한국전기전자재료학회논문지 (Journal of the Korean Institute of Electrical and Electronic Material Engineers)

  • 제20권2호
  • /
  • Pages.162-166
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  • 2007
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  • 1226-7945(pISSN)
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  • 2288-3258(eISSN)
한국전기전자재료학회 (The Korean Institute of Electrical and Electronic Material Engineers)
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PC 기판상에 제작된 ITO 박막의 특성

Characteristics of ITO Thin Films prepared on PC Substrate

  • 조범진 (경원대학교 전기공학과) ;
  • 김경환 (경원대학교 전기공학과)
  • 발행 : 2007.02.01
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초록

The ITO thin films were prepared by facing targets sputtering (FTS) system on polycarbonate (PC) substrate. The ITO thin films were deposited with a film thickness of 100 nm at room temperature. As a function of sputtering conditions, electrical and optical properties of prepared ITO thin films were measure. The electrical and optical characteristics of the ITO thin films were evaluted by Hall Effect Measurement (EGK) and UV/VIS spectrometer (HP), respectively. From the results, the ITO thin films was deposited with a resistivity $8{\times}10^{4}\;{\Omega}-cm$ and transmittance over 80 %.

키워드

참고문헌

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피인용 문헌

  1. Effect of Strain Rate on the Deformation and Cracking Behaviors of ITO/PET Sheets with 45 ohms/sq. Sheet Resistance vol.22, pp.1, 2009, https://doi.org/10.4313/JKEM.2009.22.1.067
  2. Dry Etching of Flexible Polycarbonate and PMMA in O2/SF6/CH4Discharges vol.18, pp.2, 2009, https://doi.org/10.5757/JKVS.2009.18.2.085
  3. Process Optimization of ITO Film on PC Substrate Deposited by In-line Sputtering Method for a Resistive-type Touch Panel vol.18, pp.6, 2009, https://doi.org/10.5757/JKVS.2009.18.6.440