• Title/Summary/Keyword: surface charge density

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Analysis of the Ionized Fields around HVDC Transmission Line by the Use of the Charge Simulation Method (전하중첩법을 이용한 직류 송전선 주변 이온장 해석)

  • Min Suk-Won;Song Ki-Hyun
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.6 no.6
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    • pp.478-485
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    • 2005
  • This paper analysed the ionized fields around HVDC transmission line by the use of the charge simulation method. As this is very complex and expressed by a non-linear partial differential equations, it is hard to solve problems analytically. So, we developed a computer program which can apply in multi-polar HVDC transmission line with conductor bundles and calculated conductor surface gradient, corona current density and ion charge density to prove validity of a proposed algorithm in this paper.

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Surface Properties of Glutathione Layer Formed on Gold Surfaces (금 표면 위에 형성된 글루타싸이온 층의 표면 물성)

  • Park, Jin-Won
    • Korean Chemical Engineering Research
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    • v.50 no.2
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    • pp.379-384
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    • 2012
  • It is investigated that that the physical properties of Glutathione layer formed on gold surfaces may make an effect on the distribution of either gold particle adsorbed to the $TiO_2$ surface or vice versa with the adjustment of the electrostatic interactions. For the investigation, the atomic force microscope (AFM) was used to measure the surface forces between the surfaces as a function of the salt concentration and pH value. With the Derjaguin-Landau-Verwey-Overbeek (DLVO) theory, the forces were quantitatively analyzed to acquire the surface potential and charge density of the surfaces for each salt concentration and each pH value. The surface potential and charge density dependence on the salt concentration was described with the law of mass action, and the pH dependence was explained with the ionizable groups on the surface. The salt concentration dependence of the surface properties, found from the measurement at pH 8 and 11, was consistent with the prediction from the law. It was found that the Glutathione layer had higher values for the surface charge densities and potentials than the titanium dioxide surfaces at pH 8 and 11, which may be attributed to the ionized-functional-groups of the Glutathione layer.

Origin of Charge Puddle of Graphene on α - SiO2: First Principles Study.

  • Shim, Yoon Su
    • Proceeding of EDISON Challenge
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    • 2015.03a
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    • pp.338-342
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    • 2015
  • Ripples and charge impurity effect of graphene are considered as the origin of charge puddles in graphene sheet on SiO2. However, this topic is very controversial among researchers in graphene community. In this study, by using density functional theory, we calculate the band structure of the rippled graphene model and charged impurity model that is located close to the (0001) ${\alpha}$-quartz surface. We expect that this study will provide great insight on this matter.

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Vapor deposition of silicon nitride film on silicon and its electrical properties (실리콘질화막의 기상성장과 그 전기적 특성)

  • 성영권;민남기;김승배
    • 전기의세계
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    • v.28 no.9
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    • pp.43-50
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    • 1979
  • Silicon nitride films were chemically deposited on silicon substrates by reacting SiCl$_{4}$ and NH$_{3}$ in a nitrogen atmosphere at 700~1100 .deg.C. The deposition rate increased rapidly with deposition temperature upto about 1000 .deg.C, and became less temperature dependent above this temperature. The etch rate of films in buffered HF solution decreased, with an increase of deposition temperature, and a heat treatment at a temperature higher than that of the deposition considerably reduced the etch rate. It indicates that the heat treatment resulted in a densification of the films. Surface charge density of 3~4 * 10$^{11}$ /cm$^{2}$ was determined from the C-V characteristics of MNS diode, and it was also found that surface charge density depended on deposition temperature, but not film thickness. The current-voltage characteristics displayed a logI-V$^{1}$2/ dependence in the temperature range of 300~500.deg.K. Measurement of the slope of this characteristics and its dependence on temperature and bias polarity suggest that conduction in sili con nitride films arises from the Poole-Frenkel mechanism.

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Effect of the Surface Roughness of Electrode on the Charge Injection at the Pentacene/Electrode Interface (전극 표면의 거칠기가 펜터신/전극 경계면의 전류-전압 특성에 주는 영향)

  • Kim, Woo-Young;Jeon, D.
    • Journal of the Korean Vacuum Society
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    • v.20 no.2
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    • pp.93-99
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    • 2011
  • We investigated how the surface roughness of electrode affects the charge injection at the pentacene/Au interface. After depositing Au film on the Si substrate by sputtering, we annealed the sample to control the Au surface roughness. Pentacene and Au top electrode were subsequently deposited to complete the sample. The nucleation density of pentacene was slightly higher on the rougher Au electrode, but surface morphologies of thick pentacene films were similar on both the as-prepared and the roughened Au electrodes. The current-voltage curves obtained from the Au/pentacene/Au structure measured as a function of temperature indicated that the interface barrier was higher for the rougher Au bottom-electrode. We propose that the higher barrier was caused by the lower work function of rougher electrode surface and the higher trap density at the interface.

Quantum modulation of the channel charge and distributed capacitance of double gated nanosize FETs

  • Gasparyan, Ferdinand V.;Aroutiounian, Vladimir M.
    • Advances in nano research
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    • v.3 no.1
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    • pp.49-54
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    • 2015
  • The structure represents symmetrical metal electrode (gate 1) - front $SiO_2$ layer - n-Si nanowire FET - buried $SiO_2$ layer - metal electrode (gate 2). At the symmetrical gate voltages high conductive regions near the gate 1 - front $SiO_2$ and gate 2 - buried $SiO_2$ interfaces correspondingly, and low conductive region in the central region of the NW are formed. Possibilities of applications of nanosize FETs at the deep inversion and depletion as a distributed capacitance are demonstrated. Capacity density is an order to ${\sim}{\mu}F/cm^2$. The charge density, it distribution and capacity value in the nanowire can be controlled by a small changes in the gate voltages. at the non-symmetrical gate voltages high conductive regions will move to corresponding interfaces and low conductive region will modulate non-symmetrically. In this case source-drain current of the FET will redistributed and change current way. This gives opportunity to investigate surface and bulk transport processes in the nanosize inversion channel.

Methods to Improve Light Harvesting Efficiency in Dye-Sensitized Solar Cells

  • Park, Nam-Gyu
    • Journal of Electrochemical Science and Technology
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    • v.1 no.2
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    • pp.69-74
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    • 2010
  • Methodologies to improve photovoltaic performance of dye-sensitized solar cell (DSSC) are reviewed. DSSC is usually composed of a dye-adsorbed $TiO_2$ photoanode, a tri-iodide/iodide redox electrolyte and a Pt counter electrode. Among the photovoltaic parameters of short-circuit photocurrent density, open-circuit voltage and fill factor, short-circuit photocurrent density is the collective measure of light harvesting, charge separation and charge collection efficiencies. Internal quantum efficiency is known to reach almost 100%, which indicates that charge separation occurs without loss by recombination. Thus, light harvesting efficiency plays an important role in improvement of photocurrent. In this paper, technologies to improve light harvesting efficiency, including surface area improvement by nano-dispersion, size-dependent light scattering efficiency, bi-functional nano material, panchromatic absorption by selective positioning of three different dyes and transparent conductive oxide (TCO)-less DSSC, are introduced.

An Experimental Study on the Oxidation Process of Silicon (실리콘 산화공정에 대한 실험적 고찰)

  • 최연익;김충기
    • Journal of the Korean Institute of Telematics and Electronics
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    • v.16 no.1
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    • pp.26-32
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    • 1979
  • Dry oxidation and wet oxidation processes of silicon have been examined experimentally. The oxidation temperatures were 1.10$0^{\circ}C$, 1.15$0^{\circ}C$, and 1.200 $^{\circ}C$, and oxygen flow rate was changed from 0.2 liter/min to 2.8 liter/min. From the experimental measurements, oxidation temperaturel time and oxygen flow rate have been tabutated for oxide layers 0.1$\mu$ - 1.0$\mu$ in thickness. The quality of the grown oxide layer has been investigated In terms of the dielectric constant, breakdown voltage, fixed surface charge densify (Qss/q) and mobile charge density (Q /q). From these measurements, it is concluded that the quality of the oxide layer is sufficient to expect the normal operation of MOS transistors.

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Nanoprobing Charge Transport Properties of Strained and Indented Topological Insulator

  • Hwang, Jin Heui;Kwon, Sangku;Park, Joonbum;Lee, Jhinhwan;Kim, Jun Sung;Lyeo, Ho-Ki;Park, Jeong Young
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.128.1-128.1
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    • 2013
  • We investigated the correlation between electrical transport and mechanical stress in $Bi_2Te_2Se$ by using a conductive probe atomic force microscopy in an ultra-high vacuum environment. Uniform distribution of measured friction and current were observed over a single quintuple layer terrace, which is an indication of the uniform chemical composition of the surface. By measuring the charge transport of $Bi_2Te_2Se$ surface as a function of the load applied by a tip to the sample, we found that the current density varies with applied load. The variation of current density was explained in light of the combined effect of the changes in the in-plane conductance and spin-orbit coupling that were theoretically predicted. We suppose that the local density of states is modified by tip-induced strain, but topological phase still remains. We exposed a clean topological insulator surface by tip-induced indentation. The surface conductance on the indented $Bi_2Te_2Se$ surface was studied, and the role of surface oxide on the surface conductance is discussed.

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Factors Affecting the Magnitude of the Metal-Insulator Transition Temperature in AMo4O6 (A=K, Sn)

  • Jung, Dong-Woon;Choi, Kwang-Sik;Kim, Sung-Jin
    • Bulletin of the Korean Chemical Society
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    • v.25 no.7
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    • pp.959-964
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    • 2004
  • A low-dimensional metal frequently exhibits a metal-insulator transition through a charge-density-wave (CDW) or a spin-density-wave (SDW) which accompany it's structural changes. The transition temperature is thought to be determined by the amount of energy produced during the transition process and the softness of the original structure. $AMo_4O_6$ (A=K, Sn) are known to be quasi-one dimensional metals which exhibit metalinsulator transitions. The difference of the transition temperatures between $KMo_4O_6$ and $SnMo_4O_6$ (A=K, Sn) is examined by investigating their electronic and structural properties. Fermi surface nesting area and the lattice softness are the governing factors to determine the metal-insulator transition temperature in $AMo_4O_6$ compounds.