• 제목/요약/키워드: transparent materials

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CIGS 박막태양전지를 위한 반사방지특성을 가진 용액공정 투명전극 (Solution-Processed Anti Reflective Transparent Conducting Electrode for Cu(In,Ga)Se2 Thin Film Solar Cells)

  • 박세웅;박태준;이상엽;정중희
    • 한국재료학회지
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    • 제30권3호
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    • pp.131-135
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    • 2020
  • Silver nanowire (AgNW) networks have been adopted as a front electrode in Cu(In,Ga)Se2 (CIGS) thin film solar cells due to their low cost and compatibility with the solution process. When an AgNW network is applied to a CIGS thin film solar cell, reflection loss can increase because the CdS layer, with a relatively high refractive index (n ~ 2.5 at 550 nm), is exposed to air. To resolve the issue, we apply solution-processed ZnO nanorods to the AgNW network as an anti-reflective coating. To obtain high performance of the optical and electrical properties of the ZnO nanorod and AgNW network composite, we optimize the process parameters - the spin coating of AgNWs and the concentration of zinc nitrate and hexamethylene tetramine (HMT - to fabricate ZnO nanorods. We verify that 10 mM of zinc nitrate and HMT show the lowest reflectance and 10% cell efficiency increase when applied to CIGS thin film solar cells.

습식 공정법에 의한 고경도 투명 전도막 제조 (Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process)

  • 박종국;전대우;이미재;임태영;황종희;김진호
    • 한국전기전자재료학회논문지
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    • 제28권12호
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    • pp.826-830
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    • 2015
  • Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from $10.1{\Omega}/sq$ to $23.3{\Omega}/sq$. The surface hardness and adhesion of thin film were 5H and 5B.

솔-젤법을 이용한 투명 칼라 코팅유리 제조 (Fabrication of Transparent Color Coating Glass by Sol-gel Method)

  • 박종국;전대우;이미재;임태영;황종희;김진호
    • 한국전기전자재료학회논문지
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    • 제29권1호
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    • pp.40-43
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    • 2016
  • Transparent color coating films were fabricated on a glass substrate by using sol-gel hybrid binder and organic dye. Sol-gel hybrid binder coating film fabricated with PTMS of 0.03 mole showed a very high pencil hardness of 9 H. As the withdrawal speed increased from 1.0 mm/s to 5.0 mm/sec, The yellowness ($b^*$) of coating glass also gradually increased. The transmittance of yellow color coating glass was 82.6% and the haze of coating glass was 0.35%. Red and blue color coating glasses also showed the high transmittance of 62.4% and 80.6% respectively. The surface hardness of color coating films was 6 H.

ZnO 기반의 투명 박막 트랜지스터 제작을 위한 Active-layer의 최적화에 대한 연구 (Optimization of active layer for the fabrication of transparent thin film transistor based on ZnO)

  • 장성필;이상규;손창완;임재현;송용원;주병권;이상렬
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 Techno-Fair 및 추계학술대회 논문집 전기물성,응용부문
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    • pp.94-95
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    • 2007
  • We have observed electrical properties of ZnO thin films for the fabrication of transparent thin film transistor. ZnO thin films were deposited on $Al_2O_3$(0001) substrate at various temperatures by pulsed laser deposition(PLD). The third of harmonic(355nm) Nd:YAG laser was used for pulsed laser deposition. X-ray diffraction(XRD), field emission-scanning electron microscope(FE-SEM), and photoluminescence were used to characterize physical and optical properties of ZnO thin film.. The results indicated the ZnO film showed good optical properties as increasing temperatures, with low FWHM of exciton-related peak and XRD(0002) peak.

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DC 마그네트론 스퍼터링 방법을 이용하여 증착한 IGZO 박막트랜지스터의 특성 (Characteristics of IGZO Thin Film Transistor Deposited by DC Magnetron Sputtering)

  • 김성연;명재민
    • 한국재료학회지
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    • 제19권1호
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    • pp.24-27
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    • 2009
  • Indium Gallium Zinc Oxide (IGZO) thin films were deposited onto 300 nm-thick oxidized Si substrates and glass substrates by direct current (DC) magnetron sputtering of IGZO targets at room temperature. FESEM and XRD analyses indicate that non-annealed and annealed IGZO thin films exhibit an amorphous structure. To investigate the effect of an annealing treatment, the films were thermally treated at $300^{\circ}C$ for 1hr in air. The IGZO TFTs structure was a bottom-gate type in which electrodes were deposited by the DC magnetron sputtering of Ti and Au targets at room temperature. The non-annealed and annealed IGZO TFTs exhibit an $I_{on}/I_{off}$ ratio of more than $10^5$. The saturation mobility and threshold voltage of nonannealed IGZO TFTs was $4.92{\times}10^{-1}cm^2/V{\cdot}s$ and 1.46V, respectively, whereas these values for the annealed TFTs were $1.49{\times}10^{-1}cm^2/V{\cdot}$ and 15.43V, respectively. It is believed that an increase in the surface roughness after an annealing treatment degrades the quality of the device. The transmittances of the IGZO thin films were approximately 80%. These results demonstrate that IGZO thin films are suitable for use as transparent thin film transistors (TTFTs).

Regulation of precursor solution concentration for In-Zn oxide thin film transistors

  • Chen, Yanping;He, Zhongyuan;Li, Yaogang;Zhang, Qinghong;Hou, Chengyi;Wang, Hongzhi
    • Current Applied Physics
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    • 제18권11호
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    • pp.1300-1305
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    • 2018
  • The tunable electronic performance of the solution-processed semiconductor metal oxide is of great significance for the printing electronics. In current work, transparent thin-film transistors (TFTs) with indium-zinc oxide (IZO) were fabricated as active layer by a simple eco-friendly aqueous route. The aqueous precursor solution is composed of water without any other organic additives and the IZO films are amorphous revealed by the X-ray diffraction (XRD). With systematic studies of atomic force microscopy (AFM), X-ray photoemission spectroscopy (XPS) and the semiconductor property characterizations, it was revealed that the electrical performance of the IZO TFTs is dependent on the concentration of precursor solution. As well, the optimum preparation process was obtained. The concentrations induced the regulation of the electronic performance was clearly demonstrated with a proposed mechanism. The results are expected to be beneficial for development of solution-processed metal oxide TFTs.

Transparent ITO/Ag/i-ZnO Multilayer Thin Film enhances Lowing Sheet Resistance

  • Kim, Sungyoung;Kim, Sangbo;Heo, Jaeseok;Cho, Eou-Sik;Kwon, Sang Jik
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.187-187
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    • 2015
  • The past thirty years have seen increasingly rapid advances in the field of Indium Tin Oxide (ITO) transparent thin film.[1] However, a major problem with this ITO thin film application is high cost compared with other transparent thin film materials.[2] So far, in order to overcome this disadvantage, we show a transparent ITO/Ag/i-ZnO multilayer thin film electrode can be the solution. In comparison with using amount of ITO as a transparent conducting material, intrinsic-Zinc-Oxide (i-ZnO) based on ITO/Ag/i-ZnO multilayer thin film showed cost-effective and it has not only highly transparent but also conductive properties. The aim of this research has therefore been to try and establish how ITO/Ag/i-ZnO multilayer thin film would be more effective than ITO thin film. Herein, we report ITO/Ag/i-ZnO multilayer thin film properties by using optical spectroscopic method and measuring sheet resistance. At a certain total thickness of thin film, sheet resistance of ITO/Ag/i-ZnO multilayer was drastically decreased than ITO layer approximately $40{\Omega}/{\square}$ at same visible light transmittance.(minimal point $5.2{\Omega}/{\square}$). Tendency, which shows lowly sheet resistive in a certain transmittance, has been observed, hence, it should be suitable for transparent electrode device.

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산소압력이 테프론 휨성 기판위에 형성된 ZRO 투명박막의 전기적 특성에 미치는 영향 (Effect of Oxygen Pressure on the Electrical Properties of ZnO Transparent Thin Films on Flexible Teflon Substrate)

  • 서광종;장호정
    • 한국재료학회지
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    • 제15권4호
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    • pp.271-274
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    • 2005
  • We investigated the crystalline and electrical properties of ZnO thin films for transparent electrode as a function of the oxygen pressures during the deposition. The ZnO thin films were deposited on a flexible teflon substrates by the pulsed laser deposition. From the X-ray diffraction, ZnO films showed c axis oriented ZnO(0002) crystal structure. The FWHM (full width at half maximum) values decreased from $0.51^{\circ}\;to\;0.34^{\circ}$ as the oxygen pressure increased from 0.1 mTorr to 10.0 mTorr showing the improvement of crystallinity. The resistivity and hall mobility of ZnO film deposited at the oxgen pressure of 0.1 mTorr at $200^{\circ}C$ was about $5\times10^{-4}\Omega{\cdot}cm\;and\;20cm^2/V{\cdot}s$, respectively. The optical transmittance of the ZnO films on flexible teflon substrate was found to be above $85\%$.

Mulching Methods and Removing Dates of Mulch Affects Growth and Post Harvest Quality of Garlic (Allium sativum L.) cv. Uiseong

  • Kwon, Kwon-Seok;Azad, Md. Obyedul Kalam;Hwang, Jae-Moon
    • 원예과학기술지
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    • 제29권4호
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    • pp.293-297
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    • 2011
  • This experiment was conducted to elucidate the effects of mulching materials and removing time of the transparent polyethylene (PE) film on the growth of garlic at Uiseong experimental field, Korea. The experimental mulching materials comprised of transparent polyethylene film (0.025 mm) and net polyethylene (NPE). Plant height and leaf number of garlic were highest at PE treatment when the PE removing date was March 18 and this treatment also promoted the no. of cloves. Length of leaf sheath and bolting rate were highest and bulb weight loss rate was lowest at PE + NPE treatment when the PE removing date was March 18. But clove number was the lowest in this treatment compared to conventional PE film treatment. Conventional mulching method accelerated secondary growth rate but bulb weight loss was vice versa. There were statistically no differences in bulb diameter among treatments but conventional treatment positively focused on bulb diameter. Whenever PE film remove can suppress weeds compared to no mulching treatment but the dry weight of weeds were increasing trends as the removal dates of PE film were delayed. Transparent PE or PE + NPE treatments can be recommended to grow best quality garlic when PE film removing date is March 18.

Feasibility of Indium Tin Oxide (ITO) Swarf Particles to Transparent Conductive Oxide (TCO)

  • Hong, Sung-Jei;Yang, DuckJoo;Cha, Seung Jae;Lee, Jae-Yong;Han, Jeong-In
    • Current Photovoltaic Research
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    • 제3권2호
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    • pp.50-53
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    • 2015
  • Indium (In) is widely used for transparent electrodes of photovoltaics as a form of indium tin oxide (ITO) due to its superior characteristics of environmental stability, relatively low electrical resistivity and high transparency to visible light. However, In has been worn off in proportion to growth the In related market, and it leads to raise of price. Although In is obtained from ITO target scarps, much harmful elements are used for the recycling process. To decrease of harmful elements, ITO swarf particles obtained from target scraps was characterized whether it is feasible to transparent conductive oxide (TCO). The ITO swarf was crushed with milling process, and it was mixed with new ITO nanoparticles. The mixed particles were well dispersed into ink solvent to make-up an ink, and it was well coated onto glass substrate. After heat-treatment at $400^{\circ}C$ under $N_2$ rich environments, optical transmittance at 550 nm and sheet resistance of the ITO ink coated layer was 71.6% and $524.67{\Omega}/{\square}$, respectively. Therefore, it was concluded that the ITO swarf was feasible to TCO of touch screen panel.