• Title/Summary/Keyword: wet chemical

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Synthesis of IZTO(Indium Zinc Tin Oxide) particle by spray pyrolysis and post-heat treatment and characterization of deposited IZTO film

  • Lim, Seong Taek;Kim, Sang Hern
    • Journal of the Korean Applied Science and Technology
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    • v.33 no.4
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    • pp.734-740
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    • 2016
  • The micron-sized indium zinc tin oxide (IZTO) particles were prepared by spray pyrolysis from aqueous precursor solution for indium, zinc, and tin and organic additives such as citric acid (CA) and ethylene glycol (EG) were added to aqueous precursor solution for indium, zinc, and tin. The obtained IZTO particles prepared by spray pyrolysis from the aqueous solution without organic additives had spherical and filled morphologies, whereas the IZTO particles obtained with organic additives had more hollow and porous morphologies. The micron-sized IZTO particles with organic additives were changed fully to nano-sized IZTO particles, whereas the micron-sized IZTO particles without organic additives were not changed fully to nano-sized IZTO particle after post-treatment at $700^{\circ}C$ for 2 hours and wet-ball milling for 24 hours. Surface resistances of micron-sized IZTO's before post-heat treatment and wet-ball milling were much higher than those of nano-sized IZTO's after post-heat treatment and wet-ball milling. From IZTO with composition of 80 wt. % $In_2O_3$, 10 wt. % ZnO, and 10 wt. % $SnO_2$ which showed a smallest surface resistance IZTO after post-heat treatment and wet-ball milling, thin films were deposited on glass substrates by pulsed DC magnetron sputtering, and the electrical and optical properties were investigated.

A Study on the Development and Performance Test of the Non-gravity Fluidized Dryer (무중력 유동층 건조기 개발과 성능평가)

  • Han, J.W.;Kum, S.M.;Lee, C.E.
    • Proceedings of the KSME Conference
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    • 2001.06d
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    • pp.665-670
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    • 2001
  • The purpose of this study is to develop a new type dryer, which is to proceed mixing and drying of wet-materials at the same time and drying process is carried out in a closed system. In this drying system, thermal contact occurs, when a fluidized zone is created by paddle mechanism. Accordingly, wet-materials is dried in a short time without any damage. Also wet-materials could be dried uniformly to low moisture contents. It is suitable to dry a small quantity of multi-kind materials. And drying process is carried out in a closed system, so as for environmental pollution dust not to be emitted into the atmosphere. Accordingly, it could be used to dry not only food and chemical materials, but also environmental pollution materials.

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A Comparative Study on the Influence of Etchant upon the Etching Rate and Quality in Laser Induced Wet Etching of Fused Silica (식각액에 따른 용융실리카의 레이저 습식 식각 특성 비교 연구)

  • 이종호;이종길;전병희
    • Transactions of Materials Processing
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    • v.13 no.3
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    • pp.268-272
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    • 2004
  • Transparent materials such as fused silica are widely utilized in optical and optoelectronics field because of its outstanding properties, such as transparency in a wide wavelength range, strong damage resistance for laser irradiation, and high thermal and chemical stability. In this study, we made a few micro patterns on the surface of fused silica plate using laser induced wet etching. KrF excimer laser was used as a light source. There were no burrs and micro cracks on the etched surface of fused silica and the flatness of the etched surface was fairly good. We investigated the influence of etchant upon the etch rate and quality in laser induced wet etching. Pyrene-acetone solution and toluene were used as etchant. In the side of etch rate, toluene solution was better than pyrene-acetone solution. But we made in wider range of energy density using pyrene-acetone solution. But pyrene-acetone solution gave us wider window of energy density for successful micro patterning.

Multi-mode Planar Waveguide Fabricated by a (110) Silicon Hard Master

  • Jung, Yu-Min;Kim, Yeong-Cheol
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.12
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    • pp.1106-1110
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    • 2005
  • We fabricated (110) silicon hard master by using anisotropic wet etching for embossing. The etching chemical for the silicon wafer was a TMAH $25\%$ solution. The anisotropic wet etching produces a smooth sidewall surface and the surface roughness of the fabricated master is about 3 nm. After spin coating an organic-inorganic sol-gel hybrid material on a silicon substrate, we employed hot embossing technique operated at a low pressure and temperature to form patterns on the silicon substrate by using the fabricated master. We successfully fabricated the multi-mode planar optical waveguides showing low propagation loss of 0.4 dB/cm. The surface roughness of embossed patterns was uniform for more than 10 times of the embossing processes with a single hydrophobic surface treatment of the silicon hard master.

A Study on the Preparation of $Al_2O_3-TiO_2$ Nanocomposite Powders ($Al_2O_3-TiO_2$계 Nanocomposite 분체의 합성에 관한 연구)

  • 이홍림;이호순
    • Journal of the Korean Ceramic Society
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    • v.30 no.2
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    • pp.115-122
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    • 1993
  • Transparent Al2O3 and TiO2 clear sols prepared by hydrolysis and subsequent peptization were mixed into wet gel. EDS analysis for this gel showed that wet gel was extremely homogeneous in chemical composition. Calcination of the wet gel at 120$0^{\circ}C$ for 50 minutes resulted in Al2O3-TiO2 nanocomposite powders where TiO2 particles of 101~102 nanometer were dispersed in the Al2O3 matrix. Both powders were sintered for 4 hours in the temperature range over 1500~1$650^{\circ}C$ with and without 5wt% MgO sintering aid. Among these sintered bodies, nanocomposite powder compacts sintered at 1$650^{\circ}C$ for 4 hours with 5wt% MgO showed the most dense structure with the grain size under 5${\mu}{\textrm}{m}$ and highest relative density of 98.2%.

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GaN Base Blue LED on Patterned Sapphire Substrate by Wet Etching (습식식각 방법으로 제작한 패턴 형성 사파이어 기판을 가지는 GaN계 청색 LED)

  • Kim, Do-Hyung;Yi, Yong-Gon;Yu, Soon-Jae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.1
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    • pp.7-11
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    • 2011
  • Sapphire substrate was patterned by a selective chemical wet etching technique, and GaN/InGaN structures were grown on this substrate by MOVPE (Metal Organic Vapor Phase Epitaxy). The surface of grown GaN on patterned sapphire substrate (PSS) has good morphology and uniformity. The patterned sapphire substrate LED showed better light output than conventional LED that improvement 50%. We think these results come from enhancement of internal quantum efficiency by decrease of threading dislocation and increase of light extraction efficiency. Also these LED showed more uniform emission distribution in angle than conventional LED.

Effects of Stock Characteristics on Paper Bulk

  • Lee, Jin-Ho;Park, Jong-Moon
    • Proceedings of the Korea Technical Association of the Pulp and Paper Industry Conference
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    • 2006.06b
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    • pp.423-426
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    • 2006
  • Paper has fibers and fines network structure and it is strongly affected by interface bonding between fibers. Depending on the inter-fiber bonding, paper bulk is determined. Fines play an important roll in Campbell and consolidation effect through wet pressing and drying operations. Refined Sw-BKP, Hw-BKP and BCTMP fines were used to investigate the fines effect. Wet-web strength, breaking length, scattering coefficient, and hydrodynamic specific volume were measured. According to the result of experiments, chemical and morphological compositions of fines do not strongly affect to wet-web forming, but strongly affect to drying operations which form hydrogen bonding among fiber-fines-fiber matrixes. Paper bulk should be controlled by the extent of hydrogen bonding between fibers during drying operations.

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Laser-Induced Wet Etching of Mn-Zn Ferrite (페라이트의 레이저 유도 습식 에칭)

  • Lee, Cheon;Lee, Kyoung-Chul
    • Proceedings of the KIEE Conference
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    • 1996.11a
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    • pp.248-250
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    • 1996
  • VTR 자기헤드의 핵심소재로 사용되는 ferrite는 VTR 의 주기능인 영상의 기록 및 재생역할에 가장 중요한 소재이다. 이러한 종류의 head는 지금까지 mask wet chemical etching과 mechanical Process 에 의해 제작 되어왔다. 그러나 기록용량의 중가로 자기장치의 recording density를 높일것이 요구됨에 따라 자기헤드의 gap width를 줄일 필요가 있게 되었다. 본 연구는 mask와 photoresist를 사용하지 않고 ferrite를 직접 미세가공 하는 laser-induced wet etching을 이용하여 자기헤드의 기록용량을 높이고자 하였다. $Ar^+$ laser ( 파장 514 nm )를 빔 확장기와 렌즈를 사용 하여 직경 $1.8{\mu}m$ 로 집속하고, $100{\sim}500\;mW$의 출력 변화를 주어 실험을 하였다. 인산 수용액 (45, 65, 85 %)을 etchant로 사용하여 $5{\sim}30{\mu}m/sec$의 주사속도로 etching 하여, 미세선폭과 high aspect ratio를 갖는 groove를 얻을 수 있었다.

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