Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of Transparent Conducting Thin Film with High Hardness by Wet Process

습식 공정법에 의한 고경도 투명 전도막 제조

  • Park, Jong-Guk (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Jeon, Dae-Woo (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Lee, Mi-Jai (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Lim, Tea-Young (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Hwang, Jonghee (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Kim, Jin-Ho (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
  • 박종국 (한국세라믹기술원 광디스플레이소재팀) ;
  • 전대우 (한국세라믹기술원 광디스플레이소재팀) ;
  • 이미재 (한국세라믹기술원 광디스플레이소재팀) ;
  • 임태영 (한국세라믹기술원 광디스플레이소재팀) ;
  • 황종희 (한국세라믹기술원 광디스플레이소재팀) ;
  • 김진호 (한국세라믹기술원 광디스플레이소재팀)
  • Received : 2015.11.18
  • Accepted : 2015.11.24
  • Published : 2015.12.01
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Abstract

Transparent Ag nanowire conducting thin films with high surface hardness were fabricated by bar coating method. When coating speed was changed from 35 mm/sec to 50 mm/sec, the transmittance of coated glass increased from 65.3% to 80.8% in visible light range and the surface resistance was changed from $10.1{\Omega}/sq$ to $23.3{\Omega}/sq$. The surface hardness and adhesion of thin film were 5H and 5B.

Keywords

References

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