The Study of Improvement in the Characteristics of Oxide Thin Film Transistor by using Atmospheric Pressure Plasma (대기압 플라즈마를 이용한 산화물 박막 트랜지스터 표면처리에 관한 연구)
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- Journal of the Korean institute of surface engineering
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- v.48 no.1
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- pp.7-10
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- 2015