• Transactions on Electrical and Electronic Materials
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• v.3 no.2
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• pp.1-5
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• 2002

Alignment effects for nematic liquid crystal (NLC) and electro-optical (EO) characteristics of the ion beam (IB) aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the diamond-like carbon (DLC) thin film surface were studied. A high pretilt angle of 3.5$^{\circ}$ in NLC by ion beam exposure on the DLC thin film layer can be measured. An excellent voltage-transmittance (V-T) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for 1 min. Also, a faster response time for the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.04b
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• pp.118-120
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• 2002

Electro-optical (EO) characteristics of the ion beam (IB) aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the diamond-like carbon (DLC) thin film surface were studied. An excellent voltage-transmittance (V-T) curve of the ion beam aligned IN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for I min. Also, a faster response time for the ion beam aligned TN-LCD with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

• Transactions of the Korean Society of Automotive Engineers
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• v.8 no.6
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• pp.238-246
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• 2000

In this paper, an optimization method of thin walled beam structures is proposed, Stiffnesses of a thin walled beam are characterized by the thickness of thin plates and the shape of the typical section of the beam. Explicit formula for section properties such as area, area moment of inertia, and torsional constants are derived using the response surface method. The explicit formula can be used for the optimal design of a structural system which consists of complicated thin walled beams. A vehicle structural system is optimized to demonstrate the proposed method.

• Journal of Mechanical Science and Technology
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• v.19 no.2
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• pp.589-604
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• 2005

To overcome the drawback of currently available curved beam theories having non-symmetric thin-walled cross sections, a curved beam theory based on centroid-shear center formulation is presented for the spatially coupled free vibration and elastic analysis. For this, the displacement field is expressed by introducing displacement parameters defined at the centroid and shear center axes, respectively. Next the elastic strain and kinetic energies considering the thickness-curvature effect and the rotary inertia of curved beam are rigorously derived by degenerating the energies of the elastic continuum to those of curved beam. And then the equilibrium equations and the boundary conditions are consistently derived for curved beams having non-symmetric thin-walled cross section. It is emphasized that for curved beams with L- or T-shaped sections, this thin-walled curved beam theory can be easily reduced to the solid beam theory by simply putting the sectional properties associated with warping to zero. In order to illustrate the validity and the accuracy of this study, FE solutions using the Hermitian curved beam elements are presented and compared with the results by previous research and ABAQUS's shell elements.

• Journal of the Korean Vacuum Society
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• v.6 no.S1
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• pp.110-114
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• 1997

Development of metal ion source growth of high quality Cu metal film formation of non-stoichiometric $SnO_2$ films of Si(100), and modification fo polymer surface by low enregy ion beam have been carried out at KIST Ion Beam Lab. A new metal ion source with high ion beam flux has been developed by a hybrid ion beam (HIB) deposition and non-stoichiometric $SnO_2$ films are controlled by supplying energy. The ion assisted reaction (IAR) in which keV ion beam is irradiated in reactive gas environment has been deveolped for modifying the polymers and enhancing adhesion to other materials and advantages of the IAR have been reviewed.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.06a
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• pp.398-398
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• 2007

Most recently, the Liquid Crystal (LC) aligning capabilities achieved by ion beam exposure on the diamond-like carbon (DLC) thin film layer have been successfully studied. The DLC thin films have a high mechanical hardness, a high electrical resistance, optical transparency and chemical inertness. Nitrogen doped Diamond Like Carbon (NDLC) thin films exhibit properties similar to those of the DLC films and better thermal stability than the DLC films because C:N bonding in the NDLC film is stronger against thermal stress than C:H bonding in the DLC thin films. Moreover, our research group has already studied ion beam alignment method using the NDLC thin films. The nematic liquid crystal (NLC) alignment effects treated on the SiNx thin film layers using ion beam irradiation for three kinds of N rations was successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition (PECVD) and used three kinds of N rations. In order to characterize the films, the atomic force microscopy (AFM) image was observed. The good LC aligning capabilities treated on the SiNx thin film with ion beam exposure for all N rations can be achieved. The low pretilt angles for a NLC treated on the SiNx thin film with ion beam irradiation were measure.

• 한국정보디스플레이학회:학술대회논문집
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• 2003.07a
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• pp.497-499
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• 2003

Electro-optical (EO) performances of the ion beam aligned twisted nematic (TN)-liquid crystal display (LCD) with oblique ion beam exposure on the DLC thin film surface were studied. An excellent voltage-transmittance (VT) curve of the ion beam aligned TN-LCD was observed with oblique ion beam exposure on the DLC thin film surface for 1 min. Also, a faster response time for the ion beam aligned TN-LCD can be achieved with oblique ion beam exposure on the DLC thin film surface for 1 min can be achieved.

• Journal of the Korean Magnetics Society
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• v.5 no.5
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• pp.538-542
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• 1995

The etching characteristics of magnetic thin films of permalloy and Fe-based alloys are investigated. The thin films are fabricated by rf magnetron sputtering and the substrates used are silicon and glass. Etching is done by ion beam technique and the main process parameters investigated are beam voltage, beam current and accelerating voltage. The etch rate of the magnetic films is proportional to the beam current, but it is not directly related to the accelerating voltage and beam voltage. The dependence of etch rate on the process parameters can be explained by ion current density. It is found that the ion beam etching is effective in obtaining well-developed micro-patterns on the permalloy and Fe- based magnetic thin films.

• Structural Engineering and Mechanics
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• v.32 no.3
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• pp.447-457
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• 2009

A general analytical method for computing the joint stiffness from the sectional properties of the members that form the joint is derived using Vlasov's thin-walled beam theory. The analytical model of box T-joint under out-of-plane loading is investigated and validated using shell finite element results and experimental data. The analytical model of the T-joint is implemented in a beam finite element model using a revolute joint element. The out-of-plane displacement computed using the beam-joint model is compared with the corresponding shell element model. The results show close correlation between the beam revolute joint model and shell element model.

• Transactions on Electrical and Electronic Materials
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• v.8 no.6
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• pp.274-277
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• 2007

In this study, liquid crystal(LC) aligning capabilities for homeotropic alignment on the $SiO_x$ thin film by electron beam evaporation method were investigated. Also, the control of pretilt angles and thermal stabilities of the nematic liquid crystal(NLC) treated on $SiO_x$ thin film were investigated. A high pretilt angle of about $86.5^{\circ}$ was obtained, and also the suitable pretilt angle of the NLC on the $SiO_x$ thin film at $10{\sim}50nm$ thickness with e-beam evaporation can be achieved. The uniform LC alignment and good thermal stabilities on the $SiO_x$ thin film surfaces with electron beam evaporation can be achieved. It is considered that the LC alignment on the $SiO_x$ thin film by electron beam evaporation is attributed to elastic interaction between LC molecules and micro-grooves at the $SiO_x$ thin film surface created by evaporation.