• ETRI Journal
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• 제31권3호
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• pp.247-253
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• 2009

We propose a Ku-band driver and high-power amplifier monolithic microwave integrated circuits (MMICs) employing a compensating gate bias circuit using a commercial 0.5 ${\mu}m$ GaAs pHEMT technology. The integrated gate bias circuit provides compensation for the threshold voltage and temperature variations as well as independence of the supply voltage variations. A fabricated two-stage Ku-band driver amplifier MMIC exhibits a typical output power of 30.5 dBm and power-added efficiency (PAE) of 37% over a 13.5 GHz to 15.0 GHz frequency band, while a fabricated three-stage Ku-band high-power amplifier MMIC exhibits a maximum saturated output power of 39.25 dBm (8.4 W) and PAE of 22.7% at 14.5 GHz.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.601-604
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• 2006

We have developed ZnO TFT array using conventional photolithography and wet etching processes. Transparent 20 nm of ultra thin ZnO film deposited by means of plasma enhanced atomic layer deposition at $100^{\circ}C$ was used for the active channel. The ZnO TFT has a mobility of $0.59cm^2/V.s$, a threshold voltage of 7.2V, sub-threshold swing of 0.64V/dec., and an on/off ratio of $10^8$.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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• pp.1146-1149
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• 2006

In this study, nanocomposite layer composed of PMMA-co-MMA and $TiO_2$ was prepared by sol-gel process using TTIP as a precursor and was utilized as a gate insulator of OTFTs. The composite insulator provides the lower threshold voltage and the enhanced sub threshold slope of OTFTs mainly due to its higher dielectric constant than that of the bare PMMA-co-MMA. Consequently, it is demonstrated that the sol-gel process can open an interesting direction for the fabrication of high-performance OTFTs, and contribute for OTFTs to be feasible for real applications.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2002년도 ITC-CSCC -2
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• pp.1050-1053
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• 2002

In this paper, Amorphous silicon on glass substrate was recrystallized to poly-crystalline silicon by solid phase crystallization (SPC) technology. The active region of thin film transistor (TFT) was fabricated by amorphous silicon. The output and transfer characteristics of thin film transistor with lightly doped drain (LDD) structure was measured and analyzed. As a results, analyzed TFTs reliability with LDD's length by various kinds argument such as sub-threshold swing coefficient, mobility and threshold voltages were evaluated. Stress effects in TFT were able to improve to the characteristics of turn-on current and hot carrier effects by LDD's length variations.

• 대한전자공학회:학술대회논문집
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• 대한전자공학회 2002년도 하계종합학술대회 논문집(2)
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• pp.185-188
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• 2002

In this paper, Amorphous silicon on glass substrate was recrytallized to poly-crystalline silicon by solid phase crystallization(SPC) technology The active region of thin film transistor(TFT) was fabricated by amorphous silicon. The output and transfer characteristics of thin film transistor with lightly doped drain(LDD) structure was measured and analyzed. As a results, analyzed TFT's reliability with LDD's length by various kinds argument such as sub-threshold swing coefficient, mobility and threshold voltages were evaluated. Stress effects in TFT were able to improve to the characteristics of turn-on current and hot carrier effects by LDD's length variations

• 전기학회논문지
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• 제57권9호
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• pp.1636-1641
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• 2008

In this study, we introduce a new approach to Parallel Genetic Algorithms (PGA) which combines AHFCGA with crossover operator. As to crossover operators, we use three types of the crossover operators such as modified simple crossover(MSX), arithmetic crossover(AX), and Unimodal Normal Distribution Crossover(UNDX) for real coding. The AHFC model is given as an extended and adaptive version of HFC for parameter optimization. The migration topology of AHFC is composed of sub-populations(demes), the admission threshold levels, and admission buffer for the deme of each threshold level through succesive evolution process. In particular, UNDX is mean-centric crossover operator using multiple parents, and generates offsprings obeying a normal distribution around the center of parents. By using test functions having multimodality and/or epistasis, which are commonly used in the study of function parameter optimization, Experimental results show that AHFCGA can produce more preferable output performance result when compared to HFCGA and RCGA.

• Transactions on Electrical and Electronic Materials
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• 제4권1호
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• pp.24-28
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• 2003

We have studied the influence of rubbing angles with respect to in-plane field direction on electro-optic characteristics of in-plane switching (IPS) liquid crystal display. The results show that the threshold voltage increases and the operational voltage decreases as the rubbing angle increases. Further, the total response time and also response times associated with grey-to-grey transitions become fast as the rubbing angle decreases.

• 한국산업정보학회논문지
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• 제6권1호
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• pp.39-47
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• 2001

A blocked zerotree coding algorithm for compression of subband image is proposed. Significance of blocks with respect to a certain threshold are coded with a set of transition rules for the significance of blocks. Significant blocks are quantized by vector quantization. The basic idea for this coding approach are: 1) Subband images are coded by blocks, 2) Important blocks based on the significance of blocks are coded and quantized, 3) Multiband codebook which is composed of sub-codebooks dedicated for each threshold and subband level is adapted to produce good reproduction vectors for vector quantization. The compression results are similar to Shapiro's zerotree coding even though ours are obtained without entropy coding of bit streams from blocked zerotree encoder. If an entropy coding is applied to the bitstream, PSNR will be improved.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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• pp.1189-1192
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• 2009

Short channel a-Si:H TFT devices with Cu electrodes have been investigated. Short channel TFTs are defined by new plasma etch process. When the channel length becomes shorter, the TFT characteristics (threshold voltage, off current, sub threshold voltage, etc.,) are degraded. These degraded characteristics can be improved through the hydrogen plasma treatment and new gate insulator structure. Using these processes, 15.0 inch XGA LCD panel was fabricated successfully where the channel length of the TFT devices was about 2.5 micrometers.

• 한국전기전자재료학회논문지
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• 제27권10호
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• pp.648-652
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• 2014

We have investigated the effect of electrical properties of amorphous InGaZnO thin film transistors (a-IGZO TFTs) by post thermal annealing in $O_2$ ambient. The post-annealed in $O_2$ ambient a-IGZOTFT is found to be more stable to be used for oxide-based TFT devices, and has better performance, such as the on/off current ratios, sub-threshold voltage gate swing, and, as well as reasonable threshold voltage, than others do. The interface trap density is controlled to achieve the optimum value of TFT transfer and output characteristics. The device performance is significantly affected by adjusting the annealing condition. This effect is closely related with the modulation annealing method by reducing the localized trapping carriers and defect centers at the interface or in the channel layer.