한국전기전자재료학회:학술대회논문집 (Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference)
- 한국전기전자재료학회 2000년도 추계학술대회 논문집
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- Pages.511-514
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- 2000
KrF 엑시머 레이저에 의한 ITO 박막의 어블레이션과 표면특성관찰
The ablation of ITO thin films by KrF Eximer laser and its characteristics
초록
This work aimed to develop ITO (Indium Tin Oxide) thin films ablation with a KrF Eximer laser required for the application in flat panel display, especially patterning into small geometry on a large substrate area. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/cm