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Multi-mode Planar Waveguide Fabricated by a (110) Silicon Hard Master

  • Jung, Yu-Min (Department of Materials Engineering, Korea University of Technology And Education) ;
  • Kim, Yeong-Cheol (Department of Materials Engineering, Korea University of Technology And Education)
  • Published : 2005.12.01

Abstract

We fabricated (110) silicon hard master by using anisotropic wet etching for embossing. The etching chemical for the silicon wafer was a TMAH $25\%$ solution. The anisotropic wet etching produces a smooth sidewall surface and the surface roughness of the fabricated master is about 3 nm. After spin coating an organic-inorganic sol-gel hybrid material on a silicon substrate, we employed hot embossing technique operated at a low pressure and temperature to form patterns on the silicon substrate by using the fabricated master. We successfully fabricated the multi-mode planar optical waveguides showing low propagation loss of 0.4 dB/cm. The surface roughness of embossed patterns was uniform for more than 10 times of the embossing processes with a single hydrophobic surface treatment of the silicon hard master.

Keywords

References

  1. N. Savage, 'Linking with light,' IEEE Spectrum, Vol. 39, No.8, p. 36, 2002
  2. W. S. Kim, J. H. Lee, S. Y. Shin, B. S. Bae, and Y. C. Kim, 'Fabrication of ridge waveguides by UV embossing and stamping of sol-gel hybrid materials', IEEE Photonics Technol. Lett., Vol. 16, No.8, p, 1888, 2004
  3. M. Hikita, S. Tomaru, K. Enbutsu, N. Ooba, R. Yoshimura, M. Usui, T. Yoshida, and S. Imamura, 'Polymeric optical waveguide films for short-distance optical interconnects', IEEE J., Vol. 5, No.5, p. 1237, 1999
  4. M. T. Gale, C. Gimkiewicz, S. Obi, M. Schnieper, J. Sochitg, H. Thiele, and S. Westenhofer, 'Replication technology for optical microsystems', Optics and Lasers in Engineering, Vol. 43, No. 3-5, p, 373, 2005
  5. S. Y. Chou, P. R. Krauss, and P. J. Rennstrom, 'Nanoimprint lithography', J. Vac. Sci. Technol. B, Vol. 14, No.6, p. 4129, 1996
  6. S. Y. Chou, P. R. Krauss, W. Zhang, L. Guo, and L. Zhang, 'Sub-10 nm imprint lithography and applications', J. Vac. Sci. Technol. B, Vol. 15, p. 2897, 1997 https://doi.org/10.1116/1.589752
  7. T. Bailey, B. J. Choi, M. Colburn, M. Meissl, S. Shaya, J. G. Ekerdt, S. V. Sreenivasan, and C. G. Willson, 'Step and flash imprint lithography: template surface treatment and defect analysis', J. Vac. Sci. Technol. B, Vol. 18, No.6, p. 3572, 2000
  8. C. Park, J. Yoon, and E. L. Thomas, 'Enabling nanotechnology with self assembled block copolymer patterns', Polymer, Vol. 44, No. 22, p. 6725, 2003
  9. Y. Xia and G. M. Whitesides, 'Soft lithography', Angew. Chem., Int. Ed., Vol. 37, No.5, p. 550, 1998
  10. W. S. Kim, K. S. Kim, Y. J. Eo, K. B. Yoon, and B. S. Bae, 'Synthesis of fluorinated hybrid material for UV embossing of a large core optical waveguide structure', J. Mater. Chem., Vol. 15, p. 465, 2005
  11. C. R. Tellier and A. R. Charbonnieras, 'Characterization of the anisotropic chemical attack of (hkl) silicon plates in a TMAH 25 wt% solution: micromachining and adequacy of the dissolution slowness surface', Sensor and Actuators A, Vol. 105, p. 62, 2003
  12. D. Resnik, D. Vrtacnik, U. Aljancic, M. Mozek, and S. Amon, 'Wet etching of silicon structures bounded by (311) sidewalls', Microelectronics Engineering, Vol. 51-52, p, 555, 2000 https://doi.org/10.1016/S0167-9317(99)00519-5
  13. Y. M. Jung, J. H. Kim, Y. C. Kim, H. I. Seo, J. H. Kim, and M. Ishida, 'Silicon hard master fabrication using DRIE and anisotropic wet etching procedures', Submitted to Metals and Materials International, 2005