Journal of the Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회논문지)

The Korean Institute of Electrical and Electronic Material Engineers (한국전기전자재료학회)
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Fabrication of Single Layer Anti-reflection Thin Film by Sol-gel Method

Sol-gel법에 의한 단층 반사 방지막 제조

  • Park, Jong-Guk (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Jeon, Dae-Woo (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Lee, Mi-Jai (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Lim, Tea-Young (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Hwang, Jonghee (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology) ;
  • Bae, Dong-Sik (Department of Advanced Materials Science and Engineering, Changwon National University) ;
  • Kim, Jin-Ho (Optic & Display Materials Team, Korea Institute of Ceramic Engineering & Technology)
  • 박종국 (한국세라믹기술원 광디스플레이소재팀) ;
  • 전대우 (한국세라믹기술원 광디스플레이소재팀) ;
  • 이미재 (한국세라믹기술원 광디스플레이소재팀) ;
  • 임태영 (한국세라믹기술원 광디스플레이소재팀) ;
  • 황종희 (한국세라믹기술원 광디스플레이소재팀) ;
  • 배동식 (국립창원대학교 메카트로닉스대학 나노신소재공학부) ;
  • 김진호 (한국세라믹기술원 광디스플레이소재팀)
  • Received : 2015.11.16
  • Accepted : 2015.11.24
  • Published : 2015.12.01
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Abstract

Anti-reflective (AR) thin film was fabricated on a glass substrate by sol-gel method. The coating solution was synthesized with TEOS (tetraethlyorthosilicate) and poly ethylene glycol (PEG, 4.0 wt%). As the withdrawal speed of coating was changed from 0.1 mm/sec to 0.3 mm/sec, the thickness and refractive index of prepared thin films were changed. The reflectance and transmittance of coating glass fabricated by the withdrawal speed of 0.1 mm/sec were 0.62% and 95.0% in visible light range. The refractive index and thickness of single layer thin film were n= 1.29 and ca. 99.0 nm.

Keywords

References

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