withdrawal, Journal of the Korean Society of Manufacturing Technology Engineers, 25:1 14-20. https://doi.org/10.7735/ksmte.2016.25.1.14
  12. Xu, Y., Yuan, J., Repke, J. U., Wozny, G., 2012, CFD Study on Liquid Flow Behavior on Inclined Flat Plate Focusing on Effect of Flow Rate, Engineering Applications of Computational Fluid Mechanics, 6:2 186-194. https://doi.org/10.1080/19942060.2012.11015413

Cited by

  1. 병렬 노즐 분사의 ITO 표면 포토레지스트 박리 조건에 관한 해석 vol.27, pp.1, 2017, https://doi.org/10.7735/ksmte.2018.27.1.27
  2. 환경친화형 수계 박리액의 박리공정특성 및 청정성 평가 연구 vol.27, pp.2, 2018, https://doi.org/10.7735/ksmte.2018.27.2.154
  3. An Efficient Spraying Method with Cyclodextrine-drived Aqueous Stripper for Removing of Organic Photoresist on Indium Tin Oxide Surface : An Efficient Spraying Method with Cyclodextrine-drived Aqueous vol.39, pp.10, 2017, https://doi.org/10.1002/bkcs.11576